- Tytuł:
- On the Role of Radicals in Kinetics of Plasma Etchers in $Ar//CF_4$ Mixtures
- Autorzy:
-
Nikitović, Ž.
Stojanović, V.
Petrović, Z. - Powiązania:
- https://bibliotekanauki.pl/articles/1808038.pdf
- Data publikacji:
- 2009-04
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
51.10.+y
51.50.+v
52.25.Fi
82.20.Pm - Opis:
- In this paper we present the transport coefficients in $Ar//CF_4$ mixtures with realistic abundances of $CF_x$ radicals, F atoms, and $F_2$ molecules that are standard products of plasma chemistry in plasma etching systems and are present in large abundances of the order of few percent in realistic plasma etching devices. It was found that, although radicals make a minimum impact on distribution function and mean energy, the effect on drift velocity is significant and the effect on rates of attachment is large and may change the mode of operation of plasmas.
- Źródło:
-
Acta Physica Polonica A; 2009, 115, 4; 765-767
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł