Autor: Szindler, Marek - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Effect of heat treatment on the surface morphology and optical properties of the Al2O3 thin film for use in solar cells
Autorzy:: Szindler, Marek
Szindler, Magdalena M.
Powiązania:: https://bibliotekanauki.pl/articles/2063888.pdf
Data publikacji:: 2021
Wydawca:: Polska Akademia Nauk. Stowarzyszenie Elektryków Polskich
Tematy:: antireflection coating
atomic layer deposition method
solar cells
Opis:: The technology of manufacturing silicon solar cells is complex and consists of several stages. The final steps in succession are the deposition of antireflection layer and discharge contacts. Metallic contacts are usually deposited by the screen printing method and then, fired at high temperature. Therefore, this article presents the results of a research on the effect of heat treatment on the properties of the Al2O3 thin film previously deposited by the atomic layer deposition method. It works well as both passivating and antireflection coating. Moreover, heat treatment affects the value of the cell short-circuit current and, thus, its efficiency. The surface morphology, optical and electrical properties were investigated, describing the influence of heat treatment on the properties of the deposited layers and the manufactured solar cells.
Źródło:: Opto-Electronics Review; 2021, 29, 4; 181--186
1230-3402
Pojawia się w:: Opto-Electronics Review
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: The Al₂O₃/TiO₂ double antireflection coating deposited by ALD method
Autorzy:: Szindler, Marek
Szindler, Magdalena M.
Orwat, Justyna
Kulesza-Matlak, Grażyna
Powiązania:: https://bibliotekanauki.pl/articles/2174838.pdf
Data publikacji:: 2022
Wydawca:: Polska Akademia Nauk. Stowarzyszenie Elektryków Polskich
Tematy:: antireflection coating
atomic layer deposition method
solar cells
Opis:: Al₂O₃/TiO₂ thin films were deposited onto monocrystalline silicon surfaces using an atomic layer deposition. Their surface morphology and optical properties were examined for their possible use in solar cells. The surface condition and chemical composition were characterized using a scanning electron microscope and the thickness was measured using a spectroscopic reflectometer. The refractive index and the reflection characteristics were determined. First, the optical properties of the Al₂O₃ thin filmand its influence on recombination in the semiconductor were examined. In this way, it can fulfil a double role in a solar cell. Since reflection reduction was only achieved in a narrow range, it was decided to use the Al₂O₃/TiO₂ system. Thanks to this solution, the light reflection was reduced in a wide range (even below 0.2%).
Źródło:: Opto-Electronics Review; 2022, 30, 3; art. no. e141952
1230-3402
Pojawia się w:: Opto-Electronics Review
Dostawca treści:: Biblioteka Nauki

Artykuł

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