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Wyszukujesz frazę "kelvin" wg kryterium: Temat


Wyświetlanie 1-2 z 2
Tytuł:
Detection of individual dopants in singe-electron devices - a study by KFM observation and simulation
Autorzy:
Ligowski, M.
Moraru, D.
Miftahul, A.
Tarido, J. C.
Mizuno, T.
Tabe, M.
Jabłoński, R.
Powiązania:
https://bibliotekanauki.pl/articles/385159.pdf
Data publikacji:
2009
Wydawca:
Sieć Badawcza Łukasiewicz - Przemysłowy Instytut Automatyki i Pomiarów
Tematy:
single dopant
Kelvin Probe Force Microscope
single-electron transfer
Opis:
Single electron devices (SEDs) are candidates to become a keystone of future electronics. They are very attractive due to low power consumption, small size or high operating speed. It is even possible to assure compatibility with present CMOS technology when natural potential fluctuations introduced by dopant atoms are used to create quantum dots (QD). However, the main problem of this approach is due to the randomness of dopant distribution which is characteristic for conventional doping techniques. This leads to scattered characteristics of the devices, which precludes from using them in the circuits. In these work we approach the problem of correlating the distribution of QD's with the device characteristics. For that, we investigate with a Kelvin probe force microscope (KFM) the surface potential of Si nanodevice channel in order to understand the potential landscape. Results reveal the features ascribable to individual dopants. These findings are supported also by simulation results.
Źródło:
Journal of Automation Mobile Robotics and Intelligent Systems; 2009, 3, 4; 130-133
1897-8649
2080-2145
Pojawia się w:
Journal of Automation Mobile Robotics and Intelligent Systems
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Dopant-Based Charge Sensing Utilizing P-I-N Nanojunction
Autorzy:
Nowak, R.
Jabłoński, R.
Powiązania:
https://bibliotekanauki.pl/articles/220915.pdf
Data publikacji:
2017
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
nanosensor
silicon
p-i-n junction
dopant
Kelvin Probe Force Microscope
Opis:
We studied lateral silicon p-i-n junctions, doped with phosphorus and boron, regarding charge sensing feasibility. In order to examine the detection capabilities and underlying mechanism, we used in a complementary way two measurement techniques. First, we employed a semiconductor parameter analyzer to measure I−V characteristics at a low temperature, for reverse and forward bias conditions. In both regimes, we systematically detected Random Telegraph Signal. Secondly, using a Low Temperature Kelvin Probe Force Microscope, we measured surface electronic potentials. Both p-i-n junction interfaces, p-i and i-n, were observed as regions of a dynamic behaviour, with characteristic time-dependent electronic potential fluctuations. Those fluctuations are due to single charge capture/emission events. We found analytically that the obtained data could be explained by a model of two-dimensional p-n junction and phosphorus-boron interaction at the edge of depletion region. The results of complementary measurements and analysis presented in this research, supported also by the previous reports, provide fundamental insight into the charge sensing mechanism utilizing emergence of individual dopants.
Źródło:
Metrology and Measurement Systems; 2017, 24, 2; 391-399
0860-8229
Pojawia się w:
Metrology and Measurement Systems
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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