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Wyświetlanie 1-2 z 2
Tytuł:
Analysis of the electrolytically polished skeletal dentures surfaces using various nano- and microscopic technologies
Autorzy:
Dąbrowa, Tomasz
Majstrzyk, Wojciech
Tamulewicz, Magdalena
Piasecki, Tomasz
Kunicki, Piotr
Więckiewicz, Włodzimierz
Gotszalk, Teodor
Powiązania:
https://bibliotekanauki.pl/articles/306706.pdf
Data publikacji:
2019
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
chropowatość powierzchni
skaningowa mikroskopia elektronowa
proteza ruchoma
mikroskopia skaningowa
surface roughness
scanning electron microscopy
removable partial denture
scanning probe microscopy
optical profilometry
Opis:
The surface roughness of the dental restorations is significant to the denture plaque adhesion. Methods: In this work, we present the complex analysis of the electropolished CoCrW alloy remanium® star (Dentaurum, Germany) samples with laserengraved fiducial marks performed using complementary set of micro- and nanoscopic techniques: optical profilometry (OP), atomic force microscopy (AFM), scanning electron microscopy (SEM) and focused ion beam (FIB) milling. Results: Both mean and RMS roughness of the samples were reduced by electopolishing process, however, the results obtained using OP and AFM exhibited some discrepancies. This was caused by the relatively high local protruding defects developed on the processed surface. The cross-sections of the protrusions were made to analyze the cause of their formation as the EDS elemental content maps revealed that their composition was uniform. We also analyzed the local roughness in the smaller areas free from the defects. Conclusions: In that case, both OP and AFM techniques delivered the same results. Analysis of results showed that various methods used for the surface roughness evaluation have to be used simultaneously to obtain complete and true analysis of the technological CoCrW samples.
Źródło:
Acta of Bioengineering and Biomechanics; 2019, 21, 4; 123-129
1509-409X
2450-6303
Pojawia się w:
Acta of Bioengineering and Biomechanics
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
A method of magnetic field measurement in a scanning electron microscope using a microcantilever magnetometer
Autorzy:
Orłowska, Karolina
Mognaschi, Maria E.
Kwoka, Krzysztof
Piasecki, Tomasz
Kunicki, Piotr
Sierakowski, Andrzej
Majstrzyk, Wojciech
Podgórni, Arkadiusz
Pruchnik, Bartosz
di Barba, Paolo
Gotszalk, Teodor
Powiązania:
https://bibliotekanauki.pl/articles/220725.pdf
Data publikacji:
2020
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
scanning electron microscope
magnetometry
microcantilever
Opis:
Scanning electron microscopy (SEM) is a perfect technique for micro-/nano-object imaging [1] and movement measurement [2, 3] both in high and environmental vacuum conditions and at various temperatures ranging from elevated to low temperatures. In our view, the magnetic field expanding from the pole-piece makes it possible to characterize the behaviour of electromagnetic micro- and nano-electromechanical systems (MEMS/NEMS) in which the deflection of the movable part is controlled by the electromagnetic force. What must be determined, however, is the magnetic field expanding from the e-beam column, which is a function of many factors, like working distance (WD), magnification and position of the device in relation to the e-beam column. There are only a few experimental methods for determination of the magnetic field in a scanning electron microscope. In this paper we present a method of the magnetic field determination under the scanning electron column by application of a silicon cantilever magnetometer. The micro-cantilever magnetometer is a silicon micro-fabricated MEMS electromagnetic device integrating a current loop of lithographically defined dimensions. Its stiffness can be calibrated with a precision of 5% by the method described by Majstrzyk et al. [4]. The deflection of the magnetometer cantilever is measured with a scanning electron microscope and thus, through knowing the bias current, it is possible to determine the magnetic field generated by the e-beam column in a defined position and at a defined magnification.
Źródło:
Metrology and Measurement Systems; 2020, 27, 1; 141-149
0860-8229
Pojawia się w:
Metrology and Measurement Systems
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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