- Tytuł:
- Improvement of the electron beam lithography contact pads fabrication process
- Autorzy:
-
Indykiewicz, K.
Paszkiewicz, R.
Paszkiewicz, B. - Powiązania:
- https://bibliotekanauki.pl/articles/173623.pdf
- Data publikacji:
- 2016
- Wydawca:
- Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
- Tematy:
-
electron beam lithography
EBL
exposition of big areas
exposition time optimization - Opis:
- In the paper, the verification of using the electron beam lithography technique as a main lithography tool for device fabrication is presented. The results of conducted experiments allow us to minimize the exposition time of big areas and retain acceptable metallic structures resolution and designed distances for structures in the neighborhood of a few micrometers. Conducted statistical analysis allows us to define the significance of the selected factors influence on the objectives of this study.
- Źródło:
-
Optica Applicata; 2016, 46, 2; 249-254
0078-5466
1899-7015 - Pojawia się w:
- Optica Applicata
- Dostawca treści:
- Biblioteka Nauki
Artykuł