Informacja

Drogi użytkowniku, aplikacja do prawidłowego działania wymaga obsługi JavaScript. Proszę włącz obsługę JavaScript w Twojej przeglądarce.

Wyszukujesz frazę "active screen plasma nitriding" wg kryterium: Temat


Wyświetlanie 1-3 z 3
Tytuł:
Effects of Different Nitriding Methods on Nitrided Layer Structure and Morphology
Autorzy:
Jasiński, J. J.
Frączek, T.
Kurpaska, Ł.
Lubas, M.
Sitarz, M.
Powiązania:
https://bibliotekanauki.pl/articles/355110.pdf
Data publikacji:
2018
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
active screen plasma nitriding
ASPN
nitrided layer
Armco iron
nitriding kinetics
surface morphology
Opis:
The paper presents a comparison of the nitrided layer structure and morphology formed with a conventional controlled gas method, widely use in industrial applications and a layer formed with cathode plasma nitriding (CPN) and active screen plasma nitriding (ASPN). Nitriding processes were realized at 793K for different times and altering parameters, depending on the nitriding process technique. Research have been realized on the Fe Armco material using light microscopy (LM), scanning electron microscopy (SEM, SEM/EBSD), X-ray diffraction (XRD-GID) and atomic force microscopy (AFM). Analysis of the results has confirmed that the structure of the nitrided layer depends mainly on process methodology. In addition Authors has also analyzed kinetics of the process which varies and depends mainly from the surface layer saturation mechanism and nitriding parameters. Acquired knowledge on the structural components of the nitrided layer made it possible to optimize the nitriding parameters in order to reduce or even eliminate the usually unfavorable, brittle compounds and porous zones and of the nitrided layer in the aspect of exploitation properties improvement of the metallic materials.
Źródło:
Archives of Metallurgy and Materials; 2018, 63, 1; 337-345
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Selected plasma nitriding methods usable for the thermo-chemical treatment of aircraft parts
Autorzy:
Grzesiak, G.
Zahorski, T.
Stypniak, M.
Walkowicz, J.
Jurczyszyn, R.
Powiązania:
https://bibliotekanauki.pl/articles/244738.pdf
Data publikacji:
2014
Wydawca:
Instytut Techniczny Wojsk Lotniczych
Tematy:
plasma nitriding
aircraft part
Direct Current Plasma Nitriding
Low Pressure Nitriding in AEGD plasma
Low Pressure Nitriding in Arc Enhanced Glow Discharge plasma
active screen plasma nitriding
Opis:
The aim of the work was to review selected methods of plasma nitriding, which according to the authors might he used in the thermo-chemical treatment of aircraft parts. The introduction explains the nitriding process and presents the requirements on the thermo-chemical treatment of aircraft parts. Three methods of plasma nitriding have been described: Direct Current Plasma Nitriding (DCPN), Active Screen Plasma Nitriding (ASPN) and Low Pressure Nitriding in AEGD (Arc Enhanced Glow Discharge) plasma. While describing DCPN plasma nitriding method, authors drew attention to known problems, which occur in this process such as edge effect or hollow cathode effect. The Keller's model, the Marchand's model and the Walkowicz's model of nitriding process, which can be found in the literature, were also presented in this work. Another purpose of this work was to present hypotheses about the transportation of nitrogen during Active Screen Plasma Nitriding process and to show that in this nitriding method, defects typical for Direct Current Plasma Nitriding do not occur. While describing Low Pressure Nitriding in AEGD plasma, authors also presented the model of nitriding mechanism in this process, which shows four nitrogen diffusion paths (physisorption, chemisorption, adsorption ofNj, ion implantation). Examples of layers obtained by applying described nitriding methods were presented. The measurement ofnitrided layers confirmed that it is possible to obtain a layer without E film on the surface.
Źródło:
Journal of KONES; 2014, 21, 4; 145-152
1231-4005
2354-0133
Pojawia się w:
Journal of KONES
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The Role of Complementary Potential in Plasma Nitriding Processes of Technical Titanium
Autorzy:
Pilarska, M.
Frączek, T.
Maźniak, K.
Powiązania:
https://bibliotekanauki.pl/articles/354692.pdf
Data publikacji:
2018
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
plasma nitriding
active screen
titanium
ion nitriding
Opis:
This article deals with the testing of surface layers produced on technical titanium Ti99.2 under glow discharge conditions. In order to determine the effect of process temperature on the produced surface layers, nitriding processes were carried out at 700°C and 800°C and for 3 and 5 hours. The research results on evaluating the properties of the obtained surface layers and the characterization of their morphology were presented. The impact of the adopted nitriding process variant on the quality of the obtained layers was evaluated. It was demonstrated that the use of the supplementary potential during the ion nitriding process reduces the unwanted edge effect, which results in a significant increase in the homogeneity of the nitrided layers and improves the functional properties of the technical titanium Ti99.2.
Źródło:
Archives of Metallurgy and Materials; 2018, 63, 4; 1637-1642
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

    Ta witryna wykorzystuje pliki cookies do przechowywania informacji na Twoim komputerze. Pliki cookies stosujemy w celu świadczenia usług na najwyższym poziomie, w tym w sposób dostosowany do indywidualnych potrzeb. Korzystanie z witryny bez zmiany ustawień dotyczących cookies oznacza, że będą one zamieszczane w Twoim komputerze. W każdym momencie możesz dokonać zmiany ustawień dotyczących cookies