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Wyszukujesz frazę "CVD diamond" wg kryterium: Temat

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    Wyświetlanie 1-5 z 5
    Tytuł:
    Wear evaluation of CVD diamond coated high-performance drilling tools for machining of carbon fiber reinforced plastics (CFRP)
    Autorzy:
    Uhlmann, Eckart
    Reimers, Walter
    Hinzmann, Daniel
    Christiansen, Gerret
    Böttcher, Katrin
    Powiązania:
    https://bibliotekanauki.pl/articles/100175.pdf
    Data publikacji:
    2020
    Wydawca:
    Wrocławska Rada Federacji Stowarzyszeń Naukowo-Technicznych
    Tematy:
    CVD diamond
    coated tools
    CFRP machining
    drilling
    Opis:
    The application of carbon fiber reinforced plastics (CFRP) as lightweight construction material in aerospace industry is based on the favorable weight-to-strength ratio. But the inherent material properties pose great challenges for the tool- as well as the manufacturing industry. In terms of economic industrial production processes, the quality of machined workpieces exhibits poor reproducibility combined with high tool wear. For this purpose, high-performance drilling tools with different CVD diamond coatings and carbide substrates with varying binder content were tested and analyzed in order to assess coating adhesion and workpiece quality. Due to a reduction of cobalt binder within the tungsten carbide-based tool substrates, an increase of tool performance regarding borehole quantity until coating delamination is demonstrated. While the reduction of tool wear on the rake face of the drilling tools can be correlated with the cutting tool performance, the online monitoring of cutting forces does not explicitly identify damaged cutting tools during machining.
    Źródło:
    Journal of Machine Engineering; 2020, 20, 2; 104-113
    1895-7595
    2391-8071
    Pojawia się w:
    Journal of Machine Engineering
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    CVD diamond detectors for fast alpha particles escaping from the tokamak D-T plasma
    Autorzy:
    Wodniak, I.
    Drozdowicz, K.
    Dankowski, J.
    Gabańska, B.
    Igielski, A.
    Kurowski, A.
    Marczewska, B.
    Nowak, T.
    Woźnicka, U.
    Powiązania:
    https://bibliotekanauki.pl/articles/146634.pdf
    Data publikacji:
    2011
    Wydawca:
    Instytut Chemii i Techniki Jądrowej
    Tematy:
    CVD diamond detector
    lost alpha particles
    high temperature plasma diagnostics
    Opis:
    Measurements of the so-called lost alpha particles escaping from thermonuclear plasma in future tokamaks (such as ITER) for energy production would be essential for monitoring the energy balance in these devices. The detection would have to be carried out in a harsh environment (with high nuclear radiation fluxes, high temperature, etc.), which limits the use of common semiconductors for charged particle detection. Diamond seems to be an attractive material for alpha particle detectors in these conditions. In this paper an analysis of properties of a diamond detector for spectrometric alpha measurements is reported. A high purity CVD (chemical vapour deposition) single crystal diamond detector was used, fabricated for this dedicated application by the Diamond Detector Ltd. The energy calibration was carried out using a triple alpha particle isotope source, AMR33 (239Pu, 241Am, 244Cm). A very good energy resolution, ca. 20 keV at ca. 5.5 MeV had been obtained, which is comparable to that of the silicon detector. The linearity of the diamond detector amplitude response to the alpha particle energy was analyzed with the use of mono-energetic (0.4–2 MeV) ion beam from a Van de Graaff accelerator. Results of the measurements using the AMR33 source deviate at most 30 keV from the calibration line obtained in this way.
    Źródło:
    Nukleonika; 2011, 56, 2; 143-147
    0029-5922
    1508-5791
    Pojawia się w:
    Nukleonika
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Laser reflectance interferometry system with a 405 nm laser diode for in situ measurements of CVD diamond thickness
    Autorzy:
    Kraszewski, M.
    Bogdanowicz, R.
    Powiązania:
    https://bibliotekanauki.pl/articles/221654.pdf
    Data publikacji:
    2013
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    interferometry
    thin films
    CVD
    diamond
    in situ measurements
    Opis:
    In situ monitoring of the thickness of thin diamond films during technological processes is important because it allows better control of deposition time and deeper understanding of deposition kinetics. One of the widely used techniques is laser reflectance interferometry (LRI) which enables non-contact measurement during CVD deposition. The authors have built a novel LRI system with a 405 nm laser diode which achieves better resolution compared to the systems based on He-Ne lasers, as reported so far. The system was used for in situ monitoring of thin, microcrystalline diamond films deposited on silicon substrate in PA-CVD processes. The thickness of each film was measured by stylus profilometry and spectral reflectance analysis as a reference. The system setup and interferometric signal processing are also presented for evaluating the system parameters, i.e. measurement uncertainty, resolution and the range of measurable film thickness.
    Źródło:
    Metrology and Measurement Systems; 2013, 20, 4; 543-554
    0860-8229
    Pojawia się w:
    Metrology and Measurement Systems
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Characterization of optical and electrical properties of transparent conductive boron-doped diamond thin films grown on fused silica
    Autorzy:
    Bogdanowicz, R.
    Powiązania:
    https://bibliotekanauki.pl/articles/221053.pdf
    Data publikacji:
    2014
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    CVD
    boron-doped diamond
    optical properties
    optical coatings
    spectroscopic ellipsometry
    Opis:
    Abstract A conductive boron-doped diamond (BDD) grown on a fused silica/quartz has been investigated. Diamond thin films were deposited by the microwave plasma enhanced chemical vapor deposition (MW PECVD). The main parameters of the BDD synthesis, i.e. the methane admixture and the substrate temperature were investigated in detail. Preliminary studies of optical properties were performed to qualify an optimal CVD synthesis and film parameters for optical sensing applications. The SEM micro-images showed the homogenous, continuous and polycrystalline surface morphology; the mean grain size was within the range of 100-250 nm. The fabricated conductive boron-doped diamond thin films displayed the resistivity below 500 mOhm cm-1 and the transmittance over 50% in the VIS-NIR wavelength range. The studies of optical constants were performed using the spectroscopic ellipsometry for the wavelength range between 260 and 820 nm. A detailed error analysis of the ellipsometric system and optical modelling estimation has been provided. The refractive index values at the 550 nm wavelength were high and varied between 2.24 and 2.35 depending on the percentage content of methane and the temperature of deposition.
    Źródło:
    Metrology and Measurement Systems; 2014, 21, 4; 685-698
    0860-8229
    Pojawia się w:
    Metrology and Measurement Systems
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Raman modular system with fibre-optic probes for remote monitoring of CVD process
    Modułowy system ramanowski z sondami światłowodowymi do zdalnego monitorowania procesów CVD
    Autorzy:
    Gnyba, M.
    Bogdanowicz, R.
    Wroczyński, P.
    Powiązania:
    https://bibliotekanauki.pl/articles/256741.pdf
    Data publikacji:
    2006
    Wydawca:
    Sieć Badawcza Łukasiewicz - Instytut Technologii Eksploatacji - Państwowy Instytut Badawczy
    Tematy:
    spektroskopia ramanowska
    monitoring in-situ
    sonda światłowodowa
    CVD
    cienka warstwa diamentowa
    Raman spectroscopy
    in-situ monitoring
    fibre-optic probe
    chemical vapour deposition
    diamond thin film
    Opis:
    Dedicated Raman system was designed for in-situ monitoring of thin film growth in CVD (chemical vapour deposition) process. Review of monitoring requirements and limiting factors is given in this paper. Computer simulation of laser beam propagation in the CVD chamber and the thin film was carried out. Components for Raman optical probes and their configuration were selected using results of the modelling. Ex-situ investigation of the thin films enabled determination of the Raman scattering intensity. The prototype of the modular Raman system using fibre-optic probes was built. Efficiency of optical signal transmission through the probes was tested.
    W artykule przedstawiono projekt systemu ramanowskiego do monitorowania in-situ wzrostu cienkich warstw w procesie CVD i analizę związanych z tym problemów metrologicznych. Na podstawie wyników modelowania komputerowego wprowadzania wiązki laserowej do komory i jej propagacji w cienkiej warstwie wytypowano optymalną konfigurację optyczną systemu ramanowskiego i określono parametry optyczne jego elementów. Zbudowano prototyp modułowego wyposażonego w sondy światłowodowe. Wykonano pomiary wstępne obejmujące badania ex-situ generacji sygnału ramanowskiego w wybranych materiałach oraz testy sondy nadawczej na stole optycznym.
    Źródło:
    Problemy Eksploatacji; 2006, 4; 115-127
    1232-9312
    Pojawia się w:
    Problemy Eksploatacji
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-5 z 5

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