- Tytuł:
- Manufacturing of thin nickel-rich alloy films on powder substrate using magnetron sputtering technique
- Autorzy:
- Bordolińska, Klaudia
- Powiązania:
- https://bibliotekanauki.pl/articles/1179518.pdf
- Data publikacji:
- 2017
- Wydawca:
- Przedsiębiorstwo Wydawnictw Naukowych Darwin / Scientific Publishing House DARWIN
- Tematy:
-
ICP analysis
layer thickness
magnetron sputtering
thin layers - Opis:
- The magnetron sputtering technology has been applied to obtain five kinds of thin, nickel-rich layers on tungsten powder substrate. Circular plates (30 mm in diameter) of pure nickel (99.9%), inconel 600 (72% Ni, 17% Cr, 10% Fe), inconel 601 (63% Ni, 25% Cr, 7.6% Fe), inconel c-276 (51% Ni, 16.5% Cr, 17% Mo) and incoloy H / HT (35% Ni, 23% Cr, 39.5% Fe) were used as sputtering targets. The nickel-based layers have been deposited on pure tungsten powder (2 g; fraction 20-50 µm). After 2 hours of sputtering, the produced layers have been dissolved in 2M HCl solution. The obtained solutions were then analyzed on Ni2+, Cr3+, Fe2+ or Mo2+ ions. The analysis data allows for evaluation of the thickness of the obtained coatings.
- Źródło:
-
World Scientific News; 2017, 76; 16-22
2392-2192 - Pojawia się w:
- World Scientific News
- Dostawca treści:
- Biblioteka Nauki
Artykuł