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    Wyświetlanie 1-4 z 4
    Tytuł:
    Diffusion of Potassium on Nickel
    Autorzy:
    Błaszczyszynowa, M.
    Błaszczyszyn, R.
    Powiązania:
    https://bibliotekanauki.pl/articles/1892562.pdf
    Data publikacji:
    1992-02
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    68.35.Fx
    79.70.+g
    79.90.+b
    Opis:
    The surface diffusion of a potassium dose corresponding to the average coverage Θ̅$\text{}_{K}$ = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migration with the energy Q < 0.16 eV is expected on the close-packed regions {111} and {001} already at liquid N$\text{}_{2}$ temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer.
    Źródło:
    Acta Physica Polonica A; 1992, 81, 2; 285-294
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Interaction of Hydrogen with Vanadium Layers Preadsorbed on Tungsten Field Emitter Tip
    Autorzy:
    Błaszczyszyn, R.
    Wachowicz, E.
    Błaszczyszynowa, M.
    Powiązania:
    https://bibliotekanauki.pl/articles/1968928.pdf
    Data publikacji:
    1998-05
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    79.70.+q
    82.65.My
    Opis:
    Interaction of hydrogen with vanadium layers preadsorbed on a thermally cleaned tungsten field emitter was studied at room temperature and 78 K through measurements of the total work function changes. An increase in the work function followed by its slight decrease at higher exposure can be understood taking into account the possibility of negatively (β$\text{}^{-}$) and positively (β$\text{}^{+}$) polarized adspecies formation on thin vanadium layer. This process leads to vanadium hydride formation. The work function results suggest that hydrogen diffusion into the vanadium layer is meaningful at room temperature. Thermal desorption of hydrogen adsorbate carried out within the temperature range 409-461 K from thin vanadium layer (Θ$\text{}_{V}$ = 40) provided a value of 127 ± 6 kJ/mol for the activation energy for desorption.
    Źródło:
    Acta Physica Polonica A; 1998, 93, 5-6; 763-773
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Thermal Desorption of Potassium from Clean and Sulfur Covered Nickel
    Autorzy:
    Błaszczyszyn, R.
    Błaszczyszynowa, M.
    Gubernator, W.
    Powiązania:
    https://bibliotekanauki.pl/articles/1943955.pdf
    Data publikacji:
    1995-12
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    79.90.+b
    73.30.+y
    79.60.Dp
    Opis:
    Activation energy for thermal desorption of potassium from clean and sulfur covered surfaces of nickel was determined by means of the field emission method. For the low potassium coverage limit (Θ$\text{}_{K}$ ≈ 0.02) the desorption was detected from the whole emitter surface in the temperature range of 825-1000 K for the atoms and of 725-825 K for the species of atoms and ions of the potassium. The activation energies of neutral desorption were found to be E$\text{}_{Ni}^{a}$ = 3.8 eV for the clean nickel and E$\text{}_{S}\text{}_{/}\text{}_{Ni}^{a}$ = 3.0 eV for the sulfur covered nickel, Θ$\text{}_{s}$ ≈ 0.5. The activation energies for the desorption of the species of atoms and ions increased from E$\text{}_{Ni}^{a+i}$ = 2.5 eV for the clean nickel to E$\text{}_{S}\text{}_{/}\text{}_{Ni}^{a+i}$ = 2.9 eV for the sulfur covered nickel Θ$\text{}_{s}$ ≈ 0.5. Also, a value of E$\text{}_{S'}\text{}_{/}\text{}_{Ni}^{a+i}$ = 4.1 eV was found for a higher coverage of sulfur, Θ$\text{}_{s}$ ≈ 1. The results are discussed in terms of Gurney model.
    Źródło:
    Acta Physica Polonica A; 1995, 88, 6; 1151-1160
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Adsorption of H$\text{}_{2}$O on Pt Field Emitter: Surface Diffusion and Field-Induced Effects
    Autorzy:
    Blaszczyszynowa, M.
    Błaszczyszyn, R.
    Bryl, R.
    Powiązania:
    https://bibliotekanauki.pl/articles/1933649.pdf
    Data publikacji:
    1995-09
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    79.90.+b
    68.35.Fx
    79.70.+q
    Opis:
    Adsorption of an Η$\text{}_{2}$O layer onto a Pt field emitter tip under the influence of an electric field and the surface diffusion of water were studied by using the field electron microscopy method. The presence of a negative field (field electron microscopy mode of operation), examined in the range of 33-44 MV/cm, significantly reduced the water coverage on the emitter at temperatures above 120 K. The reduction could also occur upon drawing a high density field emission current when the emitter was kept at 78 K. Surface diffusion of water, which was observed in the temperature range 120-132 K, corresponded to the "unrolling the carpet" mechanism and started from a water multilayer to a surface region water- and/or hydrogen-submonolayer covered. This was accompanied by the transition process from the state of the current- and field-induced redistribution of Η$\text{}_{2}$O to the state of thermal equilibrium. The activation energy of the diffusion was found to be 19 and 25 kJ/mol depending on the crystallographic direction. A positive electric field of 44 MV/cm, which was applied at temperatures of the substrate in excess of 121 K, decreased the field emission of the system and raised the desorption temperature of the layer over 720 K. It is assumed that the negative electric field causes reorientation of Η$\text{}_{2}$O molecules at the surface of platinum tip. The positive as well as negative electric fields promote the field desorption of water, which is in accordance with the results reported before.
    Źródło:
    Acta Physica Polonica A; 1995, 88, 3; 511-526
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-4 z 4

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