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Wyszukujesz frazę "chemical vapor deposition" wg kryterium: Temat

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    Wyświetlanie 1-8 z 8
    Tytuł:
    Synthesis and Characterization of Molybdenum Disulfide Composite Coating on Steel Using Chemical Vapor Deposition
    Autorzy:
    Akbarzadeh, M.
    Zandrahimi, M.
    Moradpour, E.
    Powiązania:
    https://bibliotekanauki.pl/articles/351037.pdf
    Data publikacji:
    2018
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    chemical vapor deposition method
    solid lubricant coating
    molybdenum disulfide
    Opis:
    Molybdenum disulfide (MoS2 ) is one of the most widely used solid lubricants applied in different ways on the surfaces under friction. In this work, AISI 316 austenitic stainless steel was coated with MoS2 , using chemical vapor deposition (CVD) at four different temperatures (400, 500, 600 and 700°C). Coatings properties were investigated using SEM, EDX, XRD and FTIR, Hardness Tester and Roughness tester. The results showed that with simultaneous evaporation of sulfur and molybdenum trioxide (MoO3 ) in the CVD chamber, a uniform coating layer containing MoS2 and MoO2 phases was formed. Increase in the substrate temperature resulted in the rise in the amount of MoS2 to MoO2 phases. The thickness, grain size and the hardness of the coating were 17-29 μm, 50-120 nm and 260-480 HV respectively. Friction tests carried out using pin-on-plate method under normal loads of 10 N under ambient conditions showed values of the friction coefficient 0.25-0.40.
    Źródło:
    Archives of Metallurgy and Materials; 2018, 63, 2; 555-562
    1733-3490
    Pojawia się w:
    Archives of Metallurgy and Materials
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Evaluating the Durability of SiC-Coated Carbon Composites Under Thermal Shock Conditions
    Autorzy:
    Lee, Ji Eun
    Bae, Soo Bin
    Cho, Nam Choon
    Lee, Hyung Ik
    Meng, Zicheng
    Lee, Kee Sung
    Powiązania:
    https://bibliotekanauki.pl/articles/2049309.pdf
    Data publikacji:
    2021
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    durability
    carbon composites
    silicon carbide coating
    chemical vapor deposition
    chemical vapor reaction
    Opis:
    Oxidation and indentation properties of silicon carbide-coated carbon composites were investigated to analyze its durability under atmospheric thermal shock conditions. The silicon carbide-coated samples were prepared either with chemical vapor deposition or chemical vapor reaction/chemical vapor deposition hybrid coating. The remnant weight of uncoated and coated samples was investigated after each thermal shock cycle. The surface and cross-section of coated samples were then analyzed to confirm morphological changes of the coating layers. The spherical indentation test for uncoated and coated samples were also performed. As a result, silicon carbide coating improved the oxidation resistance, elastic modulus, and hardness of carbon composites. Hybrid coating drastically enhanced the durability of samples at high temperature in atmospheric conditions.
    Źródło:
    Archives of Metallurgy and Materials; 2021, 66, 3; 777-782
    1733-3490
    Pojawia się w:
    Archives of Metallurgy and Materials
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Preparation and characterization of multi-walled carbon nanotubes grown on transition metal catalysts
    Autorzy:
    Pełech, I.
    Narkiewicz, U.
    Kaczmarek, A.
    Jędrzejewska, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/779825.pdf
    Data publikacji:
    2014
    Wydawca:
    Zachodniopomorski Uniwersytet Technologiczny w Szczecinie. Wydawnictwo Uczelniane ZUT w Szczecinie
    Tematy:
    catalysts
    carbon nanotubes
    chemical vapor deposition
    X-ray diffraction
    thermogravimetry
    Opis:
    Transition metal catalysts (mainly: iron, cobalt and nickel) on various supports are successfully used in a largescale production of carbon nanotubes (CNTs), but after the synthesis it is necessary to perform very aggressive purification treatments that cause damages of CNTs and are not always effective. In this work a preparation of unsupported catalysts and their application to the multi-walled carbon nanotubes synthesis is presented. Iron, cobalt and bimetallic iron-cobalt catalysts were obtained by co-precipitation of iron and cobalt ions followed by solid state reactions. Although metal particles were not supported on the hard-to-reduce oxides, these catalysts showed nanometric dimensions. The catalysts were used for the growth of multi-walled carbon nanotubes by the chemical vapor deposition method. The syntheses were conducted under ethylene - argon atmosphere at 700°C. The obtained catalysts and carbon materials after the synthesis were characterized using transmission electron microscopy (TEM), X-ray diffraction method (XRD), Raman spectroscopy and thermogravimetric analysis (TG). The effect of the kind of catalyst on the properties of the obtained carbon material has been described.
    Źródło:
    Polish Journal of Chemical Technology; 2014, 16, 1; 117-122
    1509-8117
    1899-4741
    Pojawia się w:
    Polish Journal of Chemical Technology
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Structural and Electrical Properties of SnO₂:F Thin Films Prepared by Chemical Vapor Deposition Method
    Autorzy:
    Najafi, N.
    Rozati, S.
    Powiązania:
    https://bibliotekanauki.pl/articles/1030319.pdf
    Data publikacji:
    2017-02
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    chemical vapor deposition
    SnO₂:F thin films
    structural properties
    electrical properties
    Opis:
    Fluorine doped tin oxide (FTO) thin films were deposited onto glass substrate at different substrate temperatures by a simple and inexpensive method of air pressure chemical vapor deposition. The substrate temperature was kept constant at about 500°C as the optimum temperature, and air was used as both a carrier gas and the oxidizing agent. A very simple method of characterization were carried on to investigate the electrical and structural properties of the prepared thin films. The electrical parameters variations showed that these parameters vary with substrate temperature ranging from an insulator thin film to a highly conductive layer. X-ray diffraction also revealed the structure to be polycrystalline at higher temperatures compared to amorphous structure for lower temperatures.
    Źródło:
    Acta Physica Polonica A; 2017, 131, 2; 222-225
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Optimisation of LT-GaN nucleation layer growth conditions for the improvement of electrical and optical parameters of GaN layers
    Autorzy:
    Wośko, Mateusz
    Powiązania:
    https://bibliotekanauki.pl/articles/174388.pdf
    Data publikacji:
    2019
    Wydawca:
    Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
    Tematy:
    GaN
    nucleation
    recrystallization
    metalorganic chemical vapor deposition
    nitrides
    LED
    MSM
    MESFET devices
    Opis:
    In this work we present the influence of low temperature gallium nitride (LT-GaN) nucleation layer deposition and recrystallization conditions on the electrical and optical properties of buffer and active layer of metal–semiconductor field-effect transistor (MESFET) structure. MESFET structures were used to investigate the properties of bulk materials that determine also the performance of many type GaN based devices, like light emitting diodes (LEDs), high electron mobility transistors (HEMTs) and metal–semiconductor–metal (MSM) detectors. The set of n-GaN/u-GaN/sapphire structures using different nucleation LT-GaN layers thickness and different annealing times was deposited using AIXTRON CCS epitaxial system. In contrast to typical procedure, the high resistive GaN buffer layer was not obtained by intentional Fe/Mg doping, but by specific adjustment of GaN nucleation conditions and recrystallization process parameters that introduce carbon atoms in epitaxial layers, that serve as donors. Generally, low pressure (below 200 mbar) in a reactor chamber, during initial stages of nucleation and recrystallization as well as HT-GaN epitaxy, promotes the growth of high resistive material. Obtained results show that annealing/recrystallization time of LT-GaN has a significant impact on the electrical and optical properties of GaN buffer layers. Longer annealing periods tend to promote crystallization of material with higher electron mobility and higher Si dopant incorporation/activation while maintaining high resistivity in u-GaN buffer area. It was shown that the dimensions of the GaN islands, that could be influenced by the duration of an annealing step of LT-GaN growth, have no impact on the HT-GaN buffer layer coalescence process and material resistivity, but influences mainly electrical properties of active n-GaN layer. Author suggests that the key parameters that are determining the buffer resistivity are the pressure and temperature during LT-GaN annealing and buffer layer coalescence. The influence of GaN island diameters, after LT-GaN annealing, on the u-GaN resistivity was not confirmed.
    Źródło:
    Optica Applicata; 2019, 49, 1; 167-176
    0078-5466
    1899-7015
    Pojawia się w:
    Optica Applicata
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Preparation and characterization of catalyst mix Fe-Co/MgO for carbon nanotubes growth
    Autorzy:
    Steplewska, A.
    Jędrzejewski, R.
    Borowiak-Palen, E.
    Powiązania:
    https://bibliotekanauki.pl/articles/779026.pdf
    Data publikacji:
    2008
    Wydawca:
    Zachodniopomorski Uniwersytet Technologiczny w Szczecinie. Wydawnictwo Uczelniane ZUT w Szczecinie
    Tematy:
    katalizator
    analiza termograwimetryczna
    osadzanie chemiczne z fazy gazowej
    nanorurki węglowe
    catalyst
    thermogravimetric analysis (TGA)
    chemical vapor deposition (CVD)
    carbon nanotubes
    Opis:
    Fe-Co/MgO is one of the most common catalyst mix applied to carbon nanotubes (CNTs) growth in chemical vapor deposition process. Therefore, here we present detailed study on the preparation and characterization of Fe-Co/MgO. The precursors of Fe and Co are iron (II) acetate and cobalt acetates, correspondingly. The molar ratio of the catalyst mix is Fe:Co:MgO=1:1:100. Initially, thermogravimetric analysis (TGA) of the mixture was performed. TGA analysis of it indicated the stepwise mass losses which pointed out the crucial thermal conditions for the changes in the elemental composition, morphology, crystallographic structure and vibrational properties. In current state of the art the lowest growth temperature for singlewalled carbon nanotubes is 550°C in CVD technique and here the characterization of the catalyst mix strongly suggest that this temperature can be decreased what would enhance the compatibility of CNT growth with current complementary metal-oxide-silicon (CMOS) technology for CNTs-based nanoelectronics. The morphology, crystallographic structure, elemental composition of the samples and its spectroscopic properties were performed via high resolution transmission electron microscopy (TEM), X-ray diffraction (XRD) and Infrared spectroscopy (IR), respectively.
    Źródło:
    Polish Journal of Chemical Technology; 2008, 10, 3; 1-3
    1509-8117
    1899-4741
    Pojawia się w:
    Polish Journal of Chemical Technology
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Synthesis of carbon nanotubes via chemical vapor deposition by using rareearth metals as catalysts
    Autorzy:
    Jędrzejewska, A.
    Wnuk, K.
    Kaleńczuk, R. J.
    Borowiak-Paleń, E.
    Powiązania:
    https://bibliotekanauki.pl/articles/779342.pdf
    Data publikacji:
    2010
    Wydawca:
    Zachodniopomorski Uniwersytet Technologiczny w Szczecinie. Wydawnictwo Uczelniane ZUT w Szczecinie
    Tematy:
    nanorurki węglowe
    chemiczne osadzanie CVD
    spektroskopia Ramana
    transmisyjna mikroskopia elektronowa
    carbon nanotubes
    chemical vapor deposition (CVD)
    Raman spectroscopy
    transmission electron microscopy
    Opis:
    This work presents the results of the synthesis of carbon nanotubes using the CVD method. Fe:MgO catalyst was used, also in combination with rare earth elements (gadolinium (Gd), dysprosium (Dy)), which when used alone, are not efficient as catalysts in nanotube growth. Synthesis was performed both at reduced pressure (10-3 mbar) and atmospheric pressure, with constant parameters dependent on the process parameters.
    Źródło:
    Polish Journal of Chemical Technology; 2010, 12, 3; 29-32
    1509-8117
    1899-4741
    Pojawia się w:
    Polish Journal of Chemical Technology
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Cold plasma in the nanotechnology of catalysts
    Autorzy:
    Tyczkowski, J.
    Kapica, R.
    Powiązania:
    https://bibliotekanauki.pl/articles/778491.pdf
    Data publikacji:
    2007
    Wydawca:
    Zachodniopomorski Uniwersytet Technologiczny w Szczecinie. Wydawnictwo Uczelniane ZUT w Szczecinie
    Tematy:
    kataliza
    nanostruktura
    plazma zimna
    CVD
    tlenek kobaltu
    cienka warstwa
    catalysis
    nanostructures
    cold plasma
    metal-organic chemical vapor deposition
    cobalt oxides
    thin films
    Opis:
    In the paper the preparation of catalysts with the use of cold plasmas is discussed. A special attention is focused on nanocatalysts. In general, there are three main trends in this field: (1) plasma enhanced preparation of ..classical" catalysts, (2) plasma sputtering of catalytically active compounds, especially metal and metal oxide nanoparticles, and (3) plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD) of very thin metal and metal oxide films with specific nanostructure. It is shown that the cold plasma techniques are very effective methods for designing the nanocatalysts with distinct and tunable chemical activity, specificity and selectivity. Finally, our preliminary investigations concerning CoOx catalytic films fabricated by the PEMOCVD method are presented.
    Źródło:
    Polish Journal of Chemical Technology; 2007, 9, 1; 36-42
    1509-8117
    1899-4741
    Pojawia się w:
    Polish Journal of Chemical Technology
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-8 z 8

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