Temat: SOI - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Reliability of deep submicron MOSFETs
Autorzy:: Balestra, F.
Powiązania:: https://bibliotekanauki.pl/articles/307658.pdf
Data publikacji:: 2001
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: bulk MOSFETs
SOI devices
deep submicron
transistors
reliability
Opis:: In this work, a review of the reliability of n- and p-channel Si and SOI MOSFETs as a function of gate length and temperature is given. The main hot carrier effects and degradation are compared for bulk and SOI devices in a wide range of gate length, down to deep submicron. The worst case aging, defice lifetime and maximum drain bias that can be applied are addressed. The physical mechanisms and the emergence of new phenomena at the origin of the degradation are studied for advanced MOS transistors. The impact of the substrate bias is also outlined.
Źródło:: Journal of Telecommunications and Information Technology; 2001, 1; 12-17
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 2.

Tytuł:: Low frequency noise in advanced Si bulk and SOI MOSFETs
Autorzy:: Jomaah, J.
Balestra, F.
Ghibaudo, G.
Powiązania:: https://bibliotekanauki.pl/articles/308980.pdf
Data publikacji:: 2005
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: CMOS
SOI
low frequency noise
kink-related excess noise
DTMOS
Opis:: A review of recent results concerning the low frequency noise in modern CMOS devices is given. The approaches such as the carrier number and the Hooge mobility fluctuations used for the analysis of the noise sources are presented and illustrated through experimental data obtained on advanced CMOS SOI and Si bulk generations. Furthermore, the impact on the electrical noise of the shrinking of CMOS devices in the deep submicron range is also shown. The main physical characteristics of random telegraph signals (RTS) observed in small area MOS transistors are reviewed. Experimental results obtained on 0.35-0.12 žm CMOS technologies are used to predict the trends for the noise in future CMOS technologies, e.g., 0.1 žm and beyond. For SOI MOSFETS, the main types of layout will be considered, that is floating body, DTMOS, and body-contact. Particular attention will be paid to the floating body effect that induces a kink-related excess noise, which superimposes a Lorentzian spectrum on the flicker noise.
Źródło:: Journal of Telecommunications and Information Technology; 2005, 1; 24-33
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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