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Wyświetlanie 1-8 z 8
Tytuł:
Bioleaching of indium and tin from used LCD panels
Autorzy:
Willner, J.
Fornalczyk, A.
Gajda, B.
Saternus, M.
Powiązania:
https://bibliotekanauki.pl/articles/110195.pdf
Data publikacji:
2018
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
bioleaching
ITO
indium recovery
tin recovery
LCD panels
Opis:
The demand for indium is increasing every year. This metal is mainly used as indium tin oxide (ITO) in the production of transparent conductive coatings for liquid crystal displays (LCD). This paper focuses on biohydrometallurgical methods used for the recovery of indium and tin from LCD sourced from spent mobile phones. Bioleaching experiments were carried out in two different leaching media: 9K medium and H2SO4 solution, using mixed, adapted bacteria Acidothiobacillus ferrooxidans and Acidothiobacillus thiooxidans. The main aim of this study was to evaluate the potential and efficiency of indium and tin extraction in the presence of acidophilic microorganisms. Within 35 days, using 9K medium, 55.6% of indium was bioleached, whereas the chemical leaching resulted in a value of 3.4%. Leaching efficiency of tin was 90.2% on the 14th day of the experiment for the biological system (9K) and 93.4% on 21st day of control leaching.
Źródło:
Physicochemical Problems of Mineral Processing; 2018, 54, 3; 639-645
1643-1049
2084-4735
Pojawia się w:
Physicochemical Problems of Mineral Processing
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
LCD panels bioleaching with pure and mixed culture of Acidithiobacillus
Autorzy:
Willner, Joanna
Fornalczyk, Agnieszka
Saternus, Mariola
Sedlakova-Kadukova, Jana
Gajda, Bernadeta
Powiązania:
https://bibliotekanauki.pl/articles/2146845.pdf
Data publikacji:
2022
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
bioleaching
aciditiooxidans
ITO
indium
tin
LCD panels
recovery
Opis:
The influence of pure and mixed culture of A. ferrooxidans and A. tiooxidans as well as different pulp density (1 and 2%) of LCD panels on the In and Sn bioleaching efficiency was investigated. Pulp density is one of the factors affecting the metals extraction efficiency during biological leaching. It has been shown that lower pulp density results in higher indium and tin dissolution. The A. ferrooxidans bioleaching system showed better metal extraction results than A. thiooxidans, especially for tin, indicating the special role of iron and A. ferrooxidans in tin recovery. The highest leaching rate of both indium (94.7%) and tin (98.2%) was obtained using iron and sulfur medium inoculated with mixed bacteria and a pulp density of 1% w/v.
Źródło:
Physicochemical Problems of Mineral Processing; 2022, 58, 1; 15--23
1643-1049
2084-4735
Pojawia się w:
Physicochemical Problems of Mineral Processing
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Impact of selected parameters on extraction of indium from LCD screens
Wpływ wybranych parametrów na proces ługowania indu z ekranów LCD
Autorzy:
Stępień, M.
Palimąka, P.
Bukowska, A.
Powiązania:
https://bibliotekanauki.pl/articles/263803.pdf
Data publikacji:
2017
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Wydawnictwo AGH
Tematy:
indium
ITO
LCD panels
recycling
ind
panele LCD
recykling
Opis:
Due to the minute availability of indium and its crucial importance to the world economy, it is necessary to find alternative sources of this metal. As a large proportion of indium production is consumed for the purpose of LCD screen manufacturing, it seems reasonable to investigate their recycling leading to the recovery of this metal. The present work investigates the impact of time, temperature, and the concentration of sulfuric acid on the effectiveness of indium extraction from milled LCD panel glass scrap originating from portable computers manufactured between 2005 and 2012. The conclusion of our research defines the optimal conditions for extraction.
Ze względu na niewielkie zasoby indu i jego kluczowe znaczenie dla gospodarki światowej konieczne jest poszukiwanie alternatywnych zasobów tego metalu. Ponieważ ind wykorzystywany jest głównie w produkcji ekranów w technologii LCD, racjonalny wydaje się ich recykling w kierunku odzysku tego pierwiastka. W niniejszej pracy zbadano wpływ czasu, temperatury oraz stężenia kwasu siarkowego na efektywność ługowania indu ze zmielonej frakcji szklanej paneli LCD pochodzących z komputerów przenośnych z lat 2005–2012. W wyniku badań określono optymalne warunki ługowania.
Źródło:
Metallurgy and Foundry Engineering; 2017, 43, 4; 305-311
1230-2325
2300-8377
Pojawia się w:
Metallurgy and Foundry Engineering
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Hydrometallurgical methods of indium recovery from obsolete LCD and LED panels
Hydrometalurgiczne metody odzysku indu z zużytych paneli LCD i LED
Autorzy:
Kristofova, P.
Rudnik, E.
Miskufova, A.
Powiązania:
https://bibliotekanauki.pl/articles/264333.pdf
Data publikacji:
2016
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Wydawnictwo AGH
Tematy:
indium
LCD
LED
ITO
hydrometallurgy
recycling
ind
hydrometalurgia
recykling
Opis:
This paper shows a review of literature data on the possibilities of indium recovery from ITO layers of waste LCD and LED displays. A short characterization of indium, its compounds, resources, production, and applications is presented. The structure and operation of LCD displays are shown. A detailed overview of the ITO leaching process is presented. Methods of indium(III) ion separation from the leachate solutions (SX, HoLLE, IX) as well as recovery of the final products (precipitation, cementation, electrowinning) are also shown.
Artykuł przedstawia przegląd literatury na temat odzysku indu z warstw ITO w zużytych panelach LCD i LED. Przedstawiono krótką charakterystykę indu, jego związków chemicznych, zasobów, produkcji i zastosowań. Omówiono budowę i zasadę działania paneli LCD. W sposób szczegółowy opisano proces ługowania ITO. Przedyskutowano także metody rozdziału jonów indu(III) z roztworów po ługowaniu (SX, HoLLE, IX) oraz odzysku produktów końcowych (strącanie, cementacja, elektroliza).
Źródło:
Metallurgy and Foundry Engineering; 2016, 42, 3; 157-170
1230-2325
2300-8377
Pojawia się w:
Metallurgy and Foundry Engineering
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Morphology of an ITO recombination layer deposited on a silicon wire texture for potential silicon/perovskite tandem solar cell applications
Autorzy:
Kulesza-Matlak, Grazyna
Szindler, Marek
Szindler, Magdalena M.
Sypien, Anna
Major, Lukasz
Drabczyk, Kazimierz
Powiązania:
https://bibliotekanauki.pl/articles/27315696.pdf
Data publikacji:
2023
Wydawca:
Polska Akademia Nauk. Stowarzyszenie Elektryków Polskich
Tematy:
tandem solar cell
silicon nanowires
MAE etching
ITO
recombination layer
Opis:
This paper presents research on the deposition of an indium tin oxide (ITO) layer which may act as a recombination layer in a silicon/perovskite tandem solar cell. ITO was deposited by magnetron sputtering on a highly porous surface of silicon etched by the metal-assisted etching method (MAE) for texturing as nano and microwires. The homogeneity of the ITO layer and the degree of coverage of the silicon wires were assessed using electron microscopy imaging techniques. The quality of the deposited layer was specified, and problems related to both the presence of a porous substrate and the deposition method were determined. The presence of a characteristic structure of the deposited ITO layer resembling a "match" in shape was demonstrated. Due to the specificity of the porous layer of silicon wires, the ITO layer should not exceed 80 nm. Additionally, to avoid differences in ITO thickness at the top and base of the silicon wire, the layer should be no thicker than 40 nm for the given deposition parameters.
Źródło:
Opto-Electronics Review; 2023, 31, 4; art. no. e148222
1230-3402
Pojawia się w:
Opto-Electronics Review
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
ITO layer as an optical confinement for nitride edge-emitting lasers
Autorzy:
Kuc, M.
Sokół, A. K.
Piskorski, Ł.
Dems, M.
Wasiak, M.
Sarzała, R. P.
Czyszanowski, T.
Powiązania:
https://bibliotekanauki.pl/articles/200863.pdf
Data publikacji:
2020
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
edge-emitting lasers
InGaN/GaN
computer simulation
ITO
optical confinement
Opis:
This paper presents the results of a numerical analysis of nitride-based edge-emitting lasers with an InGaN/GaN active region designed for continuous wave room temperature emission of green and blue light. The main goal was to investigate whether the indium thin oxide (ITO) layer can serve as an effective optical confinement improving operation of these devices. Simulations were performed with the aid of a self-consistent thermal-electrical-optical model. Results obtained for green- and blue-emitting lasers were compared. The ITO layer in the p-type cladding was found to effectively help confine the laser mode in the active regions of the devices and to decrease the threshold current density.
Źródło:
Bulletin of the Polish Academy of Sciences. Technical Sciences; 2020, 68, 1; 147-154
0239-7528
Pojawia się w:
Bulletin of the Polish Academy of Sciences. Technical Sciences
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Optimised magnetron sputtering method for the deposition of indium tin oxide layers
Autorzy:
Musztyfaga-Staszuk, Małgorzata
Pudiš, Dušan
Socha, Robert
Gawlińska-Nęcek, Katarzyna
Panek, Piotr
Powiązania:
https://bibliotekanauki.pl/articles/2090684.pdf
Data publikacji:
2021
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
In2O3
Sn2O
ITO
magnetron sputtering method
metoda rozpylania magnetronowego
Opis:
The article presents the method of magnetron sputtering for the deposition of conductive emitter coatings in semiconductor structures. The layers were applied to a silicon substrate. For optical investigations, borosilicate glasses were used. The obtained layers were subjected to both optical and electrical characterisation, as well as structural investigations. The layers on silicon substrates were tested with the four-point probe to find the dependence of resistivity on the layer thickness. The analysis of the elemental composition of the layer was conducted using a scanning electron microscope equipped with an EDS system. The morphology of the layers was examined with the atomic force microscope (AFM) of the scanning electron microscope (SEM) and the structures with the use of X-ray diffraction (XRD). The thickness of the manufactured layers was estimated by ellipsometry. The composition was controlled by selecting the target and the conditions of the application, i.e. the composition of the plasma atmosphere and the power of the magnetrons. Based on the obtained results, this article aims to investigate the influence of the manufacturing method and the selected process parameter on the optical properties of thin films, which should be characterised by the highest possible value of the transmission coefficient (>85–90%) and high electrical conductivity.
Źródło:
Bulletin of the Polish Academy of Sciences. Technical Sciences; 2021, 69, 6; e139005, 1--6
0239-7528
Pojawia się w:
Bulletin of the Polish Academy of Sciences. Technical Sciences
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Review on metallic oxide nanoparticles and their application in optoelectronic devices
Autorzy:
Sosna-Głębska, Aleksandra
Szczecińska, Natalia
Znajdek, Katarzyna
Sibiński, Maciej
Powiązania:
https://bibliotekanauki.pl/articles/105973.pdf
Data publikacji:
2019
Wydawca:
Centrum Badań i Innowacji Pro-Akademia
Tematy:
metallic oxide
nanoparticles
ZnO
TiO2
Indium-Tin Oxide
ITO
solar cell
tlenek metalu
nanocząstki
tlenek cynku
dwutlenek tytanu
tlenek indowo-cynowy
ogniwo słoneczne
Opis:
Among the large family of metallic oxides, there is a considerable group possessing excellent semiconducting properties. What follows, they are promising materials for applications in the field of optoelectronics and photonics. Thanks to the development of nanotechnology in the last few decades, it is now possible to manufacture a great variety of different nanostructures. By controlling their size, shape, composition and crystallinity, one can influence such properties as band gap, absorption properties, surface to volume ratio, conductivity, and, as a consequence, tune the material for the chosen application. The following article reviews the research conducted in the field of application of the metallic oxide nanoparticles, especially ZnO, TiO2 and ITO (Indium-Tin Oxide), in such branches of optoelectronics as solid-state lightning, photodetectors, solar-cells and transparent conducting layers.
Źródło:
Acta Innovations; 2019, 30; 5-15
2300-5599
Pojawia się w:
Acta Innovations
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-8 z 8

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