Temat: electron beam lithography - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Exposition time analysis of AlGaN/GaN HEMT fabrication by electron beam lithography
Autorzy:: Indykiewicz, Kornelia
Paszkiewicz, Bogdan
Paszkiewicz, Regina
Powiązania:: https://bibliotekanauki.pl/articles/173831.pdf
Data publikacji:: 2019
Wydawca:: Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:: electron beam lithography
device fabrication
exposition time reduction
Opis:: Electron beam lithography, due to the high design flexibility and high pattering resolution can be used as an exclusive lithography method in device fabrication in R&D reality. To achieve the reasonable time of process exposition, some essential steps and actions must be done. In the article, the main technical and technological dependences, based on AlGaN/GaN HEMT transistor fabrication, will be presented and discussed. As a result of conducted studies, the total time of the most important lithography process expositions will be shown and explained.
Źródło:: Optica Applicata; 2019, 49, 1; 161-166
0078-5466
1899-7015
Pojawia się w:: Optica Applicata
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: Improvement of the electron beam lithography contact pads fabrication process
Autorzy:: Indykiewicz, K.
Paszkiewicz, R.
Paszkiewicz, B.
Powiązania:: https://bibliotekanauki.pl/articles/173623.pdf
Data publikacji:: 2016
Wydawca:: Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:: electron beam lithography
EBL
exposition of big areas
exposition time optimization
Opis:: In the paper, the verification of using the electron beam lithography technique as a main lithography tool for device fabrication is presented. The results of conducted experiments allow us to minimize the exposition time of big areas and retain acceptable metallic structures resolution and designed distances for structures in the neighborhood of a few micrometers. Conducted statistical analysis allows us to define the significance of the selected factors influence on the objectives of this study.
Źródło:: Optica Applicata; 2016, 46, 2; 249-254
0078-5466
1899-7015
Pojawia się w:: Optica Applicata
Dostawca treści:: Biblioteka Nauki

Artykuł

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