Temat: liquid-phase epitaxial growth - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Modelling of thin Si layers growth on partially masked Si substrate
Autorzy:: Gułkowski, S.
Olchowik, J.M.
Jóźwik, I.
Moskvin, P.P.
Powiązania:: https://bibliotekanauki.pl/articles/1933182.pdf
Data publikacji:: 2008
Wydawca:: Politechnika Gdańska
Tematy:: epitaxial lateral overgrowth
liquid-phase epitaxial growth
computer simulations
Opis:: This paper presents a numerical simulation of epitaxial lateral overgrowth of silicon layers from the liquid phase of an Sn solvent. A two-dimensional diffusion equation has been solved and the concentration profiles of Si in a Si-Sn rich solution during the growth have been constructed. The epilayer thickness and width have been obtained from the concentration near the interface.
Źródło:: TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk; 2008, 12, 1-2; 121-126
1428-6394
Pojawia się w:: TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 2.

Tytuł:: Modelling of the interface evolution during Si layer growth on a partially masked substrate
Autorzy:: Gulkowski, S.
Olchowik, J.
Cieślak, K.
Moskvin, P.
Powiązania:: https://bibliotekanauki.pl/articles/1934033.pdf
Data publikacji:: 2011
Wydawca:: Politechnika Gdańska
Tematy:: epitaxial lateral overgrowth
liquid-phase epitaxial growth
computer simulations
Opis:: High-quality thin Si layers obtained from the solution by epitaxial lateral overgrowth (ELO) can play a crucial role in photovoltaic applications. The laterally overgrown parts of the layer are characterized by a lower dislocation density than that of the substrate. The height and width of the layer depend on several factors, such as the technological conditions of liquid phase expitaxy (LPE), growth temperature, cooling rate and the geometry of the system (mask filling factor). Therefore, it is crucial to find the optimal set of technological parameters in order to obtain very thin structures with a maximum width (high aspect ratio). This paper presents a computational study of Si epilayer growth on a line-pattern masked silicon substrate from Si-Sn rich solution. To solve this problem, a mixed Eulerian-Lagrangian approach was applied. The concentration profile was calculated by solving the two-dimensional diffusion equation with appropriate boundary conditions. The growth velocity was determined on the basis of gradients of concentration in the border of the interface. Si interface evolution from the opened window was demonstrated.
Źródło:: TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk; 2011, 15, 1; 91-98
1428-6394
Pojawia się w:: TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk
Dostawca treści:: Biblioteka Nauki

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