- Tytuł:
- Exposition time analysis of AlGaN/GaN HEMT fabrication by electron beam lithography
- Autorzy:
-
Indykiewicz, Kornelia
Paszkiewicz, Bogdan
Paszkiewicz, Regina - Powiązania:
- https://bibliotekanauki.pl/articles/173831.pdf
- Data publikacji:
- 2019
- Wydawca:
- Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
- Tematy:
-
electron beam lithography
device fabrication
exposition time reduction - Opis:
- Electron beam lithography, due to the high design flexibility and high pattering resolution can be used as an exclusive lithography method in device fabrication in R&D reality. To achieve the reasonable time of process exposition, some essential steps and actions must be done. In the article, the main technical and technological dependences, based on AlGaN/GaN HEMT transistor fabrication, will be presented and discussed. As a result of conducted studies, the total time of the most important lithography process expositions will be shown and explained.
- Źródło:
-
Optica Applicata; 2019, 49, 1; 161-166
0078-5466
1899-7015 - Pojawia się w:
- Optica Applicata
- Dostawca treści:
- Biblioteka Nauki
Artykuł