- Tytuł:
- Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films
- Autorzy:
-
Ryu, Sung Yeon
Yun, Hee Ju
Lee, Min Hwan
Choi, Byung Joon - Powiązania:
- https://bibliotekanauki.pl/articles/2049285.pdf
- Data publikacji:
- 2021
- Wydawca:
- Polska Akademia Nauk. Czytelnia Czasopism PAN
- Tematy:
-
gadolinium oxide
Gd2O3
rare-earth oxide
atomic layer deposition
hydrophobicity
electrical property - Opis:
- Gadolinium oxide (Gd2O3) is one of the lanthanide rare-earth oxides, which has been extensively studied due to its versatile functionalities, such as a high permittivity, reactivity with moisture, and ionic conductivity, etc. In this work, GdOx thin film was grown by atomic layer deposition using cyclopentadienyl (Cp)-based Gd precursor and water. As-grown GdOx film was amorphous and had a sub-stoichiometric (x ~ 1.2) composition with a uniform elemental depth profile. ~3 nm-thick GdOx thin film could modify the hydrophilic Si substrate into hydrophobic surface with water wetting angle of 70°. Wetting and electrical test revealed that the growth temperature affects the hydrophobicity and electrical strength of the as-grown GdOx film.
- Źródło:
-
Archives of Metallurgy and Materials; 2021, 66, 3; 755-758
1733-3490 - Pojawia się w:
- Archives of Metallurgy and Materials
- Dostawca treści:
- Biblioteka Nauki