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Wyszukujesz frazę "52.65.-y" wg kryterium: Temat


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Tytuł:
Characteristics of the 2nd Harmonic ECR Micro Plasma Sources by Using PIC/MCC Simulations
Autorzy:
Radmilović-Radjenović, M.
Radjenović, B.
Beličev, P.
Powiązania:
https://bibliotekanauki.pl/articles/1419747.pdf
Data publikacji:
2012-07
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
52.25.Os
52.65.-y
Opis:
In this paper we have presented our simulation studies of 2.4 GHz microwave plasma production under the electron cyclotron resonance with an idea to expand the plasma generation conditions into the much lower pressure range and much shorter gap length. As the first for this purpose, we have focused on the influences of applied magnetic field, gas pressure and gap length on the breakdown and maintenance of plasmas. Calculations were performed by using a one-dimensional particle-in-cell/Monte Carlo collisions code with three velocity components. The obtained simulation results are in a good agreement with the available experimental data providing an insight into the resonant electron acceleration for ECR condition and the resonant electron confinement for the 2nd harmonic ECR. In addition, analytical expressions for the breakdown voltage and the trapping field have been derived.
Źródło:
Acta Physica Polonica A; 2012, 122, 1; 128-131
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Transport Coefficients For Electrons in Mixtures $CF_4$/Ar/$O_2$ and CF, $CF_2$ or $CF_3$ Radicals
Autorzy:
Nikitović, Ž.
Stojanović, V.
Radmilović-Radjenović, M.
Powiązania:
https://bibliotekanauki.pl/articles/1503491.pdf
Data publikacji:
2011-08
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
51.10.+y
52.20.-j
52.65.Pp
52.65.Rr
52.77.-j
Opis:
Transport coefficients for electrons in mixtures of $CF_{4}$ with Ar and $O_{2}$ for ratios of the electric field to the gas number density E/N from 1 Td to 1000 Td ($1Td=10^{-21} V m^2$) are presented. The analysis of non-conservative collisions revealed a range of the reduced electric field E/N where electron attachment introduced by radicals significantly changes electron kinetics obtained for mixtures without dissociation of $CF_{4}$ gas. The results obtained by using a simple, Two Term solutions for Boltzmann's equation are verified by Monte Carlo simulations. It was found that three body attachments for oxygen is not significant for pressures that are standard in plasma etching equipment i.e. below 1 Torr. Furthermore, the attachment to CF, $CF_{2}$ and $CF_{3}$ at low mean energies is significant, several orders of magnitude. At the same time the mean energy and energy distribution functions for the given E/N are the same as in unperturbed gas mixture. The large changes of the attachment rate are sufficient to change the nature of plasmas and turn them into ion-ion plasmas with very few electrons for realistic abundances.
Źródło:
Acta Physica Polonica A; 2011, 120, 2; 289-291
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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