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    Wyświetlanie 1-8 z 8
    Tytuł:
    Hydrogen Absorption in Gd Thin Films
    Autorzy:
    Marczyńska, A.
    Pacanowski, S.
    Szymański, B.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1030512.pdf
    Data publikacji:
    2018-03
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    75.70.-i
    68.55.-a
    Opis:
    In this contribution we have studied an initial hydrogen absorption in Gd thin films using in-situ X-ray photoelectron spectroscopy (XPS) and ex-situ standard X-ray diffraction. As an initial hydrogen absorption indicator we have used broadening of the Gd-4f peak. The Gd thin films with a thickness of 200 nm were deposited at room temperature (RT) using UHV RF magnetron sputtering. As a substrate we have used naturally oxidised Si(100) wafers with 20 nm - Pd buffer layer. Furthermore, hydrogen absorption kinetics under a pressure of 100 mbar in Pd covered 200 nm Gd thin film was studied at RT using four-point resistivity measurements.
    Źródło:
    Acta Physica Polonica A; 2018, 133, 3; 624-627
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    XPS and UPS Valence Band Studies of Nanocrystalline Ni-Ti Alloy Thin Films
    Autorzy:
    Pacanowski, S.
    Skoryna, J.
    Szajek, A.
    Marczyńska, A.
    Dawczak-Dębicki, H.
    Werwiński, M.
    Majchrzycki, Ł.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1030748.pdf
    Data publikacji:
    2018-03
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    73.22.-f
    68.55.-a
    82.80.Pv
    Opis:
    In this contribution we study valence bands of in-situ prepared nanocrystalline NiTi and Ni₃Ti alloy thin films using X-ray and ultraviolet photoelectron spectroscopy. Additionally, theoretical valence band of NiTi alloy was calculated by ab-initio methods. The structure and morphology of the samples were studied by X-ray diffraction and atomic force microscopy, respectively. Furthermore, hydrogen absorption and desorption kinetics at a pressure of about 1000 mbar were studied in Pd covered nanocrystalline NiTi alloy thin film using four-point resistivity measurements. Results showed that modifications of the valence bands of the Ni-Ti thin films due nanocrystalline structure can influence on the room temperature hydrogen absorption and desorption kinetics.
    Źródło:
    Acta Physica Polonica A; 2018, 133, 3; 613-616
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Electronic Properties of In Situ Prepared Nanocrystalline Fe-Ni-Ti Alloy Thin Films
    Autorzy:
    Pacanowski, S.
    Skoryna, J.
    Marczyńska, A.
    Skoryna, D.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1386482.pdf
    Data publikacji:
    2015-02
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    73.22.-f
    68.55.-a
    Opis:
    In this contribution we study experimentally the electronic properties of nanocrystalline Fe-Ni-Ti alloy thin films using X-ray photoelectron spectroscopy. The structure of the samples has been studied by X-ray diffraction. Their bulk chemical compositions were measured using X-ray fluorescence method. The surface chemical composition and the cleanness of all samples were checked in situ, immediately after deposition, transferring the samples to an UHV analysis chamber equipped with X-ray photoelectron spectroscopy. X-ray diffraction studies revealed the formation of nanocrystalline Fe-Ni-Ti alloy thin films at a substrate temperature of about 293 K. In situ X-ray photoelectron spectroscopy studies showed that the valence bands of nanocrystalline samples are broader compared to those measured for the polycrystalline bulk alloys. Such modifications of the valence bands of the nanocrystalline alloy thin films could influence on their hydrogenation properties.
    Źródło:
    Acta Physica Polonica A; 2015, 127, 2; 436-438
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Modification of Exchange Coupling in Fe/Nb/Fe/Pd Layered Structures using Hydrogen
    Autorzy:
    Wachowiak, M.
    Marczyńska, A.
    Dawczak-Dębicki, H.
    Pugaczowa-Michalska, M.
    Pacanowski, S.
    Majchrzycki, Ł.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1030744.pdf
    Data publikacji:
    2018-03
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    75.70.-i
    68.55.-a
    Opis:
    Fe/Nb/Fe trilayers were prepared at room temperature using UHV magnetron sputtering. The interlayer exchange coupling energy was determined from a shift of the minor hysteresis loop from the origin. Results showed clear antiferromagnetic (AF) coupling maxima near ım6 and 9 monolayers of Nb spacer. Calculations of the interlayer exchange coupling energy were carried out using ab-initio method with localized spin density approximations of exchange-correlation potential. The experimental results were in good agreement with ab-initio calculations. Furthermore, the position of the AF peaks and coupling energy values could be modified using hydrogen.
    Źródło:
    Acta Physica Polonica A; 2018, 133, 3; 609-612
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Depth Profiling of Defects in He Implanted $SiO_2$
    Autorzy:
    Mariazzi, S.
    Toniutti, L.
    Brusa, R.
    Duarte Naia, M.
    Karbowski, A.
    Karwasz, G.
    Powiązania:
    https://bibliotekanauki.pl/articles/1812538.pdf
    Data publikacji:
    2008-05
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    71.60.+z
    78.70.Bj
    68.55.-a
    61.82.Ms
    61.72.J-
    Opis:
    Thin layer of $SiO_2$ thermally grown on p-type Si was implanted with $He^+$ ions at 30 keV with a dose of $5×10^{15}$ ions/$cm^2$. $SiO_2//Si$ samples were depth profiled by Doppler broadening positron annihilation spectroscopy to identify induced defects in the silicon oxide, at the interface and in the Si substrate. In one sample the silicon dioxide layer was removed by etching after implantation. It is shown that removing the silicon dioxide layer some more information about defects into the substrate can be found.
    Źródło:
    Acta Physica Polonica A; 2008, 113, 5; 1447-1453
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Preparation and Characterisation of Fe/Ce Multilayer
    Autorzy:
    Dawczak-Dębicki, H.
    Marczyńska, A.
    Pacanowski, S.
    Szymański, B.
    Majchrzycki, Ł.
    Kowalski, W.
    Grembowski, W.
    Bilski, T.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1030530.pdf
    Data publikacji:
    2018-03
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    75.70.-i
    68.55.-a
    Opis:
    Ce/Fe multilayer (ML) with constant Fe (2 nm) and Ce (4.5 nm) sublayer thicknesses was prepared onto naturally oxidised Si(100) substrate using magnetron sputtering. Chemical purity of the sublayers was revealed in-situ by X-ray photoelectron spectroscopy (XPS) measurements. The structure of the sample was studied by standard low- and high-angle X-ray diffraction (XRD). Surface morphology of the ML was examined by atomic force microscopy. Magnetic properties of the sample was studied in the temperature range between 5 and 350 K using a vibrating sample magnetometer in a magnetic field up to 9 T. The hysteresis loops were measured in field perpendicular and parallel to the substrate. Furthermore, hydrogen absorption at a pressure of about 1000 mbar was studied at room temperature (RT) in Pd covered ML using four-point resistivity measurements. The solid state amorphisation reaction have been confirmed by XRD and magnetic measurements of the Ce/Fe ML. The absence of satellite peaks in the low - angle XRD pattern revealed no artificial layered structure. The above results show that interdiffusion of cerium and iron atoms is extremely fast at RT.
    Źródło:
    Acta Physica Polonica A; 2018, 133, 3; 628-631
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    MOCVD of High Quality LuBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-δ}$ Thin Films
    Autorzy:
    Samoylenkov, S. V.
    Gorbenko, O. Yu.
    Graboy, I. E.
    Kaul, A. R.
    Svetchnikov, V. L.
    Zandbergen, H. W.
    Powiązania:
    https://bibliotekanauki.pl/articles/1964530.pdf
    Data publikacji:
    1997-07
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    81.15.Hi
    68.55.-a
    Opis:
    Epitaxial LuBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-δ}$ films were prepared by flash evaporation MOCVD on LaAlO$\text{}_{3}$, SrTiO$\text{}_{3}$, LaSrGaO$\text{}_{4}$ and ZrO$\text{}_{2}$(Y$\text{}_{2}$O$\text{}_{3}$) single crystalline substrates. The highest T$\text{}_{c}$ and j$\text{}_{c}$ (77 K, 100 Oe) values were 89 K, 2.7×10$\text{}^{6}$ A/cm$\text{}^{2}$ (LaAlO$\text{}_{3}$) and 88 K, 1.5×10$\text{}^{6}$ A/cm$\text{}^{2}$ (SrTiO$\text{}_{3}$) respectively. The occurrence of secondary phases inclusions in LuBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-δ}$ films correlates with the possibility of epitaxial relations with the film matrix or the substrate.
    Źródło:
    Acta Physica Polonica A; 1997, 92, 1; 243-247
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Natural xidation of thin Fe films on V buffer layer
    Autorzy:
    Dawczak-Dębicki, H.
    Marczyńska, A.
    Rogowska, A.
    Wachowiak, M.
    Nowicki, M.
    Pacanowski, S.
    Jabłoński, B.
    Kowalski, W.
    Grembowski, J.
    Czajka, R.
    Smardz, L.
    Powiązania:
    https://bibliotekanauki.pl/articles/1055062.pdf
    Data publikacji:
    2017-10
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    75.70.-i
    68.55.-a
    Opis:
    We have studied oxidation kinetics of Fe thin film under atmospheric conditions using the fact that metallic iron is a ferromagnet but ultrathin natural iron oxides are approximately nonmagnetic at room temperature. As a consequence, oxidation is associated with a loss in total Fe magnetic moment. Results show that the sample with an initial Fe thickness equal to 10 nm oxidize relatively fast (time constant τ=0.05 day), whereby a constant amount of 2.5 nm of metal is transformed into oxides. For lower iron initial thickness (d_{i}=4 nm) the time constant for oxidation significantly increases reaching a value of 2 days. Furthermore, X-ray photoelectron spectroscopy studies performed after 144 days of oxidation revealed formation of hematite (α-Fe₂O₃) thin film on the metallic rest of iron.
    Źródło:
    Acta Physica Polonica A; 2017, 132, 4; 1272-1276
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-8 z 8

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