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    Wyświetlanie 1-6 z 6
    Tytuł:
    Use of Quantum Mechanical Methods to Obtain a Bohm-Type Coefficient of Diffusion
    Autorzy:
    Jiménez-Domínguez, H.
    Powiązania:
    https://bibliotekanauki.pl/articles/1807782.pdf
    Data publikacji:
    2009-08
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    51.20.+d
    52.20.Dq
    52.25.Fi
    52.25.Xz
    Opis:
    A Bohm-type coefficient of diffusion is obtained by means of a procedure starting from the Hamiltonian of a single electron in a dilute plasma in the presence of an external, uniform magnetic field of constant magnitude and an electrical potential that serves to simulate an electrical fluctuation which drives the guiding center drift. Using the concept of the differentiation of operators with respect to time, the formula for the well-known E × B drift velocity is recovered. Finally, the solution of a quantum mechanical equation of motion for the guiding center is found in the quasi-classical approximation to obtain a diffusion coefficient.
    Źródło:
    Acta Physica Polonica A; 2009, 116, 2; 197-202
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Model of Dynamical Correlation in Two-Ionic Strong Coupling Plasmas
    Autorzy:
    Chohra, T.
    Chenini, K.
    Meftah, M.
    Boukraa, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/1807779.pdf
    Data publikacji:
    2009-08
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    52.20.Dq
    52.65.Cc
    47.40.Nm
    05.20.-y
    Opis:
    The dynamics of an impurity ion of charge $q_{0}$ embedded in a two-component ionic plasma is represented as that of a particle in a random medium. The effect of the surroundings on the impurity is represented by a memory function whose form is proposed in this work. Our choice stands for the strongly coupled plasma for which the memory function has an oscillatory behavior with the plasma frequency. The model therefore describes the plasma in the strong coupling limit. We first derive a master equation governed by this memory function and, with the help of the Laplace transform, we solve it via a quartic algebraic equation. We calculate in the end the dynamical properties, i.e. the autocorrelation functions which are very useful in many areas of plasma physics as in radiative transport and in spectral line shape broadening theories.
    Źródło:
    Acta Physica Polonica A; 2009, 116, 2; 193-196
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Use of Quantum Mechanical Methods to Obtain a Bohm-Type Coefficient of Diffusion. Part II
    Autorzy:
    Jiménez-Domínguez, H.
    Powiązania:
    https://bibliotekanauki.pl/articles/1504612.pdf
    Data publikacji:
    2011-06
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    51.20.+d
    52.20.Dq
    52.25.Fi
    52.25.Xz
    05.40.Jc
    42.50.Nn
    Opis:
    The research reported in an article previously published in this journal is pursued here further on. A staircase profile of the graphical representation of the absolute value of the expression for Bohm-type diffusion in two dimensions is analyzed allowing the suggestion that its shape could be related to the well-known structure of levels of the quantized square of the guiding center radius vector and that this structure could be responsible for the appearance of the successive steps in such a profile. When these considerations are taken into account, the expression for Bohm-type diffusion in two dimensions is normalized according to the formula for the quantized square of the guiding center radius vector and a diffusion coefficient whose value is 4/π times the Bohm diffusion coefficient is obtained for large values of the independent variable.
    Źródło:
    Acta Physica Polonica A; 2011, 119, 6; 798-802
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Nitriding of 4140 Annealed Low Alloy Steel in RF Plasma
    Autorzy:
    de la Piedad-Beneitez, A.
    Muñoz-Castro, A.
    Valencia-Alvarado, R.
    López-Callejas, R.
    Mercado-Cabrera, A.
    Peña-Eguiluz, R.
    Rodriguez-Mendez, B.
    Barocio, S.
    Powiązania:
    https://bibliotekanauki.pl/articles/1400469.pdf
    Data publikacji:
    2013-05
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    52.77.Dq
    52.80.Pi
    62.20.Qp
    81.40.Pq
    81.70.Cv
    Opis:
    The annealed low alloy 4140 steel samples have been nitrided for different treatment periods (1-6 h) in an RF inductive plasma discharge with very low bias voltage ( ≈ 400 V). The resulting nitrided layer has been observed by means of an optical microscope whereas the nitride phases have been characterised by X-ray analysis. The corrosion response, assessed by the potentiodynamic tests in the 3.5% NaCl solution, presents both higher noble potential values and lower corrosion rates when compared with the untreated sample. The Vickers microhardness tests values show an appreciable increment compared to that of the untreated sample. The process is characterized by a high overall efficiency because similar average Vickers tests values were obtained, no matter for how long the treatment was extended. Likewise, the scanning electron micrographs confirmed no appreciable size evolution of the compound layer microstructure at different times of treatment.
    Źródło:
    Acta Physica Polonica A; 2013, 123, 5; 904-906
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Aluminium Morphological Modification by Nitrogen-Argon Mixture PIII
    Autorzy:
    Muñoz-Castro, A.
    López-Callejas, R.
    Valencia Alvarado, R.
    Peña-Eguiluz, R.
    Mercado-Cabrera, A.
    Barocio, S.
    Rodríguez-Méndez, B.
    de la Piedad-Beneitez, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/1504099.pdf
    Data publikacji:
    2011-07
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    52.40.Hf
    52.77.Dq
    81.65.-b
    61.05.cp
    62.20.Qp
    68.37.Hk
    Opis:
    With incident fluences of ≈ $10^{12}$ atoms/$cm^2$ aluminium samples have been plasma immersion ion implanted with either pure nitrogen or argon/nitrogen mixtures at temperatures around 450°C. X-ray diffraction studies have validated the formation of the cubic phase of AlN, in samples treated with both the gas mixtures and pure nitrogen. Likewise, the presence of the hexagonal phase of AlN has been detected when either pure nitrogen or a 70%N/30%Ar mixture have been used. The signature peak of AlN has also been confirmed by the Raman spectroscopy. The maximal microhardness values were found in samples treated with the mixture. The maximal roughness was achieved with the equal part mixture in all cases, although increasing with the implantation pulse width up to a 300 nm peak at 150 μs. The latter critical value remains invariant under the pure nitrogen plasma treatment, provided that implantation periods in the order of 4.5 h are carried out.
    Źródło:
    Acta Physica Polonica A; 2011, 120, 1; 167-170
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Structural, Optical and Electrical Properties of Plasma Deposited Thin Films from Hexamethyldisilazane Compound
    Autorzy:
    Saloum, S.
    Alkhaled, B.
    Powiązania:
    https://bibliotekanauki.pl/articles/1505352.pdf
    Data publikacji:
    2011-03
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    52.77.Dq
    81.15.Gh
    73.20.At
    78.20.Ci
    84.37.+q
    Opis:
    Silicon organic thin films have been prepared by RF hollow cathode plasma chemical vapor deposition system, from hexamethyldisilazane (HMDSN) as the source compound, under different plasma conditions, namely feed gas and applied RF power. The feed gas has been changed from argon to nitrogen, and the power has been varied between 100 W and 300 W in $N_2$/HMDSN plasma. The structural properties of the deposited films have been investigated by the Fourier transform infrared spectroscopy technique. Spectrophotometry measurements have been used to determine films optical constants (refractive index, dielectric constant and energy band gap); in addition, the photoluminescence from these films has been recorded. The electrical resistivity of films has been estimated from the measurements of current-voltage characteristics of deposited thin films. The effect of the different plasma conditions on these structural, optical and electrical properties of the prepared thin films, as well as the correlation between the different properties are reported.
    Źródło:
    Acta Physica Polonica A; 2011, 119, 3; 369-373
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-6 z 6

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