Temat: positron implantation profile - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: The detection of reverse accumulation effect in the positron annihilation profile of stack of aluminum and silver foils
Autorzy:: Dryzek, J.
Siemek, K.
Powiązania:: https://bibliotekanauki.pl/articles/148620.pdf
Data publikacji:: 2015
Wydawca:: Instytut Chemii i Techniki Jądrowej
Tematy:: positron implantation profile
stack of foils
Opis:: The implantation profile of positrons emitted from 22Na into a stack of aluminum and silver foils is the subject of the presented report. The characteristic dimple in the profile behind the Ag foil was detected. This effect arises from the differences in the linear absorption coefficient of aluminum and silver. The good agreement between the theoretical profile obtained within the multiscattering model and experimental one was achieved. The observed phenomenon can affect the positron annihilation characteristics measured for the inhomogeneous samples.
Źródło:: Nukleonika; 2015, 60, No. 4, part 1; 713-716
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: Monte Carlo simulation of the positron implantation profiles in the layered samples
Autorzy:: Dryzek, J.
Horodek, P.
Powiązania:: https://bibliotekanauki.pl/articles/146332.pdf
Data publikacji:: 2010
Wydawca:: Instytut Chemii i Techniki Jądrowej
Tematy:: positron implantation
implantation profile
GEANT4 tool kit
Opis:: Theoretical studies of the positron implantation profiles in the layered samples are presented. Simulations performed using a GEANT4 tool kit revealed accumulation of positrons in denser layer embedded by less dens environment. This effect is significant for implantation profiles of slow positrons formed in a beam. Nevertheless, it is also present in conventional experiments, where positrons are emitted from radioactive nuclei. In some cases the diffusion process, which follows the implantation and thermalization processes, can smear this effect. However, defects on the interfaces or differences in the positron affinity can sustain it.
Źródło:: Nukleonika; 2010, 55, 1; 13-16
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 3.

Tytuł:: GEANT4 simulation of implantation profiles for positrons injected in solids from radioactive sources 22Na and 68Ge/68Ga
Autorzy:: Horodek, P.
Dryzek, J.
Powiązania:: https://bibliotekanauki.pl/articles/146334.pdf
Data publikacji:: 2010
Wydawca:: Instytut Chemii i Techniki Jądrowej
Tematy:: positron annihilation
implantation profile
absorption coefficient
GEANT4 tool kit
Opis:: We calculated theoretically the mass absorption coefficients for positrons emitted from the commonly used sources 22Na and 68Ge/68Ga in numerous materials. For this purpose, we used the tool kit GEANT4 which allows to generate the implantation profile. An excellent agreement between the experimental profile and the calculated one was achieved. The calculated values of the mass absorption coefficients coincide well with the experimental values determined by the DSIP method.
Źródło:: Nukleonika; 2010, 55, 1; 17-19
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Dostawca treści:: Biblioteka Nauki

Artykuł

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