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Tytuł:
Wytwarzanie ultra cienkich warstw z wykorzystaniem line 440 sputtering system
Ultra thin layer preparation with using the line 440 sputtering system
Autorzy:
Lubańska, Z.
Grudniewski, T.
Chodyka, M.
Powiązania:
https://bibliotekanauki.pl/articles/250357.pdf
Data publikacji:
2015
Wydawca:
Instytut Naukowo-Wydawniczy TTS
Tematy:
elektronika
sputtering magnetronowy
plazma
electronic
magnetron sputtering
plasma
Opis:
W artykule omówiono jedną z możliwych technik nanoszenia cienkich warstw na podłoża szklane jaką jest sputtering magnetronowy. Metoda polega na nanoszeniu na przygotowane podłoża, materiałów w wyniku rozpylania plazmowego. LINE 440 jest aparaturą najnowszej generacji wykorzystywaną do celów naukowo-badawczych w Centrum Badań nad Innowacjami przy Państwowej Szkole Wyższej w Białej Podlaskiej.
The article describes one of the possible techniques for thin films preparation on glass substrates. The method involves applying to the surface of sample externally controlled media, which is sprayed in a magnetic field and then deposited onto a substrate. Line 440 is the latest generation apparatus used for the purposes of research at the Center for Innovation Research at the State School in Biala Podlaska.
Źródło:
TTS Technika Transportu Szynowego; 2015, 12; 2693-2695
1232-3829
2543-5728
Pojawia się w:
TTS Technika Transportu Szynowego
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Fotoaktywne powłoki dwutlenku tytanu osadzane reaktywną metodą gas impulse magnetron sputtering (GIMS)
Photoactive titanium dioxide thin films deposited by reactive gas impulse magnetron sputtering (GIMS)
Autorzy:
Jakubowska, M.
Powiązania:
https://bibliotekanauki.pl/articles/134853.pdf
Data publikacji:
2016
Wydawca:
ADVSEO
Tematy:
TiO2
magnetron sputtering
Gas Impulse Magnetron Sputtering
Opis:
Titanium dioxide (TiO2) is one of the most extensively studied metal oxides, also in a form of thin films. It is a polymorphous material known to exist in three crystalline forms, two tetragonal (anatase and rutile) and one orthorhombic (brookite). In the present paper, the way of deposition of thin films of rutile with the help of reactive magnetron sputtering in pure oxygen introduced to the vacuum chamber in the form of short gas pulses is presented. Compared to typical reactive magnetron sputtering, this novel deposition technique, known as gas impulse magnetron sputtering (GIMS), has an advantage of a minimal target poisoning and stechiometric TiO2. Properties of the films deposited on medical grade Ti6Al7Nb alloy were investigated with the use of SEM, EDS, GI-XRD and FTIR. Their photoactivity was determined by the measurements of water and diiodomethane wetting angles after UV light illumination of different duration, varying between 5 and 25 minutes. In addition, the bactericidal activity of the illuminated TiO2 films in contact with E. Coli bacteria was tested using a live-dead test. It has been found that 200-400nm thick stechiometric films of reactive GIMS deposited rutile and anatase are characterised by very fine nanostructure and strong photoactivity.
Źródło:
Technical Issues; 2016, 3; 53-59
2392-3954
Pojawia się w:
Technical Issues
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Analiza wpływu trawienia powierzchni w procesie sputteringu magnetronowego
Etching effect analysis in the process of magnetron sputtering
Autorzy:
Grudniewski, T.
Chodyka, M.
Lubańska, Z.
Powiązania:
https://bibliotekanauki.pl/articles/250398.pdf
Data publikacji:
2015
Wydawca:
Instytut Naukowo-Wydawniczy TTS
Tematy:
trawienie powierzchni
sputtering magnetronowy
surface etching
sputtering magnetron
Opis:
W prezentowanym artykule, autorzy starają się zwrócić uwagę na proces wstępnego przygotowania próbek do nanoszenia warstw metodą sputteringu magnetronowego. Wykorzystywaną metodą w urządzeniu, na którym przeprowadzono badania proces ten polega na bombardowaniu powierzchni próbki plazmą i wytrawianiu jej górnych warstw. Autorzy postanowili zatem zbadać jaki wpływ ma trawienie na próbkę oraz czy wybite z próbki atomy materiału mogą być osadzone na innym podłożu. Dodatkowo przeanalizowano jedną z możliwości modyfikacji kształtu plazmy poprzez wprowadzenie, do komory roboczej, bardzo silnych magnesów.
In this paper, the authors pay attention to the pre-treatment process for creating layers by magnetron sputtering. The method used by the device on which the study was conducted involves bombarding the sample surface plasma and etching the upper layers. The authors therefore decided to investigate what impact the digestion of the sample has and whether the sample atoms knocked out of the material can be embedded on other substrates. In addition, one possible modification of the plasma shape was analyzed by introducing very strong magnets into the working chamber.
Źródło:
TTS Technika Transportu Szynowego; 2015, 12; 624-626, CD
1232-3829
2543-5728
Pojawia się w:
TTS Technika Transportu Szynowego
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering
Autorzy:
Wicher, B.
Chodun, R.
Nowakowska-Langier, K.
Okrasa, S.
Król, K.
Minikayev, R.
Strzelecki, G.
Zdunek, K.
Powiązania:
https://bibliotekanauki.pl/articles/350987.pdf
Data publikacji:
2018
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
magnetron sputtering
modulated pulse magnetron sputtering
plasma&films characterization
Opis:
This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.
Źródło:
Archives of Metallurgy and Materials; 2018, 63, 3; 1339-1344
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Effect of Sample Thickness on Carbon Ejection from Ultrathin Graphite Bombarded by keV C_{60}
Autorzy:
Golunski, M.
Postawa, Z.
Powiązania:
https://bibliotekanauki.pl/articles/1030136.pdf
Data publikacji:
2017-08
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
Computer simulations
sputtering
graphene
Opis:
Molecular dynamics computer simulations are employed to investigate the effect of a sample thickness on the ejection process from ultrathin graphite. The thickness of graphite varies from 2 to 16 graphene layers and the system is bombarded by 10 keV C₆₀ projectiles at normal incidence. The ejection yield and the kinetic energy of emitted atoms are monitored. The implications of the results to a novel analytical approach in secondary ion mass spectrometry based on the ultrathin free-standing graphene substrates and transmission geometry are discussed.
Źródło:
Acta Physica Polonica A; 2017, 132, 2; 222-224
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Sterowanie procesem reaktywnego rozpylania magnetronowego
Process control of reactive magnetron sputtering
Autorzy:
Stec, A.
Powiązania:
https://bibliotekanauki.pl/articles/156298.pdf
Data publikacji:
2005
Wydawca:
Stowarzyszenie Inżynierów i Techników Mechaników Polskich
Tematy:
reaktywne rozpylanie
magnetron
reactive sputtering
Opis:
W pracy przedstawiono wybrane zagadnienia związane ze sterowaniem procesem rektywnego rozpylania magnetronowego. Omówiono najczęściej stosowane metody sterowania. Przedstawiono zależność opisującą charakterystykę prądowo-napięciową oraz sposób modelowania dynamiki procesu związanego z reaktywnym rozpylaniem. Zaproponowano układ regulacji do pracy w trybie przejściowym.
Some aspects of reactive sputtering process control are presented. Most popular control methods are described. current-voltage relation and modelling dynamics of reactive sputtering are presented. Block diagram of a feedback system is proposed.
Źródło:
Pomiary Automatyka Kontrola; 2005, R. 51, nr 1, 1; 53-55
0032-4140
Pojawia się w:
Pomiary Automatyka Kontrola
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Biological evaluation and surface properties of Ti-DLC coatings deposited by magnetron sputtering
Autorzy:
Olejnik, A
Sobczyk-Guzenda, A.
Świątek, L.
Jastrzębski, K.
Bociąga, D.
Powiązania:
https://bibliotekanauki.pl/articles/285544.pdf
Data publikacji:
2016
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Polskie Towarzystwo Biominerałów
Tematy:
DLC coatings
magnetron sputtering
implants
Opis:
During the last few decades, a growing demand for medical implants may be observed on the market. This is a consequence of both the increasing number of people suffering from disabilities as well as technological development. As a result of growing number of trauma injuries, orthopaedic and bone implants are one of the branches of the medical device industry showing the fastest growth opportunities. However, the commonly applied metallic implants do not exhibit total chemical stability in human body environment and hence, possess relatively poor surface properties [1]. For that reason, even the corrosion resistant metals may release degradation products and cause adverse biological response1. Consequently, surface modifications of metallic implants which enhance the biological response of the human body towards the surface of the implant are recently gaining a lot of interest. One of the most extensively studied solutions include the application of diamond-like carbon (DLC) coatings which exhibit a combination of highly desirable properties in the context of biomedical applications [2]. Furthermore, the properties of DLC coatings, such as cell behaviour and body reaction towards its surface, may be further improved by doping with various elements [3]. Therefore, the modified DLC coatings are nowadays extensively researched in terms of their possible medical applications. In the case of orthopaedic implants the enhancement of the osseointegration process is highly desirable in order to assure the proper bone-healing, what according to the literature may be achieved by the addition of titanium (Ti). The incorporation of Ti into the DLC matrix does not only promote the bone marrow cells proliferation, but also simultaneously reduces the activity of the osteoclast-like cells as indicated by Shroeder et al. [4]. Similarly, also Thorwarth et al. demonstrated that carbon coatings containing TiO exhibit promising results concerning the proliferation and differentiation of human osteoblasts [5]. Nevertheless, in spite of the numerous studies considering the biological behaviour of Ti-incorporated DLC coatings, there is lack of conclusive reports considering the biological applications of coatings deposited by a magnetron sputtering technique. Taking this into consideration, a complex biological evaluation of Ti-DLC coatings followed by their surface characteristics was performed, since surface properties have a direct role in different post-implantation reactions including protein adsorption and cell proliferation [1]. The examined coatings were deposited on two commonly applied metallic biomaterials (AISI 316 LVM steel and Ti6Al7Nb alloy) using a magnetron sputtering technique. The surface characteristics of the deposited Ti-DLC coatings included the analysis of surface morphology (SEM), chemical composition and structure (XPS, FTIR) as well as surface wettability and surface free energy (sessile drop technique and Owens-Wendt’s model). The biological assessment of the deposited coatings was based on two complementary cell proliferation and viability assays (LIVE/DEAD and XTT test) performed with the use of two different cell lines, i.e. endothelial cells line EA.hy926 and osteoblast-like cells line Saos-2. The obtained results allowed to check the influence of titanium on the biological response of two different cell lines towards the Ti-DLC coatings deposited using magnetron sputtering method as well as to correlate the obtained results with the surface properties of the investigated coatings.
Źródło:
Engineering of Biomaterials; 2016, 19, 138; 105
1429-7248
Pojawia się w:
Engineering of Biomaterials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Investigation of mechanical and anticorrosive properties of ZrC coatings deposited by magnetron sputtering technique
Autorzy:
Szparaga, Ł.
Mydłowska, K.
Dobruchowska, E.
Bartosik, P.
Gilewicz, A.
Ratajski, J.
Powiązania:
https://bibliotekanauki.pl/articles/286251.pdf
Data publikacji:
2018
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Polskie Towarzystwo Biominerałów
Tematy:
coatings
biomaterials
magnetron sputtering technique
Źródło:
Engineering of Biomaterials; 2018, 21, 148; 73
1429-7248
Pojawia się w:
Engineering of Biomaterials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Nichrome Capacitors on Polycarbonate Substrate for Monitoring Cell Culture Using Impedance Sensing Technique
Autorzy:
Kociubiński, A.
Zarzeczny, D.
Prendecka, M.
Pigoń, D.
Małecka-Massalska, T.
Powiązania:
https://bibliotekanauki.pl/articles/355589.pdf
Data publikacji:
2020
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
bioimpedance
ecis
sputtering
nichrome
fibroblast
Opis:
The aim of this work was to present a method of tissue culture research by measuring the impedance of cells cultured in the presence of nichrome. For this purpose, the Electric Cell-substrate Impedance Sensing system was used with a prototype substrate containing comb capacitors made of nichrome. Magnetron sputtering, photolithography and etching processes were used to produce the thin-film electrodes. In the experimental part, cells of mouse fibroblast cell line L929 were cultured according to the instruction manual in complete medium, under controlled growth conditions. Inoculation of arrays was carried out by 300 microliters per well of cell suspension at ~1.2×105 cells/ml. The results of the monitoring cells behavior in tissue culture indicate good cell viability and proliferative potential.
Źródło:
Archives of Metallurgy and Materials; 2020, 65, 1; 493-496
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The role of magnetic energy on plasma localization during the glow discharge under reduced pressure
Autorzy:
Chodun, R.
Nowakowska-Langier, K.
Zdunek, K.
Okrasa, S.
Powiązania:
https://bibliotekanauki.pl/articles/147975.pdf
Data publikacji:
2016
Wydawca:
Instytut Chemii i Techniki Jądrowej
Tematy:
glow discharge
grounded magnetron
magnetron sputtering
Opis:
In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).
Źródło:
Nukleonika; 2016, 61, 2; 191-194
0029-5922
1508-5791
Pojawia się w:
Nukleonika
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Application of dielectric layers in surface plasmon resonance sensors
Autorzy:
Kurlov, S.
Lebyedyeva, T.
Poperenko, L.
Shpylovyy, P.
Powiązania:
https://bibliotekanauki.pl/articles/385090.pdf
Data publikacji:
2009
Wydawca:
Sieć Badawcza Łukasiewicz - Przemysłowy Instytut Automatyki i Pomiarów
Tematy:
surface plasmon resonance
sensor
modelling
anodization
sputtering
Opis:
Sensors based on surface plasmon resonance (SPR) are widespread in modern devices of biochemical application. As a rule, a technique of diagnostic is a measurement of angle dependence of the refraction index from incident angle of p-polarised monochromic light R( ) from the substrate at plasmon excitation supporting metal film contacted by enviro nment or layer under investigation. Potentialities of SPR sensors may be extended with the inclusion of additional dielectric films into the structure of SPR substrates.
Źródło:
Journal of Automation Mobile Robotics and Intelligent Systems; 2009, 3, 4; 224-227
1897-8649
2080-2145
Pojawia się w:
Journal of Automation Mobile Robotics and Intelligent Systems
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Computer Controlled System for the Magnetron Sputtering Deposition of the Metallic Multilayers
Autorzy:
Marszałek, K.
Stępień, J.
Mania, R.
Powiązania:
https://bibliotekanauki.pl/articles/226224.pdf
Data publikacji:
2014
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
process control system
Al-Ni
magnetron sputtering
Opis:
Deposition of the metallic multilayers is a part of the scientific program on the chemical reaction leading to intermetallic compound formation. This reaction is known as self propagation high temperature synthesis (SHS). The key problem in this investigation is to produce the metallic multilayer system with good repeatability of thin films thicknesses. Thin should be thin, parallel and with low volume of intermixing region between components. Computer control system for the pulsed (mid frequency MF) magnetron sputtering equipment dedicated for metallic multilayers deposition is presented in this paper. The rotation velocity of the sample holder and the gas inlet through membrane valves are the main parameters controlled by the system. Parameters of the magnetron gun power supply, sample temperature and technological gas pressure are registered. The process cards which define all process parameters are collected for each dedicated process type. All cards are collected in a process cards library which permits for full automatization of all operations. Software was written in a graphical LabVIEW environment.
Źródło:
International Journal of Electronics and Telecommunications; 2014, 60, 4; 291-298
2300-1933
Pojawia się w:
International Journal of Electronics and Telecommunications
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Monitoring vital functions of A-375 melanoma cell cultures via thin-film nickel capacitors
Autorzy:
Wilczyńska, Aleksandra
Kociubiński, Andrzej
Zarzeczny, Dawid
Szypulski, Maciej
Pigoń, Dominika
Małecka-Massalska, Teresa
Prendecka-Wróbel, Monika
Powiązania:
https://bibliotekanauki.pl/articles/1844972.pdf
Data publikacji:
2020
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Polskie Towarzystwo Biominerałów
Tematy:
ECIS
nickel
thin layers
melanoma
magnetron sputtering
Opis:
This article deals in the constantly developing branch of microelectronic devices used in various fields of medicine, i.e. diagnostics and treatment of previously incurable human diseases. A method for assessing and monitoring the vital functions of living cells by measuring cellular impedance in real-time using the ECIS® system and a commercial culture substrate is presented. The goal was to develop a substrate significantly less expensive than a commercial substrate that would be suitable for multiple uses and compatible with the ECIS® measurement station. Moreover, thanks to the use of a material with electrochemical properties other than the biocompatible material (gold or platinum) it is possible to observe the cells behavior with regard to the toxic agent. For this purpose, a culture substrate with nickel comb capacitors was used. To make the electrodes, a thin metal layer was sputtered on polycarbonate plates in the magnetron sputtering process. Prior to the next stages, technological masks were designed so as to fit in the ECIS® measuring station. Subsequently, the microelectronic processes of photolithography and etching the metal layer were performed. Finally, the wells were glued onto the culture medium with a biocompatible adhesive. The completed substrates were transferred to the Department of Human Physiology, Medical University of Lublin, for the culture test on A-375 human melanoma cells. The results of the experiment determined the usefulness of the device for monitoring cell culture vital functions by means of impedance measurement.
Źródło:
Engineering of Biomaterials; 2020, 23, 157; 10-14
1429-7248
Pojawia się w:
Engineering of Biomaterials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Otrzymywanie warstw SiCN metodą RF sputteringu
SiCN films deposited by RF magnetron sputtering
Autorzy:
Stańczyk, B.
Jagoda, A.
Dobrzański, L.
Caban, P.
Możdżonek, M.
Powiązania:
https://bibliotekanauki.pl/articles/192224.pdf
Data publikacji:
2011
Wydawca:
Sieć Badawcza Łukasiewicz - Instytut Technologii Materiałów Elektronicznych
Tematy:
SiCN
sputtering
widmo podczerwieni
widmo optycznej absorpcji
dyfrakcja rentgenowska
SIMS
rf sputtering
absorption spectrum
IR spectrum
X-ray diffraction
Opis:
Węglik i azotek krzemu są obiecującymi materiałami, które dzięki swym właściwościom mogą być wykorzystane do uzyskiwania różnego rodzaju przyrządów elektronicznych. Oba są wysoko temperaturowymi półprzewodnikami używanymi jako izolatory i stosowanymi jako bariery dyfuzji w urządzeniach mikroelektronicznych. SiCN znajduje liczne praktyczne zastosowania w ogniwach słonecznych, płaskich monitorach telewizyjnych, pamięciach optycznych, jako warstwy antyrefleksyjne. Kontrola parametrów procesu sputteringu pozwala na uzyskiwanie warstw o różnych właściwościach fizycznych i chemicznych np. o różnej przerwie energetycznej, od 2,86 V dla SiC do 5 eV dla Si3N4 [1]. W artykule opisane zostały właściwości warstw SiCN otrzymane metodą reaktywnego sputteringu z targetu węglika krzemu oraz w atmosferze argonowo - azotowej. SiCN osadzany był na podłożach Si(111) oraz na podłożach krzemowych z warstwą AlN. Skład, struktura, powierzchnia uzyskiwanych warstw była określana za pomocą metod diagnostycznych takich jak: dyfrakcja rentgenowska (XRD), spektroskopia masowa jonów wtórnych (SIMS), mikroskopia sil atomowych (AFM). Badano wpływ parametrów sputteringu na jakość warstw analizując widma transmisji i z zakresu podczerwieni i światła widzialnego.(FTIR - spektroskopia optyczna w zakresie podczerwieni).
Silicon carbide and silicon nitride are prospective candidates for potential high-temperature structural applications because of their excellent mechanical properties [1]. Both are high-temperature semiconductor materials used as electrical insulators or diffusion barriers in microelectronic devices. Apparently, amorphous silicon carbide nitride (SiCxNy) has tenability over a very wide range of x and y. In this context, SiCXNY alloys are interesting materials, among which one can enumerate the SiC band gap (2,86eV) and insulating Si3N4 films (5eV) [1]. In our paper, we describe the properties of SiCN fabricated by magnetron sputtering from a silicon carbide target in a reactive atmosphere of nitrogen and argon. SiCN was deposited on both Si(111) substrates and silicon substrates with AlN layers. The composition, structure and surface roughness (RMS) of the SiCN films were characterized by X-Ray Diffraction (XRD), Secondary Ion Mass Spectroscopy (SIMS), Atomic Force Microscopy (AFM), and Scanning Electron Microscopy (SEM).The influence of the gas composition, gas flow rate and working gas pressure on the quality of layers was examined by the analysis of the spectrum of Optical Absorption and by Fourier Transform Infrared Spectroscopy (FTIR).
Źródło:
Materiały Elektroniczne; 2011, T. 39, nr 2, 2; 18-23
0209-0058
Pojawia się w:
Materiały Elektroniczne
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Effect of Nitridation and Pre-Growth Annealing of the Sapphire Substrate on the Quality of Zinc Oxide Thin Films Grown by RF-Magnetron Sputtering
Autorzy:
Baseer Haider, M.
Powiązania:
https://bibliotekanauki.pl/articles/1032562.pdf
Data publikacji:
2017-10
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
thin films
wide bandgap semiconductors
ZnO
magnetron sputtering
Opis:
ZnO has attracted much attention due to its wide bandgap (3.2 eV) and high exciton binding energy of 60 meV. These properties make ZnO a highly desirable material for high frequency devices that can work in harsh environment. We have grown ZnO thin films at different temperatures ranging from 100°C to 500°C. We have observed that surface roughness is first decreased with the increase in the growth temperature but then by further increasing the growth temperature beyond 300°C, results in increased surface roughness of the grown samples, whereas grain size of the samples increases with the increase in the growth temperature. Crystalline quality of the films is also improved with the increase in the growth temperature but then degrades by further increase beyond 200°C. We achieved the highest Hall mobility for the ZnO sample grown at 200°C. The optimum growth condition of ZnO thin films on sapphire (0001) in our RF/DC magnetron-sputtering unit were achieved for the films grown at 200°C. Subsequently, we performed pre-growth treatment to the sapphire substrate then grew ZnO films at 200°C. Pre-growth treatment involved heating the substrate at 500°C for about half an hour and then etching the sapphire surface with nitrogen plasma. We have observed that pre-growth heating and nitridation of the sapphire substrate results in bigger grain size whereas no improvement was observed in the crystallinity of the film.
Źródło:
Acta Physica Polonica A; 2017, 132, 4; 1325-1328
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Wyświetlanie 1-15 z 85

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