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Wyszukujesz frazę "Jurczyszyn, R." wg kryterium: Wszystkie pola


Wyświetlanie 1-2 z 2
Tytuł:
Selected plasma nitriding methods usable for the thermo-chemical treatment of aircraft parts
Autorzy:
Grzesiak, G.
Zahorski, T.
Stypniak, M.
Walkowicz, J.
Jurczyszyn, R.
Powiązania:
https://bibliotekanauki.pl/articles/244738.pdf
Data publikacji:
2014
Wydawca:
Instytut Techniczny Wojsk Lotniczych
Tematy:
plasma nitriding
aircraft part
Direct Current Plasma Nitriding
Low Pressure Nitriding in AEGD plasma
Low Pressure Nitriding in Arc Enhanced Glow Discharge plasma
active screen plasma nitriding
Opis:
The aim of the work was to review selected methods of plasma nitriding, which according to the authors might he used in the thermo-chemical treatment of aircraft parts. The introduction explains the nitriding process and presents the requirements on the thermo-chemical treatment of aircraft parts. Three methods of plasma nitriding have been described: Direct Current Plasma Nitriding (DCPN), Active Screen Plasma Nitriding (ASPN) and Low Pressure Nitriding in AEGD (Arc Enhanced Glow Discharge) plasma. While describing DCPN plasma nitriding method, authors drew attention to known problems, which occur in this process such as edge effect or hollow cathode effect. The Keller's model, the Marchand's model and the Walkowicz's model of nitriding process, which can be found in the literature, were also presented in this work. Another purpose of this work was to present hypotheses about the transportation of nitrogen during Active Screen Plasma Nitriding process and to show that in this nitriding method, defects typical for Direct Current Plasma Nitriding do not occur. While describing Low Pressure Nitriding in AEGD plasma, authors also presented the model of nitriding mechanism in this process, which shows four nitrogen diffusion paths (physisorption, chemisorption, adsorption ofNj, ion implantation). Examples of layers obtained by applying described nitriding methods were presented. The measurement ofnitrided layers confirmed that it is possible to obtain a layer without E film on the surface.
Źródło:
Journal of KONES; 2014, 21, 4; 145-152
1231-4005
2354-0133
Pojawia się w:
Journal of KONES
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Influence of the Interorbital Interference on the Electron Tunneling in Scanning Tunneling Microscopy
Autorzy:
Jurczyszyn, L.
Powiązania:
https://bibliotekanauki.pl/articles/2036890.pdf
Data publikacji:
2003
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.37.Ef
73.20.-r
73.40.Gk
Opis:
This article presents theoretical study of the influence of the interorbital interference on the electron tunneling in scanning tunneling microscopy. Detailed analysis shows that this kind of interference may modify significantly the tunneling current by the increase or decrease in the current contributions flowing through different orbitals of the surface atoms. This factor might cause the differences between the height and kind of scanning tunneling microscopy corrugation at different metal surfaces. This also might be a source of the unexpectedly high corrugation obtained from scanning tunneling microscopy measurements performed for some metal surfaces, which cannot be explained by the charge distribution along the substrate surface. The effects connected with the interorbital interference will be discussed in the context of the scanning tunneling microscopy simulations performed for Ni$\text{}_{3}$Al (111) and (001) surfaces.
Źródło:
Acta Physica Polonica A; 2003, 104, 3-4; 217-230
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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