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Wyświetlanie 1-3 z 3
Tytuł:
Surface Hardening of Ductile Cast Iron by Electrolytic Plasma Technology
Autorzy:
Ayday, A.
Durman, M.
Powiązania:
https://bibliotekanauki.pl/articles/1399796.pdf
Data publikacji:
2013-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.30.Kf
82.33.Xj
68.35.bd
Opis:
Traditional surface modification obligations, surface coatings, and other methods of surface treatment are used to increase the hardness and mechanical properties of specimen surfaces. But those techniques are limited due to the high equipment cost, and material consumption. Electrolytic plasma technology is a special heat treatment process employing electrolysis in an aqueous solution under particular conditions, for instance voltage, current, electrolyte, duration, and heating-quenching rate. In this study, surface modification of GGG70 cast iron was carried out by using electrolytic plasma treatment. Certain voltage and ampere values were performed to obtain good surface properties. Metallographic studies were carried out with an optical microscope to study the hardened and modified surfaces. The effect of impulse time on surface temperature was investigated and it was observed that the temperature on the workpiece increased with increasing impulse time. It was found that the electrolytic plasma treatment could significantly increase hardness of the cast iron.
Źródło:
Acta Physica Polonica A; 2013, 123, 2; 291-293
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Effect of Nitrogen Plasma Afterglow on Amorphous Carbon Nitride Thin Films Deposited by Laser Ablation
Autorzy:
Alkhawwam, A.
Abdallah, B.
Kayed, K.
Alshoufi, K.
Powiązania:
https://bibliotekanauki.pl/articles/1493712.pdf
Data publikacji:
2011-09
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
82.33.Xj
81.15.Fg
78.30.Jw
68.49.Uv
68.37.Ps
68.37.Hk
Opis:
By employing pulsed laser deposition, amorphous carbon nitride $(a-CN_{x})$ thin films, were prepared on unheated Si (100). Investigation of compositional and structural modifications induced by microwave nitrogen plasma afterglow on amorphous carbon nitride thin films, has been carried out in the range of nitrogen pressure 10-1000 Pa. The role of nitrogen plasma afterglow on the physicochemical and structural characteristics of a-$CN_{x}$ was explored using the diagnostic techniques: Raman spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and atomic force microscopy. Upon analyzing the Raman and X-ray photoelectron spectra, it is concluded that employing nitrogen plasma afterglow during the films deposition favors, in general, the increase in nitrogen content and the formation of $sp^2$ bonding in the a-$CN_{x}$ films. The analysis of scanning electron and atomic force microscopy images demonstrated that the films had a granular structure formed from particles coalesced together into cauliflower-like clusters and the particles size increased by increasing nitrogen pressure. A 2D atomic force microscopy line profile measurements provide evidence to a decrease in size of clusters using nitrogen plasma afterglow which could be due to the annihilation of excess vacancies and/or the elimination of grain boundaries. These analyses were found to be quite reliable to help understand the effects of microwave nitrogen plasma afterglow on amorphous carbon nitride thin films.
Źródło:
Acta Physica Polonica A; 2011, 120, 3; 545-551
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Novel Modulator Topology for Corona Plasma Generation
Autorzy:
Ariaans, T.
Pemen, A.
Winands, G.
Liu, Z.
van Heesch, E.
Powiązania:
https://bibliotekanauki.pl/articles/1807899.pdf
Data publikacji:
2009-06
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
52.50.Dg
52.70.Ds
52.70.Kz
52.80.Hc
82.33.Xj
96.60.pf
Opis:
Gas cleaning using plasma technology is slowly introduced into industry nowadays. Several challenges still have to be overcome: increasing the scale, safety, life-time and reducing costs. In 2006 we demonstrated a 20 kW nanosecond pulsed corona system. The electrical efficiency was > 90%. O-radical yields were found to be very high (3-7 mole/kWh). However, to be competitive, high costs of the pulsed power technology are still a major hurdle. Here we present a novel modulator for efficient generation of large volume corona plasma. Only a small amount of expensive high-voltage components are required. Switching is done at an intermediate voltage level of 1 kV with standard thyristors. At the high-voltage side, only a diode and a pulse transformer are needed. The estimated costs are about 5 kEuro/kW, whereas for state-of-the-art pulsed power technology these costs usually are about 20-30 kEuro/kW. Detailed investigations on the modulator and a wire-plate corona reactor will be presented. Modulator parameters have been varied systematically as well as reactor parameters (number of electrodes, electrode-plate distance). The O-radical yield was determined from the measured ozone concentrations at the exhaust of the reactor. With a detailed kinetic model, ozone concentrations could be calculated back to the initial O*-yields. The following conclusions will be discussed: for all parameters, an electrical efficiency of > 90% could be obtained. With fast imaging, the average streamer width was found to be ∼ 737 μm and an estimate for the plasma volume was made. The obtained yields of O-radicals (1-4 mole/kWh) are excellent. The conditions to obtain high yields will be discussed.
Źródło:
Acta Physica Polonica A; 2009, 115, 6; 1034-1036
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

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