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Wyświetlanie 1-3 z 3
Tytuł:
Strong and Weak Interlayer Exchange Coupling in V/Fe Multilayers
Autorzy:
Marczyńska, A.
Skoryna, J.
Smardz, L.
Powiązania:
https://bibliotekanauki.pl/articles/1377826.pdf
Data publikacji:
2014-12
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.70.-i
68.55.-a
Opis:
The $d_{V}-V$/0.6 nm-Fe multilayers with constant thickness sublayers were prepared onto naturally oxidised Si(100) substrate using UHV (5× $10^{-10}$ mbar) DC/RF magnetron sputtering. Results showed that the saturation field of the V/Fe multilayers oscillate with antiferromagnetic interlayer exchange coupling peaks near the V spacer thickness of about 1.3, 1.6, 2.05 nm. Furthermore, all the samples with vanadium layer thickness near local maxima of the antiferromagnetic coupling show zero remanence. The short period of the antiferromagnetic peak oscillations is due to indirect Ruderman-Kittel-Kasuya-Yosida (RKKY)-type coupling of the Fe layers across vanadium spacer. The absence of the antiferromagnetic peaks in the very strongly coupled region (below $d_{V}$ ≈ 1 nm) could be explained by direct ferromagnetic exchange coupling of the Fe layers due to magnetic polarization of V atoms near V-Fe interface.
Źródło:
Acta Physica Polonica A; 2014, 126, 6; 1315-1317
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Oxidation Kinetics of Thin and Ultrathin Fe Films
Autorzy:
Marczyńska, A.
Skoryna, J.
Lewandowski, M.
Smardz, L.
Powiązania:
https://bibliotekanauki.pl/articles/1387032.pdf
Data publikacji:
2015-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.70.-i
68.55.-a
Opis:
We have studied oxidation kinetics of Fe thin films under atmospheric conditions using the fact that metallic iron is a ferromagnet but ultrathin natural iron oxides are practically nonmagnetic at room temperature. As a consequence, oxidation is associated with a loss in ferromagnetism. Fe thin films were deposited onto 1.5 nm V thick buffer layer using UHV magnetron sputtering. As a substrate we have used Si(100) wafers with an oxidised surface. Results show that all samples with an initial Fe thickness greater than 6 nm oxidize practically instantaneously, whereby a constant amount of 2.5 nm of metal is transformed into oxides. For iron thickness lower than 6 nm the time constant for oxidation increases considerably reaching a value of 30 days for the initial Fe thickness equal to 4 nm.
Źródło:
Acta Physica Polonica A; 2015, 127, 2; 549-551
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Growth and Structural Characterisation of V/Fe Multilayers
Autorzy:
Marczyńska, A.
Skoryna, J.
Szymański, B.
Smardz, L.
Powiązania:
https://bibliotekanauki.pl/articles/1387036.pdf
Data publikacji:
2015-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.70.-i
68.55.-a
Opis:
The (110) oriented V/Fe multilayers were prepared at room temperature using UHV magnetron sputtering. As a substrate we have used Si(100) wafers with an oxidised surface. The surface chemical composition and the cleanness of all layers was checked in situ, immediately after deposition, transferring the samples to an UHV analysis chamber equipped with X-ray photoelectron spectroscopy. The structure of the multilayers has been studied ex situ by low- and high-angle X-ray diffraction. The modulation wavelength was determined from the spacing between satellite peaks in the X-ray diffraction patterns. Results were consistent with the values obtained from total thickness divided by the number of repetitions. Growth of the Fe (V) on 1.6 nm V (Fe) underlayer was studied by succesive deposition and X-ray photoelectron spectroscopy measurements starting from 0.2 nm of Fe (V) layer, respectively. From the exponential variation of the X-ray photoelectron spectroscopy Fe 2p and V 2p integral intensities with increasing layer thickness we conclude that the Fe and V sublayers grow homogeneously in the planar mode.
Źródło:
Acta Physica Polonica A; 2015, 127, 2; 552-554
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

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