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Wyszukujesz frazę "Srnanek, R." wg kryterium: Autor


Wyświetlanie 1-3 z 3
Tytuł:
Gallium oxide buffer layers for gallium nitride epitaxy
Autorzy:
Korbutowicz, R
Wnek, J
Panachida, P
Serafinczuk, J
Srnanek, R
Powiązania:
https://bibliotekanauki.pl/articles/174303.pdf
Data publikacji:
2013
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
hydride vapour phase epitaxy
gallium nitride
gallium oxide
thermal oxidation
buffer layer
Opis:
Gallium nitride (GaN) is very attractive semiconductor material because of its unique properties. The serious matter is a lack of easy access to bulk crystals of GaN. Synthesized crystals are precious and rather small. For these reasons almost all device manufacturers and researchers apply alternative substrates for gallium nitride devices epitaxy and it causes that the technology is intricate. Alternative substrates need buffer layers – their technology is usually complex and expensive. We have proposed a simple method to avoid large costs: applying gallium oxide – monoclinic β-Ga2O3, as the buffer layer, which has structural properties quite good matched to GaN. As the substrates made from single crystal gallium oxide are still hardly available on the market, we have used hydride vapour phase epitaxy (HVPE) GaN epilayers as a starting material. It can be GaN layer under good quality – middle or low. The oxidation process converts top GaN to β-Ga2O3 layer which can release or absorb the strain. Applying such structure in another, second, epitaxy of GaN allows to obtain good quality epitaxial structures using HVPE technique.
Źródło:
Optica Applicata; 2013, 43, 1; 73-79
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Influence of RF ICP PECVD process parameters of diamond-like carbon films on DC bias and optical emission spectra
Autorzy:
Oleszkiewicz, W
Markowski, J
Srnanek, R
Kijaszek, W
Gryglewicz, J
Kovac, J
Tlaczala, M
Powiązania:
https://bibliotekanauki.pl/articles/173686.pdf
Data publikacji:
2013
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
PECVD
diamond-like carbon layers
OES
Raman spectroscopy
AFM
Opis:
The work presents the results of a research carried out with PlasmaLab Plus 100 system, manufactured by Oxford Instruments Company. The system was configured for deposition of diamond-like carbon films by ICP PECVD method. The change of an initial value of DC bias was investigated as a function of set values of the generator power (RF generator and ICP generator) in the constant power of the RF generator operation mode. The research shows that the value of DC bias nearly linearly depends on the RF generator power value and is affected only in a small degree by the power of ICP discharge. The capability of an installed OES spectrometer has been used to ensure the same starting conditions for the deposition processes of DLC films. The analysis of OES spectra of RF plasma discharge used in the deposition processes shows that the increase in ICP discharge power value results in the increased efficiency of the ionization process of a gaseous precursor (CH4). The quality of deposited DLC layers was examined by Raman spectroscopy. Basing on the acquired Raman spectra, the theoretical content of sp3 bonds in the structure of the film was estimated. The content is ranging from 30% to 65% and depends on ICP PECVD deposition process parameters.
Źródło:
Optica Applicata; 2013, 43, 1; 109-115
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Influence of AlN Buffer Layer Deposition Temperature οn Properties of GaN HVPE Layers
Autorzy:
Prażmowska, J.
Korbutowicz, R.
Wośko, M.
Paszkiewicz, R.
Kovač, J.
Srnanek, R.
Tłaczała, M.
Powiązania:
https://bibliotekanauki.pl/articles/1807541.pdf
Data publikacji:
2009-12
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.10.Bk
81.15.Gh
81.15.Kk
Opis:
Gallium nitride layers were deposited on AlN and double layer (AlN/AlGaN) buffers grown at various temperatures on $Al_{2}O_{3}$. Stress in layers was evaluated based on the Raman scattering and photoluminescence measurements. The obtained values were less than 1 GPa.
Źródło:
Acta Physica Polonica A; 2009, 116, S; S-123-S-125
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

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