Autor: Sobolewski, R. K. - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Technology of Ultrathin NbN and NbTiN Films for Superconducting Photodetectors
Autorzy:: Guziewicz, M.
Slysz, W.
Borysiewicz, M.
Kruszka, R.
Sidor, Z.
Juchniewicz, M.
Golaszewska, K.
Domagala, J.
Rzodkiewicz, W.
Ratajczak, J.
Bar, J.
Wegrzecki, M.
Sobolewski, R.
Powiązania:: https://bibliotekanauki.pl/articles/1492719.pdf
Data publikacji:: 2011-12
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 74.62.Bf
74.78.-w
81.15.Cd
81.15.Jj
Opis:: We report fabrication and characterization of ultrathin NbN and NbTiN films designed for superconducting photodetectors. Our NbN and NbTiN films were deposited on $Al_2O_3$ and Si single-crystal wafers by a high-temperature, reactive magnetron sputtering method and, subsequently, annealed at 1000°C. The best, 18 nm thick NbN films deposited on sapphire exhibited the critical temperature of 15.0 K and the critical current density as high as ≈ 8 × $10^6$ A/$cm^2$ at 4.8 K.
Źródło:: Acta Physica Polonica A; 2011, 120, 6A; A-076-A-079
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: Ultrathin NbN Films for Superconducting Single-Photon Detectors
Autorzy:: Słysz, W.
Guziewicz, M.
Borysiewicz, M.
Domagała, J.
Pasternak, I.
Hejduk, K.
Rzodkiewicz, W.
Ratajczak, J.
Bar, J.
Węgrzecki, M.
Grabiec, P.
Grodecki, R.
Węgrzecka, I.
Sobolewski, R.
Powiązania:: https://bibliotekanauki.pl/articles/1504147.pdf
Data publikacji:: 2011-07
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 74.62.Bf
74.78.-w
81.15.Cd
81.15.Jj
Opis:: We present our research on fabrication and structural and transport characterization of ultrathin superconducting NbN layers deposited on both single-crystal $Al_2O_3$ and Si wafers, and $SiO_2$ and $Si_3N_4$ buffer layers grown directly on Si wafers. The thicknesses of our films varied from 6 nm to 50 nm and they were grown using reactive RF magnetron sputtering on substrates maintained at the temperature 850°C. We have performed extensive morphology characterization of our films using the X-ray diffraction method and atomic force microscopy, and related the results to the type of the substrate used for the film deposition. Our transport measurements showed that even the thinnest, 6 nm thick NbN films had the superconducting critical temperature of 10-12 K, which was increased to 14 K for thicker films.
Źródło:: Acta Physica Polonica A; 2011, 120, 1; 200-203
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

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