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    Wyświetlanie 1-4 z 4
    Tytuł:
    Thermodynamic Temperature and Density of Ar(I) for 4S[1/2]0 State in a Facing Target Sputtering System
    Autorzy:
    Yasuda, Y.
    Nishimiya, N.
    Hoshi, Y.
    Suzuki, M.
    Powiązania:
    https://bibliotekanauki.pl/articles/1791238.pdf
    Data publikacji:
    2009-10
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    32.30.-r
    42.62.Fi
    52.70.-m
    Opis:
    The 4S' [1/2]0 → 4P' [3/2]1 transition of Ar(I) in a facing target sputtering chamber is measured using a Ti:sapphire ring laser at several operating conditions. Doppler width and line intensity are determined by analysis using the Voigt function. The thermodynamic temperature determined from the Doppler width increases linearly with discharge current and gas pressure. The population density from the line intensity is reduced to the reference temperature obtained by interpolating the discharge current to zero. The empirical relationship to describe population density at a discharge current and a gas pressure is discussed.
    Źródło:
    Acta Physica Polonica A; 2009, 116, 4; 560-562
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Investigation of Porous Zn Growth Mechanism during Zn Reactive Sputter Deposition
    Autorzy:
    Borysiewicz, M.
    Wojciechowski, T.
    Dynowska, E.
    Kamińska, E.
    Piotrowska, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/1198573.pdf
    Data publikacji:
    2014-05
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    52.70.-m
    81.15.Cd
    77.55.hf
    81.10.Pq
    52.27.Cm
    Opis:
    Ar-O-Zn plasma discharges created during DC reactive magnetron sputtering of a Zn target and RF reactive magnetron sputtering of a ceramic ZnO target were investigated and compared by means of the Langmuir probe measurements in order to determine the mechanism of growth of porous Zn films during DC-mode Zn reactive sputtering. The power supplied to the magnetrons during the sputtering was kept at 125 W and the plasma was characterised as a function of oxygen content in the sputtering gas mixture, ranging from 0 to 60% for two gas pressures related to porous Zn film deposition, namely 3 mTorr and 5 mTorr. Based on the correlation of plasma properties measurements with scanning electron microscope imaging and X-ray diffraction of the films deposited under selected conditions it was found that the growth of porous, polycrystalline Zn films was governed by high electron density in the plasma combined with a high electron temperature and an increased energy of the ions impinging on the substrate.
    Źródło:
    Acta Physica Polonica A; 2014, 125, 5; 1144-1148
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Microplasma Noise Stimulated by Microwave Electric Field
    Autorzy:
    Namajūnas, A.
    Tamaševičius, A.
    Mykolaitis, G.
    Bumelienė, S.
    Požela, J.
    Powiązania:
    https://bibliotekanauki.pl/articles/2041773.pdf
    Data publikacji:
    2005-02
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    05.40.Ca
    52.25.Gj
    72.70.+m
    85.30.-z
    Opis:
    Si and GaAs avalanche diodes containing microplasmas are investigated. Microwave field applied to the diode in addition to reverse dc bias results in considerable spread of noise spectrum and in the increase of noise power. The microplasma noise spectra cover very high (30 to 300 MHz) and ultrahigh (300 to 1000 MHz) frequency bands, while the effective noise temperature is about 10$\text{}^{8}$ K.
    Źródło:
    Acta Physica Polonica A; 2005, 107, 2; 369-372
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Numerical Analysis of Metal-Cylinder-Based Microwave Plasma Module
    Autorzy:
    Sobański, M.
    Jasiński, M.
    Mizeraczyk, J.
    Powiązania:
    https://bibliotekanauki.pl/articles/1366115.pdf
    Data publikacji:
    2014-06
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    88.80.hp
    84.40.-x
    52.35.Hr
    84.40.Dc
    02.70.Dh
    88.30.E-
    52.65.-y
    52.50.Dg
    11.55.-m
    52.40.Fd
    84.40.Az
    Opis:
    We present optimization of energy transfer in the waveguide-supplied metal-cylinder-based microwave plasma module with an inner cylindrical quartz tube. The construction of microwave plasma module is based on a WR 340 waveguide standard. Presented microwave plasma module operates at atmospheric pressure and frequency of 2.45 GHz. There is a reduced height section waveguide in microwave plasma module which provides local increase of the electric field in the plasma region. Microwave plasma module is terminated with a movable plunger which plays the role of the tuning element. Tuning characteristics of microwave plasma module are defined as the dependence of the $P_{R}$/$P_{I}$ on the position $l_{s}$ of the movable plunger, where $P_{R}$ and $P_{I}$ are the microwave power reflected and power incident, respectively. The powers $P_{R}$ and $P_{I}$ are measured in the input plane of microwave plasma module. The purpose of the presented optimization is to achieve $P_{R}$ lower than 5% of $P_{I}$ in widest range of position of movable plunger $l_{s}$. We used Comsol Multiphysics software to make numerical analysis which allows to optimize the parameters of microwave plasma module. Results of numerical analysis show that $P_{R}$/$P_{I}$ is lower than 0.05 in a wide range of movable plunger position $l_{s}$.
    Źródło:
    Acta Physica Polonica A; 2014, 125, 6; 1309-1311
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-4 z 4

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