Autor: Taran, V. S. - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Recent developments of plasma - based technologies for medicine and industry
Autorzy:: Taran, V. S.
Garkusha, I. E.
Krasnyj, V. V.
Powiązania:: https://bibliotekanauki.pl/articles/146418.pdf
Data publikacji:: 2012
Wydawca:: Instytut Chemii i Techniki Jądrowej
Tematy:: discharge
plasma
ozone sterilizer
coating
surface modification
Opis:: The paper presents an overview of experimental results of various plasma applications based on atmospheric and vacuum discharges. A multifunctional low-temperature ozone sterilizer with a ultrasonic cavitation and dielectric barrier discharge generated at atmospheric pressure as well as ozonators with a diaphragm for water treatment and disinfection of medical tools have been developed. Particular attention is paid to the investigation of arc, high-frequency and non-self maintained discharges generated in vacuum for coatings application. Some aspects of pulsed plasma treatment, surface modification and hardening due to nitriding, oxidation and carburization are discussed.
Źródło:: Nukleonika; 2012, 57, 2; 277-282
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: Non-self-sustained discharge with hollow anode for plasma-based surface treatment
Autorzy:: Misiruk, I. O.
Timoshenko, O. I.
Taran, V. S.
Garkusha, I. E.
Powiązania:: https://bibliotekanauki.pl/articles/147876.pdf
Data publikacji:: 2016
Wydawca:: Instytut Chemii i Techniki Jądrowej
Tematy:: diffusion saturation
film deposition
hollow anode
ion etching
ion pumping
non-self-sustained glow discharge
Opis:: The paper discusses plasma methods for surface modification using the non-self-sustained glow discharge with a hollow anode. This discharge is characterised by low voltage and high values of electron and ion currents. It can be easily excited in vacuum-arc installations that are widely used for coatings deposition. It is shown that such type of discharge may be effectively used for ion pumping, film deposition, ion etching, diffusion saturation of metallic materials, fusion and brazing of metals, and for combined application of above mentioned technologies in a single vacuum cycle.
Źródło:: Nukleonika; 2016, 61, 2; 195-199
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Dostawca treści:: Biblioteka Nauki

Artykuł

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