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Wyszukujesz frazę "Thin Film" wg kryterium: Temat


Wyświetlanie 1-2 z 2
Tytuł:
Characterization of SnO2/TiO2 with the Addition of Polyethylene Glycol via Sol-Gel Method for Self-Cleaning Application
Autorzy:
Halin, Dewi Suriyani Che
Azliza, Azani
Razak, Kamrosni Abdul
Abdullah, Mohd Mustafa Al Bakri
Salleh, Mohd Arif Anuar Mohd
Wahab, Juyana A
Chobpattana, Varistha
Kaczmarek, Łukasz
Nabiałek, Marcin
Jeż, Bartłomiej
Powiązania:
https://bibliotekanauki.pl/articles/2203743.pdf
Data publikacji:
2023
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
TiO2
SnO2
thin film
polyethylene glycol
self-cleaning
Opis:
TiO2 is one of the most widely used metal oxide semiconductors in the field of photocatalysis for the self-cleaning purpose to withdraw pollutants. Polyethylene glycol (PEG) is recommended as a stabilizer and booster during preparation of water-soluble TiO2. Preparation of SnO2/TiO2 thin film deposition on the surface of ceramic tile was carried out by the sol-gel spin coating method by adding different amount of PEG (0g, 0.2g, 0.4g, 0.6g, 0.8g) during the preparation of the sol precursor. The effects of PEG content and the annealing temperature on the phase composition, crystallite size and the hydrophilic properties of SnO2/TiO2 films were studied. The X-ray diffraction (XRD) spectra revealed different phases existed when the films were annealed at different annealing temperatures of 350°C, 550°C and 750°C with 0.4 g of PEG addition. The crystallite sizes of the films were measured using Scherrer equation. It shows crystallite size was dependent on crystal structure existed in the films. The films with mixed phases of brookite and rutile shows the smallest crystallite size. In order to measure the hydrophilicity properties of films, the water contact angles for each film with different content of PEG were measured. It can be observed that the water contact angle decreased with the increasing of the content of PEG. It shows the superhydrophilicity properties for the films with the 0.8 g of PEG annealed at 750°C. This demonstrates that the annealed temperature and the addition of PEG affect the phase composition and the hydrophilicity properties of the films.
Źródło:
Archives of Metallurgy and Materials; 2023, 68, 1; 243--248
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Microstructural Studies of Ag/TiO2 Thin Film; Effect of Annealing Temperature
Autorzy:
Kamrosni, Abdul Razak
Dewi Suryani, Che Halin
Azliza, Azani
Mohd Mustafa Al Bakri, Abdullah
Mohd Arif Anuar, Mohd Salleh
Norsuria, Mahmed
Chobpattana, Varistha
Kaczmarek, L.
Jeż, Bartłomiej
Nabiałek, Marcin
Powiązania:
https://bibliotekanauki.pl/articles/2048839.pdf
Data publikacji:
2022
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
Ag/TiO2
annealing temperature
microstructure
optical properties
thin film
Opis:
Microstructures are an important link between materials processing and performance, and microstructure control is essential for any materials processing route where the microstructure plays a major role in determining the properties. In this work, silverdoped titanium dioxide (Ag/TiO2) thin film was prepared by the sol-gel method through the hydrolysis of titanium tetra-isopropoxide and silver nitrate solution. The sol was spin coated on ITO glass substrate to get uniform film followed by annealing process for 2 hours. The obtained films were annealed at different annealing temperatures in the range of 300°C-600°C in order to observe the effect on crystalline state, microstructures and optical properties of Ag/TiO2 thin film. The thin films were characterized by X-Ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectrophotometry. It is clearly seen, when the annealing temperature increases to 500°C, a peak at 2θ = 25.30° can be seen which refers to the structure of TiO2 tetragonal anatase. The structure of Ag/TiO2 thin film become denser, linked together, porous and uniformly distributed on the surface and displays the highest cut-off wavelength value which is 396 nm with the lowest band gap value, which is 3.10 eV.
Źródło:
Archives of Metallurgy and Materials; 2022, 67, 1; 241-245
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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