- Tytuł:
- Surface roughness and residual stress evolution in SiNx/SiO2 multilayer coatings deposited by reactive pulsed magnetron sputtering
- Autorzy:
-
Tien, Chuen-Lin
Lee, Po-Wei
Lin, Shih-Chin
Lin, Hong-Yi - Powiązania:
- https://bibliotekanauki.pl/articles/1835787.pdf
- Data publikacji:
- 2021
- Wydawca:
- Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
- Tematy:
-
thin film
residual stress
quarter-wave stack
surface roughness - Opis:
- The surface roughness and residual stress behavior in two types of SiNx/SiO2 dielectric quarter-wave stacks was investigated experimentally. A reactive pulsed magnetron sputtering system was used to prepare the SiNx/SiO2 multilayer thin films. The results show that SiNx/SiO2 quarter-wave stack with a buffer layer of MgF2 thin film can reduce the residual stress. The effect of aging on the residual stress in two quarter-wave stacks was also studied. We found that the residual stresses in both SiNx/SiO2 multilayer coatings are changed from a compressive state to a tensile stress state with increasing the aging time. The root mean square (RMS) surface roughness of MgF2/(SiNx/SiO2)22 and (SiNx/SiO2)22 quarter-wave stacks are 2.23 ± 0.22 nm and 2.08 ± 0.20 nm, respectively.
- Źródło:
-
Optica Applicata; 2021, 51, 2; 223-233
0078-5466
1899-7015 - Pojawia się w:
- Optica Applicata
- Dostawca treści:
- Biblioteka Nauki
Artykuł