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Wyświetlanie 1-4 z 4
Tytuł:
Direct Laser Interference Patterning: Theory and Application
Autorzy:
Zabila, Y.
Perzanowski, M.
Dobrowolska, A.
Kąc, M.
Polit, A.
Marszałek, M.
Powiązania:
https://bibliotekanauki.pl/articles/1810273.pdf
Data publikacji:
2009-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
68.55.-a
68.65.Ac
Opis:
We simulated and experimentally investigated the formation of periodic structures generated by multibeam interference patterning. The simulations at the different setup geometry show that resulting interference pattern is quasi-periodical. The calculated patterns show that the symmetries of the interference maxima depend mostly on the angles of incidence and that a wide variety of patterns can be obtained. Because of the difficulty in aligning four beams sufficiently well to avoid secondary periodicities, for testing we used a three-beam interference configuration. Atomic force microscopy images showed good correspondence between the experimental and simulated interference image, with flat islands which correspond to the destructive interference and narrow channels which correspond to the constructive interference fringes.
Źródło:
Acta Physica Polonica A; 2009, 115, 2; 591-593
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
AES Studies of Saturation in Surfactant Segregation Process in Co/Cu Multilayers
Autorzy:
Krupiński, M.
Dobrowolska, A.
Kąc, M.
Polit, A.
Zabila, Y.
Marszałek, M.
Powiązania:
https://bibliotekanauki.pl/articles/1539147.pdf
Data publikacji:
2010-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
82.80.Pv
68.55.-a
68.65.Ac
Opis:
The chemical composition of successive layers in a Co/Cu multilayered system was studied during growth with Auger electron spectroscopy. Experiments were carried out on a sample with 10 repetitions of Co(1 nm)/Cu(2 nm) evaporated at a very low deposition rate in ultrahigh vacuum. A very small amount of Bi or Pb (0.06 nm) was deposited on each Cu film in the system. The experimental data have shown that the concentration of Bi and Pb increases with the number of deposited trilayers up to coverage corresponding to 5 trilayers. At that point the concentration of the surfactant saturated. The changes in the surfactant concentrations are described with a simple model depicting the interaction of the surfactant atoms with the system and how the evolution of the segregation processes. It allows the prediction of the saturation concentration and helps to explain the behaviour of various elements used as a surfactant. The comparison between the theoretical predictions and the experimental results is also discussed.
Źródło:
Acta Physica Polonica A; 2010, 117, 2; 420-422
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
XAFS Studies of the Behaviour of Bi in Co/Cu Multilayers
Autorzy:
Krupiński, M.
Kąc, M.
Polit, A.
Zabila, Y.
Zając, D.
Marszałek, M.
Kapusta, Cz.
Dobrowolska, A.
Powiązania:
https://bibliotekanauki.pl/articles/1809826.pdf
Data publikacji:
2009-02
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
61.05.cj
68.55.-a
68.65.Ac
Opis:
The atomic environment of Bi atoms in the Co/Cu multilayered system was studied with X-ray absorption fine structure spectroscopy. Experiments were carried out on a Co(1 nm)/Cu(2 nm) system with 5 and 10 repetitions of Co/Cu evaporated with very low deposition rate in ultrahigh vacuum. A very small amount of Bi (0.06 nm) was deposited on each Cu film in the system. The X-ray absorption fine structure spectra were measured at the $BiL_3$ edge in the X-ray absorption near-edge structure and extended X-ray absorption fine structure ranges at the Beamline X1 of HASYLAB/DESY synchrotron laboratory in Hamburg. The experimental data showed different local neighbourhood of Bi, depending on the number of Co/Cu bilayer repetitions. The results are discussed in terms of the location and segregation of the Bi atoms as well as its possible oxidation ways.
Źródło:
Acta Physica Polonica A; 2009, 115, 2; 565-567
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The Behaviour of Surfactants during the Growth of Co/Cu Multilayers
Autorzy:
Polit, A.
Kąc, M.
Krupiński, M.
Samul, B.
Zabila, Y.
MarszaŁek, M.
Powiązania:
https://bibliotekanauki.pl/articles/1814035.pdf
Data publikacji:
2007-12
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
82.80.Pv
61.10.Kw
68.65.Ac
68.55.Ln
Opis:
The $[Co(1 nm)//Cu(2 nm)]_N$ multilayers with different numbers of bilayer repetitions (N=3 and 10) were thermally evaporated on Si(100) substrates with a small amount of Bi or Pb deposited only on the first and on the second Cu layer. The chemical composition of the surface after each step of the preparation process was studied by Auger electron spectroscopy. The evolution of the Auger peaks showed the segregation of Bi and Pb surfactants. During the evaporation of the subsequent Co and Cu layers, gradual decrease in the surfactant amount on the surface was observed. No appearance of Co peak on the Cu layer, and Cu peak on the Co layer even for a coverage of a few å indicates the layer continuity. The interface roughness of the surfactant-mediated Co/Cu layers analyzed by X-ray reflectometry (when surfactant was deposited twice) was similar to the pure Co/Cu samples. However, more repetitions of surfactant, by reduction of interface roughness, improve the layer quality.
Źródło:
Acta Physica Polonica A; 2007, 112, 6; 1281-1287
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-4 z 4

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