Informacja

Drogi użytkowniku, aplikacja do prawidłowego działania wymaga obsługi JavaScript. Proszę włącz obsługę JavaScript w Twojej przeglądarce.

Wyszukujesz frazę "52.70.Ds" wg kryterium: Temat


Wyświetlanie 1-4 z 4
Tytuł:
Experimental Investigation of Low Power Microwave Microplasma Source
Autorzy:
Czylkowski, D.
Hrycak, B.
Jasiński, M.
Mizeraczyk, J.
Powiązania:
https://bibliotekanauki.pl/articles/1198978.pdf
Data publikacji:
2014-06
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
52.50.Dg
52.70.Ds
52.70.Kz
52.80.Pi
Opis:
The aim of this paper is to present a novel microwave microplasma source generated in different gases at atmospheric pressure. The design, rule of operation and experimental investigations of the new microwave microplasma source are described. The main advantage of the presented microwave microplasma source is its small size, simplicity, and low cost of construction and operation. The microplasma has a form of a small plasma jet of dimensions of a few mm, depending on the kind of gas, gas flow rate, and absorbed microwave power. Presented in this paper results of experimental investigations were obtained with an atmospheric pressure argon, krypton, nitrogen, and air microplasma, sustained by microwaves of standard frequency of 2.45 GHz. The absorbed microwave power was up to 70 W. The gas flow rate was from 2 to 25 l/min. The miniature size, simplicity of the source and stability of the microplasma allow to conclude that the presented new microwave microplasma source can find practical applications in various fields.
Źródło:
Acta Physica Polonica A; 2014, 125, 6; 1323-1325
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Automatic Measurement Station for Ferrite Materials Testing
Autorzy:
Charubin, T.
Nowak, P.
Nowicki, M.
Szewczyk, R.
Urbański, M.
Powiązania:
https://bibliotekanauki.pl/articles/1031017.pdf
Data publikacji:
2018-04
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.60.Ej
75.47.Lx
52.70.Ds
Opis:
The paper presents automatic and modular measurement station for the magnetic materials testing. It allows for measurements of magnetic hysteresis loops under various regimes (sine, triangle or arbitrary magnetizing field, sine or triangle magnetic flux density) and relative permeability curves. The modular nature of the system allows for measurements of magnetic parameters under additional external influences, such as temperature and stress. The system is currently used for measurements of ferrite materials parameters.
Źródło:
Acta Physica Polonica A; 2018, 133, 4; 1049-1052
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Growth Rate and Sensing Properties οf Plasma Deposited Silicon Organic Thin Films from Hexamethyldisilazane Compound
Autorzy:
Saloum, S.
Alkhaled, B.
Powiązania:
https://bibliotekanauki.pl/articles/1538698.pdf
Data publikacji:
2010-03
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
52.70.Ds
52.70.Kz
81.15.Gh
68.43.-h
68.55.J-
Opis:
Silicon organic thin films have been prepared by RF hollow cathode plasma chemical vapor deposition system, from hexamethyldisilazane (HMDSN) as the source compound, under different plasma conditions, namely feed gas and applied RF power. The feed gas has been changed from argon to nitrogen, and the power has been varied between 100 W and 300 W in $N_{2}$/HMDSN plasma. The plasma active species (electrons, ion flux rate, and UV radiation) contributing to the films growth mechanisms have been identified by electrical probes and optical emission spectroscopic analysis. The films have been investigated for their thickness and deposition rate, using quartz crystal microbalance, and sensing properties relating to humidity and gas ($NH_{3},$ $CO_{2}$ and $O_{2}$) sorptive investigations, using the piezoelectric effect of quartz crystals of the quartz crystal microbalance. The effect of the different plasma conditions on the plasma phase characteristics and deposited thin films properties, as well as the correlations between deposition rate and plasma characteristics and between sorptive properties, water contact angles and thin films surface morphology are reported.
Źródło:
Acta Physica Polonica A; 2010, 117, 3; 484-489
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Novel Modulator Topology for Corona Plasma Generation
Autorzy:
Ariaans, T.
Pemen, A.
Winands, G.
Liu, Z.
van Heesch, E.
Powiązania:
https://bibliotekanauki.pl/articles/1807899.pdf
Data publikacji:
2009-06
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
52.50.Dg
52.70.Ds
52.70.Kz
52.80.Hc
82.33.Xj
96.60.pf
Opis:
Gas cleaning using plasma technology is slowly introduced into industry nowadays. Several challenges still have to be overcome: increasing the scale, safety, life-time and reducing costs. In 2006 we demonstrated a 20 kW nanosecond pulsed corona system. The electrical efficiency was > 90%. O-radical yields were found to be very high (3-7 mole/kWh). However, to be competitive, high costs of the pulsed power technology are still a major hurdle. Here we present a novel modulator for efficient generation of large volume corona plasma. Only a small amount of expensive high-voltage components are required. Switching is done at an intermediate voltage level of 1 kV with standard thyristors. At the high-voltage side, only a diode and a pulse transformer are needed. The estimated costs are about 5 kEuro/kW, whereas for state-of-the-art pulsed power technology these costs usually are about 20-30 kEuro/kW. Detailed investigations on the modulator and a wire-plate corona reactor will be presented. Modulator parameters have been varied systematically as well as reactor parameters (number of electrodes, electrode-plate distance). The O-radical yield was determined from the measured ozone concentrations at the exhaust of the reactor. With a detailed kinetic model, ozone concentrations could be calculated back to the initial O*-yields. The following conclusions will be discussed: for all parameters, an electrical efficiency of > 90% could be obtained. With fast imaging, the average streamer width was found to be ∼ 737 μm and an estimate for the plasma volume was made. The obtained yields of O-radicals (1-4 mole/kWh) are excellent. The conditions to obtain high yields will be discussed.
Źródło:
Acta Physica Polonica A; 2009, 115, 6; 1034-1036
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-4 z 4

    Ta witryna wykorzystuje pliki cookies do przechowywania informacji na Twoim komputerze. Pliki cookies stosujemy w celu świadczenia usług na najwyższym poziomie, w tym w sposób dostosowany do indywidualnych potrzeb. Korzystanie z witryny bez zmiany ustawień dotyczących cookies oznacza, że będą one zamieszczane w Twoim komputerze. W każdym momencie możesz dokonać zmiany ustawień dotyczących cookies