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Wyświetlanie 1-5 z 5
Tytuł:
Preparation and Electrochemical Performance of ZnO Films as Anode Materials for Li-Ion Batteries
Autorzy:
Cevher, O.
Cetinkaya, T.
Tocoglu, U.
Guler, M.
Akbulut, H.
Powiązania:
https://bibliotekanauki.pl/articles/1399886.pdf
Data publikacji:
2013-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.05.Dz
81.15.Cd
82.47.Aa
Opis:
In this work, the effect of rf power on the structural, electrical and electrochemical properties of ZnO thin films was investigated. ZnO thin films were deposited on glass and Cr coated stainless steel substrates by rf magnetron sputtering in pure Ar gas environment. ZnO thin films for different rf powers (75, 100, and 125 W) were deposited keeping all other deposition parameters fixed. ZnO thin films were used as negative electrode materials for lithium-ion batteries, whose charge-discharge properties, cyclic voltammetry and cycle performance were examined. A high initial discharge capacity about 908 mAh g^{-1} was observed at a 0.5 C rate between 0.05 and 2.5 V. The crystallographic structure of the sample was determined by X-ray diffraction. The electrical resistivity of the deposited films was measured by the four-point-probe method. The thickness of the ZnO thin films was measured using a profilometer.
Źródło:
Acta Physica Polonica A; 2013, 123, 2; 355-357
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Ultraviolet Detectors Based on ZnO:N Thin Films with Different Contact Structures
Autorzy:
Ievtushenko, A.
Lashkarev, G.
Lazorenko, V.
Karpyna, V.
Sichkovskyi, V.
Kosyachenko, L.
Sklyarchuk, V.
Sklyarchuk, O.
Bosy, V.
Korzhinski, F.
Ulyashin, A.
Khranovskyy, V.
Yakimova, R.
Powiązania:
https://bibliotekanauki.pl/articles/1811930.pdf
Data publikacji:
2008-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.05.Dz
81.15.Cd
85.60.Dw
72.40.+w
Opis:
Al/ZnO:N/Al and Ni/ZnO:N/Al diode photodetectors fabricated by dc magnetron sputtering of ZnO:N films on p-Si substrates are studied. The photocurrent-to-dark current ratio equal to 250 at λ= 390 nm and the time constant of photoresponse about 10 μs for Al/ZnO:N/Al structures with 4 μm interdigital spacing was achieved. The Ni/ZnO:N/Al diode structure has the rectification ratio ≈10² at bias 1 V, the maximal responsivity about 0.1 A/W is observed at 365 nm, and the measured time constant of photoresponse is about 100 ns.
Źródło:
Acta Physica Polonica A; 2008, 114, 5; 1123-1129
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Multilayered ZnO Films of Improved Quality Deposited by Magnetron Sputtering
Autorzy:
Ievtushenko, A.
Karpyna, V.
Lashkarev, G.
Lazorenko, V.
Baturin, V.
Karpenko, A.
Lunika, M.
Dan'ko, A.
Powiązania:
https://bibliotekanauki.pl/articles/1811931.pdf
Data publikacji:
2008-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.05.Dz
81.15.Cd
61.05.cp
68.55.jm
Opis:
Multilayered ZnO films were deposited by rf magnetron sputtering on silicon and sapphire substrates. The aim of this work is to improve structural quality of ZnO thin films grown on just listed substrates. Presented X-ray diffraction data testify to remarkable relaxation of compressive stress in two- and three-layered ZnO films in comparison with single-layer one.
Źródło:
Acta Physica Polonica A; 2008, 114, 5; 1131-1137
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Investigation of Tin Oxide Based Nanocomposites for Li-Ion Batteries
Autorzy:
Cevher, O.
Cetinkaya, T.
Tocoglu, U.
Guler, M.
Akbulut, H.
Powiązania:
https://bibliotekanauki.pl/articles/1399889.pdf
Data publikacji:
2013-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
88.30.rh
81.05.Dz
81.15.Cd
82.47.Aa
Opis:
In this work, tin oxide ($SnO_2$) films were deposited on multiwall carbon nanotube buckypaper using a rf magnetron sputter process in a mixed oxygen/argon (1/9) gas environment. Conditions for the growth of $SnO_2$ thin films on multiwall carbon nanotube buckypaper by rf sputtering are: target composition $SnO_2$ (99.999 wt%); total system pressure 1 Pa; sputtering power (rf) 75, 100 and 125 W, respectively; $O_2//Ar$ (1/9) gas mixture. The surface morphology of the $SnO_2$ multiwall carbon nanotube composite films was investigated by scanning electron microscopy. The crystallographic structure of the sample was determined by X-ray diffraction. The electrochemical properties of $SnO_2$ multiwall carbon nanotube composite anodes were investigated by galvanostatic charge-discharge experiments.
Źródło:
Acta Physica Polonica A; 2013, 123, 2; 358-360
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
ZnO Thin Films Deposited on Sapphire by High Vacuum High Temperature Sputtering
Autorzy:
Borysiewicz, M. A.
Pasternak, I.
Dynowska, E.
Jakieła, R.
Kolkovski, V.
Dużyńska, A.
Kamińska, E.
Piotrowska, A.
Powiązania:
https://bibliotekanauki.pl/articles/2048109.pdf
Data publikacji:
2011-05
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
81.05.Dz
81.15.Cd
61.05.cp
68.37.Hk
68.37.Ps
68.49.Sf
78.55.Et
Opis:
ZnO (0001) layers on sapphire (0001) substrates were fabricated by means of high temperature high vacuum magnetron sputtering. The layers were deposited onto a thin MgO buffer and a low temperature ZnO nucleation layer, which is a technology commonly used in MBE ZnO growth. This paper reports on using this technology in the sputtering regime.
Źródło:
Acta Physica Polonica A; 2011, 119, 5; 686-688
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-5 z 5

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