- Tytuł:
- Kelvin Force Microscopy Characterization of Corona Charged Dielectric Surfaces
- Autorzy:
-
Marinskiy, D.
Edelman, P.
Snider, A. - Powiązania:
- https://bibliotekanauki.pl/articles/1363397.pdf
- Data publikacji:
- 2014-04
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
77.55.-g
73.61.-r
68.37.Ps
73.25.+i - Opis:
- Ionic diffusion of $(H_2O)_{n}^{+}$ and $CO¯_3$ on $SiO_2$ surfaces has been quantified using Kelvin force microscopy measurement of ion distribution change after small spot corona charge. For both positive and negative ionic species, the concentration profiles versus time follow the two-dimensional surface diffusion enabling a determination of corresponding diffusion coefficients. On a thermally grown $SiO_2$ surface, diffusion coefficients of $(H_2O)_{n}^{+}$ and $CO¯_3$ ions were 2.2 × $10^{-11} cm^2$/s and 4.8 × $10^{-12} cm^2$/s, respectively. On a chemically cleaned $SiO_2$ surface, diffusion coefficients of $(H_2O)_{n}^{+}$ and $CO¯_3$ ions were 7.5 × $10^{-9} cm^2$/s and 2.4 × $10^{-9} cm^2$/s, respectively. Mathematical analysis of the surface potential decay yields an additional parameter - capacitance equivalent thickness.
- Źródło:
-
Acta Physica Polonica A; 2014, 125, 4; 997-1002
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł