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Wyszukujesz frazę "68.55.Ln" wg kryterium: Temat


Tytuł:
Substrate Defects Filtration During Epitaxial Lateral Overgrowth of GaAs
Autorzy:
Żytkiewicz, Z. R.
Dobosz, D.
Powiązania:
https://bibliotekanauki.pl/articles/1968454.pdf
Data publikacji:
1997-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
Opis:
Results on the growth of GaAs on (001) GaAs substrates by the epitaxial lateral overgrowth technique are reported. We show that the ratio of normal to lateral growth rates in the epitaxial lateral overgrowth process can be controlled by the crystallographic orientation of the seeds and by Si adding to the melt. Experimental data showing that the dislocations threading from the substrate are efficiently filtered and cannot propagate to the epitaxial lateral overgrowth layers are presented. These findings prove that the epitaxial lateral overgrowth process is the powerful method to grow epilayers with low dislocation density on high dislocation density substrates.
Źródło:
Acta Physica Polonica A; 1997, 92, 5; 1079-1082
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Defect Levels in Gallium Arsenide after Irradiation with Light Ions
Autorzy:
Schmidt, T.
Palmetshofer, L.
Lübke, K.
Powiązania:
https://bibliotekanauki.pl/articles/1877086.pdf
Data publikacji:
1995-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
Opis:
Deep level centers in GaAs implanted with light ions (H$\text{}^{+}$, He$\text{}^{+}$) were studied by means of deep level transient spectroscopy, double correlation deep level transient spectroscopy and capacity voltage carrier profiling directly after the implantation process and after annealing at various temperatures. Five different electron traps with energy positions between 0.13-0.75 eV are detected. From the evaluated defect production and carrier trapping yields and their annealing behavior we conclude that each of these traps efficiently contributes to the trapping of free carriers. The EL2 defect is created in too low concentrations in order to significantly account for the removal of free carriers.
Źródło:
Acta Physica Polonica A; 1995, 87, 2; 543-546
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Study of Si(111) Implanted with As Ions by X-Ray Diffraction and Grazing Incidence Methods
Autorzy:
Pełka, J. B.
Górecka, J.
Auleytner, J.
Domagała, J.
Bąk-Misiuk, J.
Powiązania:
https://bibliotekanauki.pl/articles/1964119.pdf
Data publikacji:
1997-05
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
68.55.Jk
Opis:
The Si(111) wafer cut from a bulk single crystal obtained by the Czochralski method was implanted with 5×10$\text{}^{16}$ I cm$\text{}^{-2}$ of As ions of energy 80 keV. The dose applied was chosen above the amorphization limit of the silicon substrate. Two samples, implanted and a reference, were studied by grazing incidence X-ray reflectometry and X-ray diffraction methods using a high resolution Philips MRD system equipped with a Cu source and a channel-cut monochromator. The obtained spectra were compared with distributions of ion range and defect production calculated with TRIM program [1], as well as with theoretical models of reflectivity [2, 3]. The results of grazing incidence X-ray reflectometry reflectivity of the implanted sample show well-pronounced oscillations, which can be associated with a layer about 50 nm thick, approximately comparable to the thickness of the defected layer estimated from the TRIM method. Theoretical calculations of reflectivity clearly indicate an occurrence of a Si layer of electron density lower about 10-15% comparing to the unimplanted Si sample. This can be due to the vacancy production during ion implantation. A comparison of the spectra with a density distribution profile concluded from the TRIM calculations shows large discrepancies. The results indicate the applicability of grazing incidence X-ray reflectometry method in a study of amorphization processes in implanted layers.
Źródło:
Acta Physica Polonica A; 1997, 91, 5; 905-910
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Anisotropic Lattice Misfit Relaxation in AlGaAs Semi-Bulk Layers Grown on GaAs Substrates by Liquid Phase Electroepitaxy
Autorzy:
Żytkiewicz, Z. R.
Domagała, J.
Bąk-Misiuk, J.
Dobosz, D.
Leszczyński, M.
Powiązania:
https://bibliotekanauki.pl/articles/1968459.pdf
Data publikacji:
1997-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.60.Bs
68.55.Ln
Opis:
Experimental evidence for unidirectional microcracking in semi-bulk AlGaAs layers grown on (001) GaAs substrates is presented. The asymmetrical microcracking leads to anisotropic lattice misfit relaxation in the AlGaAs/GaAs structure and is explained in terms of higher mobility of [-110]-oriented α-type dislocations than that of β-type dislocations oriented in [110] direction.
Źródło:
Acta Physica Polonica A; 1997, 92, 5; 1092-1096
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Photoluminescence of Donor-Doped ZnSe Films Grown by Molecular Beam Epitaxy
Autorzy:
Karczewski, G.
Hu, B.
Yin, A.
Luo, H.
Dobrowolska, M.
Furdyna, J. K.
Powiązania:
https://bibliotekanauki.pl/articles/1932090.pdf
Data publikacji:
1995-01
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
78.55.Et
Opis:
We studied the effect of the donor doping of ZnSe films on their photoluminescence properties. The samples were doped during the molecular beam epitaxy growth, either with gallium or with chlorine. As the dopant concentration dose increases, the intensity of the band-edge emission first saturates, and then quenches in favor of the deep-level photoluminescence band. The main effect of donor doping on photoluminescence is a strong increase in intensity of the donor-bound exciton line, referred to as I$\text{}_{2}$. For Ga-doped films deep-band emission is much stronger, and the I$\text{}_{2}$-line is slightly weaker than for Cl-doped films with comparable doping level. The results confirm the superiority of chlorine over gallium as an n-type dopant in ZnSe. We discuss the photoluminescence results and relate them to deep level transient spectroscopy data obtained on the same samples.
Źródło:
Acta Physica Polonica A; 1995, 87, 1; 245-248
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
X-ray Study of Strain Relaxation in Heteroepitaxial AlGaAs Layers Annealed under High Hydrostatic Pressure
Autorzy:
Bąk-Misiuk, J.
Adamczewska, J.
Misiuk, A.
Regiński, K.
Wierzchowski, W.
Wieteska, K.
Kozanecki, A.
Kuritsyn, D.
Glukhanyuk, W.
Trela, J.
Powiązania:
https://bibliotekanauki.pl/articles/2030644.pdf
Data publikacji:
2002-05
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.40.-z
68.55.Ln
Opis:
The effect of treatment at up to 1270 K under hydrostatic argon pressure, up to 1.2 GPa, on strain relaxation of AlGaAs layers was investigated by X-ray diffraction and related methods. The 1.5μm thick AlGaAs layers were grown by molecular beam epitaxy method on 001 oriented semi-insulating GaAs substrate at 950 K. An increase in intensity of X-ray diffuse scattering, originating from hydrostatic pressure-induced misfit dislocations, was observed for all treated samples. For the samples treated at 920 K during 1 h under 0.6 GPa, the diffuse scattering was confined to the [110] crystallographic direction perpendicular to the direction of dislocations. For the samples treated at 1.2 GPa at the same temperature and time conditions as for 0.6G Pa, a different behaviour is observed, namely the diffuse scattering extends along all azimuthal directions, indicating that dislocations are created in both [110] and [¯110] directions. The change of strain after the treatment was most pronounced for the samples treated at 1.2 GPa for 1 h at 920 K.
Źródło:
Acta Physica Polonica A; 2002, 101, 5; 689-699
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Deep Electron Traps in CdTe:In Films Grown by Molecular Beam Epitaxy
Autorzy:
Żakrzewski, A. K.
Dobaczewski, L.
Karczewski, G.
Wojtowicz, T.
Kossut, J.
Powiązania:
https://bibliotekanauki.pl/articles/1934051.pdf
Data publikacji:
1995-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
73.61.Ga
Opis:
N-type indium doped CdTe grown on n$\text{}^{+}$-GaAs by molecular beam epitaxy has been studied by the standard deep level transient spectroscopy and the isothermal Laplace-transform deep level transient spectroscopy. It was found that the Cd/Te flux ratio strongly influences the deep level transient spectroscopy results. The unusual temperature dependence of the electron emission rate in films grown at nearly stoichiometric conditions may point out that the observed defect is resonant with the conduction band.
Źródło:
Acta Physica Polonica A; 1995, 88, 5; 961-964
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Indium Doping of CdTe Grown by Molecular Beam Epitaxy
Autorzy:
Karczewski, G.
Zakrzewski, A.
Kutrowski, M.
Jaroszyński, J.
Dobrowolski, W.
Grodzicka, E.
Janik, E.
Wojtowicz, T.
Kossut, J.
Barcz, A.
Powiązania:
https://bibliotekanauki.pl/articles/1932089.pdf
Data publikacji:
1995-01
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
73.61.Ga
Opis:
We report on n-type indium doping of CdTe films grown by molecular beam epitaxy on (001) GaAs substrates. By adjusting the flux of In atoms we can precisely control the carrier concentration over three orders of magnitude - from 8 × 10$\text{}^{14}$ up to 1.3 × 10$\text{}^{18}$ cm$\text{}^{-3}$. In agreement with earlier reports we confirmed that Cd overpressure plays an important role in the doping process. The doping appears to be most effective for Cd/Te pressure ratio of 1.5. For this value of Cd/Te pressure ratio essentially 100% efficiency of doping is achieved at low In concentrations (< 10$\text{}^{18}$ cm$\text{}^{-3}$). At higher In concentrations acceptor impurities compensate shallow donors limiting the concentration of free carriers.
Źródło:
Acta Physica Polonica A; 1995, 87, 1; 241-244
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Fluorination Under NF$\text{}_{3}$ Flow of Oxygen Deficient YBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{x}$ Thin Films Deposited on Various Types of Substrate
Autorzy:
Massiot, P.
Perrin, C.
Guilloux-Viry, M.
Perrin, A.
Sergent, M.
Powiązania:
https://bibliotekanauki.pl/articles/1964378.pdf
Data publikacji:
1997-07
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
74.76.Bz
68.55.Ln
Opis:
Oxygen deficient YBaCuO thin films, c-epitaxially grown by laser ablation on different substrates such as (100)MgO, (100)SrTiO$\text{}_{3}$ and (100)LaAlO$\text{}_{3}$, were fluorinated by an ex situ solid/gas reaction with NF$\text{}_{3}$ (3% NF$\text{}_{3}$ diluted in N$\text{}_{2}$) at 280°C. The kinetics of the reaction depends on the type of the substrate. After reaction the superconducting behaviour of the films is improved without degradation of their crystallinity, whatever the nature of the substrate. The stability of the fluorinated films under oxygen or nitrogen gas was studied. All these results will be compared with those previously obtained for fluorination of oxygen deficient YBaCuO ceramics.
Źródło:
Acta Physica Polonica A; 1997, 92, 1; 221-225
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Optical Properties of Molecular Beam Epitaxy Grown ZnSe on GaAs
Autorzy:
Karpińska, K.
Suchocki, A.
Godlewski, M.
Hommel, D.
Powiązania:
https://bibliotekanauki.pl/articles/1929648.pdf
Data publikacji:
1993-09
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Bd
68.55.Ln
78.66.Fd
Opis:
Photoluminescence studies of molecular beam epitaxy grown ZnSe-on-GaAs layers are presented. The high sensitivity of the PL technique allowed for identification unintentional dopants in pure ZnSe sample. Characteristic photoluminescence lines due to extended defects were observed. The experimental results obtained show a correlation between intentional doping level and extended defects concentration. We conclude also that even though molecular beam epitaxy layers are grown at low temperature, the self-compensation mechanism may still be important. For heavily doped sample edge emission is deactivated likely due to efficient energy transfer link with deep donor-acceptor pair bands.
Źródło:
Acta Physica Polonica A; 1993, 84, 3; 551-554
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Temperature Dependence of Magnetisation Reversal and GMR in Spin Valve Structures
Autorzy:
Stobiecki, F.
Stobiecki, T.
Ocker, B.
Maass, W.
Powroźnik, W.
Paja, A.
Loch, C.
Röll, K.
Powiązania:
https://bibliotekanauki.pl/articles/2013156.pdf
Data publikacji:
2000-03
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.70.Pa
68.55.Ln
68.55.-a
Opis:
Temperature measurements of magnetisation reversal, resistance and magnetoresistance of Co/Cu/Co/FeMn spin valve structures deposited in different conditions were performed. The influence of exchange anisotropy energy, interlayer coupling energy, and electron transport properties were taken into consideration in explaining differences in giant magnetoresistance effect of investigated samples.
Źródło:
Acta Physica Polonica A; 2000, 97, 3; 523-526
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Doping and Characterization of Wide-Gap II-VI Epilayers
Autorzy:
Karczewski, G.
Wojtowicz, T.
Powiązania:
https://bibliotekanauki.pl/articles/1946648.pdf
Data publikacji:
1996-10
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
71.55.-i
71.55.Gs
Opis:
In this paper we review the properties of n-type doped ZnSe and CdTe epilayers grown by molecular beam epitaxy on (100) GaAs substrates. Recent results of photoluminescence, transport measurements, secondary ion mass spectroscopy and deep-level transient spectroscopy are discussed. A major emphasis is placed on the effect of different dopant species and the role of the deviation from stoichiometry on the doped epitaxial layers. Since deep defect states play an important role in determining the properties of the doped materials, considerable attention is directed towards characterization and identification of deep-lying defect states, both native and introduced by dopants. In particular, in the case of ZnSe the deep-level transient spectroscopy results clarify why Cl is superior to Ga as an effective n-type dopant. They provide strong evidence that chlorine - unlike Ga - does not introduce by itself any detectable deep defects into the ZnSe lattice. In the case of CdTe, we focus on the influence of the deviation from stoichiometric growth conditions in the molecular beam epitaxy process and on the properties of In doped layers. We discuss resistivity, Mn diffusivity and the presence of various deep defects in layers grown at different Cd/Te flux ratios.
Źródło:
Acta Physica Polonica A; 1996, 90, 4; 635-644
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Ion Beam Induced Darkening in Tetrahedral Amorphous Carbon Thin Films
Autorzy:
Sandulov, M.
Berova, M.
Tsvetkova, T.
Zuk, J.
Powiązania:
https://bibliotekanauki.pl/articles/1402243.pdf
Data publikacji:
2015-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.05.U-
68.55.Ln
42.70.Ln
Opis:
The samples of thin film (d ≈ 40 nm) tetrahedral amorphous carbon (ta-C), deposited by the filtered cathodic vacuum arc have been implanted with N⁺ at a fluence of 3×10¹⁴ cm¯² and ion energy E=20 keV. The induced structural modification of the implanted material results in a considerable change of its optical properties, best manifested by a significant shift of the optical absorption edge to lower photon energies as obtained from optical transmission measurements. This shift is accompanied by a considerable increase of the absorption coefficient (photodarkening effect) in the measured wavelength range (350÷2500 nm). These effects could be attributed to both the additional defect introduction and the increased graphitization, as confirmed by the X-ray photoelectron spectroscopy measurements. The optical contrast thus obtained (between implanted and unimplanted film materials) could be made use of in the area of high-density optical data storage using the focused ion beams.
Źródło:
Acta Physica Polonica A; 2015, 128, 5; 953-956
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Iron-Boron Pair in Silicon: Old Problem Anew
Autorzy:
Dobaczewski, L.
Surma, M.
Powiązania:
https://bibliotekanauki.pl/articles/1946552.pdf
Data publikacji:
1996-10
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.Ln
71.55.Cn
73.40.Lq
Opis:
For the iron-boron pair in the p-type silicon two different configurations of the defect are observed: stable and metastable. The reported metastable configuration is the first step in a dissociation process of the stable, i.e. of trigonal symmetry, configuration of the pair. Rate equations for the two-step iron-boron pair dissociation allowed us to evaluate the dissociation rates for both configurations of the pair. The driving force for the creation and, then, dissociation of the metastable pair is the minority carrier injection followed by the electron-hole recombination process in the space charge region. A use of the high-resolution Laplace-transform deep level transient spectroscopy allowed us to demonstrate for both of the configurations the influence of the magnetic field on the hole emission.
Źródło:
Acta Physica Polonica A; 1996, 90, 4; 613-622
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Transition Metal-Related Centres in Silicon Studied by High-Resolution Deep Level Transient Spectroscopy
Autorzy:
Dobaczewski, L.
Kamiński, P.
Kozłowski, R.
Surma, M.
Powiązania:
https://bibliotekanauki.pl/articles/1933733.pdf
Data publikacji:
1995-10
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
73.40.Lq
71.55.Cn
68.55.Ln
Opis:
High-resolution Laplace-transform deep level transient spectroscopy technique has been used to study a fine structure in the carrier emission process for transition metal- and thermal donors-related defects in silicon. For the case of the transition metal centres the method revealed the fine structure when the defect has a similar emission characteristics to other defects in the crystal. The method also demonstrated the complex emission process for the thermal donors.
Źródło:
Acta Physica Polonica A; 1995, 88, 4; 703-706
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł

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