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    Wyświetlanie 1-6 z 6
    Tytuł:
    Tailoring the Internal Evaporator for Effective Ion Beam Production - Volatile vs. Non-Volatile Substances
    Autorzy:
    Turek, M.
    Droździel, A.
    Pyszniak, K.
    Prucnal, S.
    Powiązania:
    https://bibliotekanauki.pl/articles/1402239.pdf
    Data publikacji:
    2015-11
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    07.77.Ka
    34.80.Dp
    61.72.uj
    Opis:
    Two different designs of the internal evaporator in an arc discharge ion source are presented, suitable either for volatile, or high-melting point substances. A matter of the evaporator size and placement in order to obtain its appropriate temperature and, therefore, a stable and intense ion beam, is considered. Basic ion source characteristics, i.e. the dependences of ion current and discharge voltage on the discharge and filament currents as well as on the external magnetic field flux density are shown and discussed in order to find optimal working conditions. The results of measurements for both volatile (P, Zn, Se, S) and non-volatile (Pd) are presented, showing the applicability of the design for ion implantation purposes.
    Źródło:
    Acta Physica Polonica A; 2015, 128, 5; 939-942
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    The Influence of Ion Implantation on the Optical Parameters - Refraction and Extinction Coefficients οf the Oxygen-Enriched Layers Covering GaAs Implanted with Indium Ions
    Autorzy:
    Rzodkiewicz, W.
    Kulik, M.
    Pyszniak, K.
    Kobzev, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/1807545.pdf
    Data publikacji:
    2009-12
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    61.72.uj
    78.66.Qn
    82.80.Yc
    Opis:
    The semi-isolating GaAs (100) samples irradiated with fluence 3 × $10^{15}$ ions/$cm^{2}$ of $In^{+}$ ions were characterized by using the methods: Rutherford backscattering spectroscopy, nuclear reaction analysis and ellipsometric spectroscopy. The values of the thicknesses layers enriched with oxygen and the implanted were determined by the methods of nuclear reaction analysis and Rutherford backscattering spectroscopy. Multilayer models were applied for determination of the optical constants (refraction and extinctions coefficients) of investigated samples. The thickness of native oxide covering the surface of implanted GaAs and refraction coefficients were increased after implantation with indium. The spectrum of extinction indexes as a function of light wavelength has two bands near the light wavelengths 400 nm and 480 nm. The observed effects can be interpreted as formation of local oxides of In and InAs precipitates or ternary alloys in enriched with oxygen layers at the surfaces of implanted GaAs.
    Źródło:
    Acta Physica Polonica A; 2009, 116, S; S-129-S-132
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Production of $Mo^{+}$ Beams Using an Arc Discharge Ion Source
    Autorzy:
    Turek, M.
    Droździel, A.
    Pyszniak, K.
    Prucnal, S.
    Mączka, D.
    Powiązania:
    https://bibliotekanauki.pl/articles/1383005.pdf
    Data publikacji:
    2014-06
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    07.77.Ka
    34.80.Dp
    61.72.uj
    Opis:
    A new method of $Mo^{+}$ ion beam production is presented in the paper. The method bases on the chemical sputtering/etching of the molybdenum parts (e.g. anode) of the arc discharge ion source by the chloride containing plasma. A mixture of $CCl_4$ (or $CHCl_3$) vapor and air was used as the feeding substance. The separated $Mo^{+}$ beam current of approximately 18 μA was achieved. The measurements of the ion current dependences on the discharge and filament currents as well as on the magnetic field flux density from the electromagnet surrounding the discharge chamber were performed in order to find the optimal working parameters of the ion source.
    Źródło:
    Acta Physica Polonica A; 2014, 125, 6; 1388-1391
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Production of Molybdenum and Tantalum Ion Beams using CCl₂F₂
    Autorzy:
    Turek, M.
    Droździel, A.
    Pyszniak, K.
    Filiks, J.
    Prucnal, S.
    Mączka, D.
    Vaganov, Yu.
    Węgierek, P.
    Powiązania:
    https://bibliotekanauki.pl/articles/1033135.pdf
    Data publikacji:
    2017-08
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    07.77.Ka
    34.80.Dp
    61.72.uj
    Opis:
    A new method of refractory metal (like Mo and Ta) ion beam production using the arc discharge ion source and CCl₂F₂ (dichlorodifluoromethane) used as a feeding gas supported into the discharge chamber is presented. It is based on etching of the refractory metal parts (e.g. anode or a dedicated tube) Cl and F containing plasma. The results of measurements of the dependences of ion currents on the working parameters like discharge and filament currents as well as on the magnetic field flux density of an external electromagnet coil are shown and discussed. The separated Mo⁺ and Ta⁺ beam currents of approximately 22 μA and 2 μA, respectively, were obtained.
    Źródło:
    Acta Physica Polonica A; 2017, 132, 2; 283-287
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Production of Doubly Charged Ions Using a Hollow Cathode Ion Source with an Evaporator
    Autorzy:
    Turek, M.
    Droździel, A.
    Pyszniak, K.
    Mączka, D.
    Słowiński, B.
    Powiązania:
    https://bibliotekanauki.pl/articles/1400444.pdf
    Data publikacji:
    2013-05
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    07.77.Ka
    34.80.Dp
    61.72.uj
    Opis:
    The paper describes the production of doubly charged ions from solids and gases using a hollow cathode ion source with an internal evaporator heated by a spiral cathode filament and arc discharge. The obtained currents were 15 μA for $Bi^{2+}$, 10 μA for $As^{2+}$ and $Al^{2+}$, 8 μA for $Kr^{2+}$ and $Xe^{2+}$, 5 μA for $In^{2+}$ and $Ge^{2+}$, enabling moderate dose implantations ( ≈ $10^{15} cm^{-3}$) with doubly charged ions. Characteristics of the ion source are presented and discussed in order to choose the optimal working parameters. A brief presentation of numerical model of doubly and singly charged ions in the ion source is given. The calculated results (dependences of ion current on the anode voltage) are in good agreement with the experimental data.
    Źródło:
    Acta Physica Polonica A; 2013, 123, 5; 843-846
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Plasma Ion Source with an Internal Evaporator
    Autorzy:
    Turek, M.
    Droździel, A.
    Pyszniak, K.
    Prucnal, S.
    Mączka, D.
    Powiązania:
    https://bibliotekanauki.pl/articles/1504137.pdf
    Data publikacji:
    2011-07
    Wydawca:
    Polska Akademia Nauk. Instytut Fizyki PAN
    Tematy:
    07.77.Ka
    34.80.Dp
    61.72.uj
    Opis:
    A new construction of a hollow cathode ion source equipped with an internal evaporator heated by a spiral cathode filament and arc discharge is presented. The source is especially suitable for production of ions from solids. The proximity of arc discharge region and extraction opening enables production of intense ion beams even for very low discharge current ($I_{a}$ = 1.2 A). The currents of 50 μA $(Al^{+})$ and 70 μA $(Bi^{+})$ were obtained using the extraction voltage of 25 kV. The source is able to work for several tens of hours without maintenance breaks, giving possibility of high dose implantations. The paper presents the detailed description of the ion source as well as its experimental characteristics like dependences of extracted currents and anode voltage on anode and cathode currents.
    Źródło:
    Acta Physica Polonica A; 2011, 120, 1; 184-187
    0587-4246
    1898-794X
    Pojawia się w:
    Acta Physica Polonica A
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-6 z 6

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