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    Tytuł:
    Analysis of the electrolytically polished skeletal dentures surfaces using various nano- and microscopic technologies
    Autorzy:
    Dąbrowa, Tomasz
    Majstrzyk, Wojciech
    Tamulewicz, Magdalena
    Piasecki, Tomasz
    Kunicki, Piotr
    Więckiewicz, Włodzimierz
    Gotszalk, Teodor
    Powiązania:
    https://bibliotekanauki.pl/articles/306706.pdf
    Data publikacji:
    2019
    Wydawca:
    Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
    Tematy:
    chropowatość powierzchni
    skaningowa mikroskopia elektronowa
    proteza ruchoma
    mikroskopia skaningowa
    surface roughness
    scanning electron microscopy
    removable partial denture
    scanning probe microscopy
    optical profilometry
    Opis:
    The surface roughness of the dental restorations is significant to the denture plaque adhesion. Methods: In this work, we present the complex analysis of the electropolished CoCrW alloy remanium® star (Dentaurum, Germany) samples with laserengraved fiducial marks performed using complementary set of micro- and nanoscopic techniques: optical profilometry (OP), atomic force microscopy (AFM), scanning electron microscopy (SEM) and focused ion beam (FIB) milling. Results: Both mean and RMS roughness of the samples were reduced by electopolishing process, however, the results obtained using OP and AFM exhibited some discrepancies. This was caused by the relatively high local protruding defects developed on the processed surface. The cross-sections of the protrusions were made to analyze the cause of their formation as the EDS elemental content maps revealed that their composition was uniform. We also analyzed the local roughness in the smaller areas free from the defects. Conclusions: In that case, both OP and AFM techniques delivered the same results. Analysis of results showed that various methods used for the surface roughness evaluation have to be used simultaneously to obtain complete and true analysis of the technological CoCrW samples.
    Źródło:
    Acta of Bioengineering and Biomechanics; 2019, 21, 4; 123-129
    1509-409X
    2450-6303
    Pojawia się w:
    Acta of Bioengineering and Biomechanics
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    A method of magnetic field measurement in a scanning electron microscope using a microcantilever magnetometer
    Autorzy:
    Orłowska, Karolina
    Mognaschi, Maria E.
    Kwoka, Krzysztof
    Piasecki, Tomasz
    Kunicki, Piotr
    Sierakowski, Andrzej
    Majstrzyk, Wojciech
    Podgórni, Arkadiusz
    Pruchnik, Bartosz
    di Barba, Paolo
    Gotszalk, Teodor
    Powiązania:
    https://bibliotekanauki.pl/articles/220725.pdf
    Data publikacji:
    2020
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    scanning electron microscope
    magnetometry
    microcantilever
    Opis:
    Scanning electron microscopy (SEM) is a perfect technique for micro-/nano-object imaging [1] and movement measurement [2, 3] both in high and environmental vacuum conditions and at various temperatures ranging from elevated to low temperatures. In our view, the magnetic field expanding from the pole-piece makes it possible to characterize the behaviour of electromagnetic micro- and nano-electromechanical systems (MEMS/NEMS) in which the deflection of the movable part is controlled by the electromagnetic force. What must be determined, however, is the magnetic field expanding from the e-beam column, which is a function of many factors, like working distance (WD), magnification and position of the device in relation to the e-beam column. There are only a few experimental methods for determination of the magnetic field in a scanning electron microscope. In this paper we present a method of the magnetic field determination under the scanning electron column by application of a silicon cantilever magnetometer. The micro-cantilever magnetometer is a silicon micro-fabricated MEMS electromagnetic device integrating a current loop of lithographically defined dimensions. Its stiffness can be calibrated with a precision of 5% by the method described by Majstrzyk et al. [4]. The deflection of the magnetometer cantilever is measured with a scanning electron microscope and thus, through knowing the bias current, it is possible to determine the magnetic field generated by the e-beam column in a defined position and at a defined magnification.
    Źródło:
    Metrology and Measurement Systems; 2020, 27, 1; 141-149
    0860-8229
    Pojawia się w:
    Metrology and Measurement Systems
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
      Wyświetlanie 1-2 z 2

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