Temat: optical density - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: A survey of anti-Ostertagia ostertagii antibody levels in bulk tank milk samples (BTM) in dairy herds in Lower Silesia Region (Poland)
Autorzy:: Ploneczka-Janeczko, K.
Piekarska, J.
Rypula, K.
Mazurkiewicz, M.
Powiązania:: https://bibliotekanauki.pl/articles/31890.pdf
Data publikacji:: 2011
Wydawca:: Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:: bulk tank milk
Lower Silesian region
Ostertagia ostertagi
Polska
antibody level
bulk tank
herd
bulk tank milk sample
ELISA test
optical density ratio
parasite
animal infection
production loss
cattle
dairy cattle
Opis:: This work presents serological evidence of cattle ostertagiosis in the Lower Silesia Region (Poland), based on the measurement of antibodies in bulk tank milk (BTM) samples. It represents the first evidence of this parasite examined with the use of the ELISA test and milk samples in Poland. The prevalence of Ostertagia ostertagii antibodies was determined in BTM from 32 dairy cattle herds. Antibodies to O. ostertagii were demonstrated in all herds. The optical density ratio (ODR) varied from -0.088 to 1.024. The mean ODR value in the examined region was 0.53.
Źródło:: Polish Journal of Veterinary Sciences; 2011, 14, 1
1505-1773
Pojawia się w:: Polish Journal of Veterinary Sciences
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 2.

Tytuł:: Temperature Effect on the Growth Rate and Physical Characteristics of SnO2 Thin Films Grown by Atomic Layer Deposition
Autorzy:: Kim, D.
Kim, D. H.
Riu, D.-H.
Choi, B. J.
Powiązania:: https://bibliotekanauki.pl/articles/353808.pdf
Data publikacji:: 2018
Wydawca:: Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:: atomic layer deposition
tin oxide
growth rate
film density
optical band gap
Opis:: Among the various thin film coating techniques, atomic layer deposition (ALD) has features of good controllability of the thickness, excellent step-coverage in 3-dimensional object even in the sub-nm thickness range at the relatively low deposition temperature. In this study, SnO₂ thin films were grown by ALD in the variation of substrate temperatures from 150 to 250°C. Even such a low temperature may influence on the growth kinetics of the ALD reaction and thus the physical characteristics of thin films, such as crystallinity, film density and optical band gap, etc. We observed the decrease of the growth rate with increasing substrate temperature, at the same time, the density of the film was decreased with increasing temperature. Steric hindrance effect of the precursor molecule was attributed to the inverse relationship of the growth temperature and growth rate as well as the film density. Optical indirect band gap energy (~3.6 eV) of the ALD-grown amorphous SnO₂ films grown at 150°C was similar with that of the literature value, while slightly lower band gap energy (~3.4 eV) was acquired at the films grown at higher temperature.
Źródło:: Archives of Metallurgy and Materials; 2018, 63, 2; 1061-1064
1733-3490
Pojawia się w:: Archives of Metallurgy and Materials
Dostawca treści:: Biblioteka Nauki

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