- Tytuł:
- Adsorption of Oxygen on HF-Etched Si(111) Surfaces: XPS Study
- Autorzy:
-
Iwanowski, R. J.
Sobczak, J. W. - Powiązania:
- https://bibliotekanauki.pl/articles/1963382.pdf
- Data publikacji:
- 1997-04
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
- 79.60.Dp
- Opis:
- X-ray photoelectron spectroscopy studies of the Si(111) surfaces, after dilute HF etching and methanol rinse, are reported. These included a detailed analysis of the main core-levels (Si 2p, O 1s) and the valence band spectra. The observed asymmetry of the O 1s lines was attributed to two contributing subpeaks: the main (1) and the minor one (2), shifted ≈ 1.5 eV to higher binding energies. Their relative intensity was found to depend on the air exposure time and on the take-off angle. The peaks were assigned to two different positions of surface oxygen: (1) O chemisorbed with methoxy group, (2) bridging O atom. The valence band X-ray photoelectron spectroscopy spectra reveal the influence of surface states induced by the "chemisorbed O"-Si bond.
- Źródło:
-
Acta Physica Polonica A; 1997, 91, 4; 793-796
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki