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Tytuł:
Stability of finite-size argon thin film coating single wall carbon nanotube
Autorzy:
Kośmider, M.
Dendzik, Z.
Żurek, S.
Górny, K.
Powiązania:
https://bibliotekanauki.pl/articles/1964139.pdf
Data publikacji:
2009
Wydawca:
Politechnika Gdańska
Tematy:
nanotube
molecular dynamics
cluster
thin film
Opis:
The structure and the dynamics of the argon thin film coating (15,4) and (12,12) carbon nanotubes have been studied in a series of molecular dynamic simulations. In the studied temperature regime, the argon atoms in the thin film were well localized. Structural changes and diffusion process inside the argon layers were not been observed. The influence of the chirality and the radius of the nanotube to the cluster properties is also reported.
Źródło:
TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk; 2009, 13, 3; 187-197
1428-6394
Pojawia się w:
TASK Quarterly. Scientific Bulletin of Academic Computer Centre in Gdansk
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application
Autorzy:
Szindler, Marek
Szindler, Magdalena M.
Powiązania:
https://bibliotekanauki.pl/articles/1835965.pdf
Data publikacji:
2020
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
thin film
atomic layer deposition
titanium dioxide
Opis:
Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).
Źródło:
Optica Applicata; 2020, 50, 4; 663-670
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
In vitro hemocompatibility of thin films materials for direct blood contact
Autorzy:
Trembecka-Wójciga, K.
Major, R.
Lackner, J. M.
Plutecka, H.
Powiązania:
https://bibliotekanauki.pl/articles/285250.pdf
Data publikacji:
2015
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Polskie Towarzystwo Biominerałów
Tematy:
hemocompatibility
thin film
protein adsorption
shear stresses
Opis:
When designing new biomaterials for tissue contact devices it is important to consider their architecture as it affects different cell response. Surface modification of tubular structures requires the use of different techniques than in the case of flat samples. Similarly, analytical techniques also need to be adapted to the specific shape of substrate. For blood contacting devices this issue is critical because of shear forces generated by fluid flow and responsible for blood components activation. This necessitates the use of diagnostic techniques dedicated for material analysis in dynamic conditions in order to simulate physiological conditions. In the frame of the work, the flat samples as well as tube like elements were considered. The flat samples were prepared for basic research. Based on the results of the basic research the thin coatings were selected for the internal side of the tube like elements which have been analysed in contact with blood using blood flow simulator. The cross section of the coating-substrate interaction was tested using transmission electron microscopy. The attachment of cells to coatings was determined by radial flow chamber. Hemocompatible analysis was carried out in two ways. The quality of the blood after the dynamic test was analysed using flow cytometry. In this case the aggregates formation, platelet consumption and apoptosis derived microparticles were considered. The amount of cells adhered to the materials surfaces was determined by confocal laser microscopy.
Źródło:
Engineering of Biomaterials; 2015, 18, 132; 2-8
1429-7248
Pojawia się w:
Engineering of Biomaterials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The impact of atomic layer deposition technological parameters on optical properties and morphology of Al2O3 thin films
Autorzy:
Dobrzanski, L. A.
Szindler, M.
Hajduk, B.
Kotowicz, S.
Powiązania:
https://bibliotekanauki.pl/articles/173801.pdf
Data publikacji:
2015
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
thin film
aluminum oxide
atomic layer deposition
Opis:
This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by the atomic layer deposition method on polished monocrystalline silicon. It has been described how the technological parameters of the deposition process, like the number of cycles and substrate temperature, influenced the optical properties and morphology of prepared thin films. Their physical and optical properties like thickness, uniformity and refractive index have been investigated with spectroscopic ellipsometry, atomic force microscopy and UV/vis optical spectroscopy.
Źródło:
Optica Applicata; 2015, 45, 4; 573-583
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Real-time monitoring of cell cultures with nickel comb capacitors
Monitorowanie hodowli komórkowych w czasie rzeczywistym przy zastosowaniu niklowych kondensatorów grzebieniowych
Autorzy:
Kociubiński, Andrzej
Zarzeczny, Dawid
Szypulski, Maciej
Wilczyńska, Aleksandra
Pigoń, Dominika
Małecka-Massalska, Teresa
Prendecka, Monika
Powiązania:
https://bibliotekanauki.pl/articles/408219.pdf
Data publikacji:
2020
Wydawca:
Politechnika Lubelska. Wydawnictwo Politechniki Lubelskiej
Tematy:
BioMEMS
ECIS
nickel
thin film
nikiel
cienka warstwa
Opis:
The aim of the study was to present a method for assessing the condition of cell culture by measuring the impedance of cells cultured in the presence of nickel. For this purpose, an impedance measurement technique using nickel comb capacitors was used. The capacitor electrodes were made using a thin film magnetron sputtering. In the experimental part, the culture of cells of mouse fibroblasts on the prepared substrate was performed. The cell culture lasted 43 hours and showed that the presented technique allows it to be used to analyze the effect of nickel on cells.
Celem pracy było przedstawienie metody oceny stanu hodowli komórkowej poprzez pomiar impedancji komórek hodowanych w obecności niklu. W tym celu zastosowano technikę pomiaru impedancji z wykorzystaniem niklowych kondensatorów grzebieniowych. Cienkowarstwowe elektrody kondensatora wykonano metodą rozpylania magnetronowego. W części eksperymentalnej przeprowadzono hodowlę komórek mysich fibroblastów na przygotowanym podłożu. Hodowla komórkowa trwała 43 godziny i wykazała, że przedstawiona technika mogłaby być zastosowana do analizy wpływu niklu na komórki.
Źródło:
Informatyka, Automatyka, Pomiary w Gospodarce i Ochronie Środowiska; 2020, 10, 2; 32-35
2083-0157
2391-6761
Pojawia się w:
Informatyka, Automatyka, Pomiary w Gospodarce i Ochronie Środowiska
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Surface roughness and residual stress evolution in SiNx/SiO2 multilayer coatings deposited by reactive pulsed magnetron sputtering
Autorzy:
Tien, Chuen-Lin
Lee, Po-Wei
Lin, Shih-Chin
Lin, Hong-Yi
Powiązania:
https://bibliotekanauki.pl/articles/1835787.pdf
Data publikacji:
2021
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
thin film
residual stress
quarter-wave stack
surface roughness
Opis:
The surface roughness and residual stress behavior in two types of SiNx/SiO2 dielectric quarter-wave stacks was investigated experimentally. A reactive pulsed magnetron sputtering system was used to prepare the SiNx/SiO2 multilayer thin films. The results show that SiNx/SiO2 quarter-wave stack with a buffer layer of MgF2 thin film can reduce the residual stress. The effect of aging on the residual stress in two quarter-wave stacks was also studied. We found that the residual stresses in both SiNx/SiO2 multilayer coatings are changed from a compressive state to a tensile stress state with increasing the aging time. The root mean square (RMS) surface roughness of MgF2/(SiNx/SiO2)22 and (SiNx/SiO2)22 quarter-wave stacks are 2.23 ± 0.22 nm and 2.08 ± 0.20 nm, respectively.
Źródło:
Optica Applicata; 2021, 51, 2; 223-233
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
RELEASE AND PERMEATION OF INDOMETHACIN FROM PHOSPHOLIPID COMPLEX FILM GENERATED FROM SPRAY FORMULATIONS
Autorzy:
Buatong, Wilaiporn
Nakpheng, Titpawan
Dechraksa, Janwit
Saisamuth, Sao-ake
Kongkhao, Wipatcha
Srichana, Teerapol
Powiązania:
https://bibliotekanauki.pl/articles/895442.pdf
Data publikacji:
2019-04-30
Wydawca:
Polskie Towarzystwo Farmaceutyczne
Tematy:
thin film
controlled release
indomethacin
Topical spray
phospholipid complex
Opis:
An indomethacin topical spray was prepared using lecithin and a cholesterol derivative as a phospholipid complex in a film. Polyvinylpyrrolidone (PVP) was used as a film-forming agent. Drug penetration through keratinocytes was evaluated as well as cytotoxicity to the keratinocytes and fibroblast cells. The results reveal that the PVP concentration provided fine droplets under a microscope with a low contact angle (12.07°-22.53°). Incorporating PVP in the formulation reduced the hydrodynamic radius or size by 20 times. The SEM and TEM results showed smoother surfaces of the thin film for larger quantities of the PVP film-forming agent in the formulations. It also gave the highest drug penetration when the PVP was 0.5%. However, the film-forming agent can also act as a control release barrier. The percent viabilities of the human keratinocytes and fibroblasts were higher in the indomethacin spray phospholipid complex thin film formulation than the pure drug.
Źródło:
Acta Poloniae Pharmaceutica - Drug Research; 2019, 76, 2; 329-339
0001-6837
2353-5288
Pojawia się w:
Acta Poloniae Pharmaceutica - Drug Research
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Investigation on the structural, optical and topographical behavior of Cadmium oxide polycrystalline thin films using electrochemical depositing method at different times
Autorzy:
Abd, Ahmed N.
Dawood, Mohammed O.
Hassoni, Majid H.
Hussein, Ali A.
Powiązania:
https://bibliotekanauki.pl/articles/1192094.pdf
Data publikacji:
2016
Wydawca:
Przedsiębiorstwo Wydawnictw Naukowych Darwin / Scientific Publishing House DARWIN
Tematy:
Cadmium oxide
thin film
optical characteristics of film
electrochemical depositing method
Opis:
The optical and structure properties of Cadmium oxide (CdO) thin film prepared by electrochemical deposition method at different times (15, 30 and 60) min were investigated in this paper. Results of optical Transmission, absorption, reflection spectra, optical conductance, refractive index, extension coefficient, real and imaginary dielectric constants studies are reported. The optical transmittance of the CdO thin film which formed at room temperature was 20% at wavelength ≈350 nm then increases to 60% at wavelength ≈1100 nm for thin film of CdO. The band-gap was also calculated from the equation relating absorption coefficient with the wavelength. The energy band gap changes from 2.3eV (Bulk CdO) to 2.45eV (CdO thin film). The plotted graphs show the optical characteristics of the film which varied with the wavelength and the photon energy. The optical conductance and band-gap indicated that the film is transmitting within the visible range. The dielectric constant and optical conductance of the film initially decreases slowly with increase in photon energy. The extinction coefficient and refractive index of the films also evaluated, which affected with the change in transmittance. The structure of synthesised CdO thin film was analyzed by X-ray diffraction XRD which revealed that the CdO thin film are polycrystalline and have several peaks of cubic face structure. The crystallite size, dislocation density, microstrain and number of dislocations of the thin film were calculated and listed.
Źródło:
World Scientific News; 2016, 37; 249-264
2392-2192
Pojawia się w:
World Scientific News
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Deposition Of Oxide And Intermetallic Thin Films By Pulsed Laser (PLD) And Electron Beam (PED) Methods
Osadzanie tlenkowych oraz międzymetalicznych cienkich filmów z wykorzystaniem lasera impulsowego (PLD) i wiązki elektronowej (PED)
Autorzy:
Kusiński, J.
Kopia, A.
Cieniek, Ł.
Kąc, S.
Radziszewska, A.
Powiązania:
https://bibliotekanauki.pl/articles/352325.pdf
Data publikacji:
2015
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
PLD
PED
thin film
structure
doped oxides
cienki film
struktura
osadzanie
Opis:
In this work the pulsed laser deposition (PLD) and the pulsed electron beam deposition (PED) techniques were used for fabrication of Mo-Bi2O3, La1-xSrxCoO3, La1-xCaxCoO3 and Al-Mg thin films. An influence of ablation process basic parameters on the coatings structure and properties was discussed. Two types of laser ablation systems were applied: one equipped with a KrF excimer and second with a Q-switched Nd:YAG. Films were deposited on Si and MgO substrates. Scanning (SEM) and transmission (TEM) electron microscopy, atomic force microscopy (AFM) as well as X-ray diffraction (XRD) were used for structural analysis. Investigations focused on structure and chemical composition showed that smooth and dense thin films with nanocrystalline structure, preserving the composition of the bulk target, could be obtained by the both PLD and PED techniques. Research study showed that by a proper selection of PLD and PED process parameters it was possible to deposit films with significantly decreased amount and size of undesirably nanoparticulates.
Osadzanie laserem impulsowym (PLD) oraz osadzanie impulsową wiązka elektronową (PED) wykorzystane zostało do wytwarzania cienkich filmów typu: Mo-Bi2O3, La1-xSrxCoO3, La1-xCaxCoO3 and Al-Mg oraz Al-Mg. Dyskutowano wpływ podstawowych parametrów procesu ablacji na strukturę i właściwości uzyskiwanych powłok. Wykorzystane zostały dwa typy systemów do ablacji; jeden z ekscymerowym laserem KrF i drugi na bazie lasera Nd:YAG z modulatorem dobroci (Q-Switch). Filmy osadzano na podłożu Si i MgO. Skaningowa (SEM) i transmisyjna (TEM) mikroskopia elektronowa, mikroskopia sił atomowych (AFM), oraz dyfrakcja rentgenowska (XRD) wykorzystana została do analizy strukturalnej. Badania skoncentrowane na strukturze i składzie chemicznym wykazały jednorodną i zwartą budowę cienkich nanokrystalicznych filmów uzyskanych metodami PLD i PED utrzymujących skład odparowywanych tarcz. Wykazano doświadczalnie, że odpowiednie dobranie parametrów procesu pozwala otrzymywać filmy o istotnym zminimalizowaniu ilości i wymiarów niekorzystnych nanocząstek w powłoce.
Źródło:
Archives of Metallurgy and Materials; 2015, 60, 3; 2173-2182
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Influence of pH on the Structural and Optical Properties of Polycrystalline MnTe₂ Thin Films Produced by Chemical Bath Deposition Method
Autorzy:
Kariper, İ.
Göde, F.
Powiązania:
https://bibliotekanauki.pl/articles/1031481.pdf
Data publikacji:
2017-09
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
X-ray diffraction
thin film
optical constant
growth from solutions
Opis:
Polycrystalline manganese ditelluride (MnTe₂) thin films are synthesized on commercial glass substrates by chemical bath deposition technique at different pH values (pH = 9, 10, 11 and 12). The effect of pH on the structural and optical properties of chemically deposited MnTe₂ thin films have been investigated in this study. The structure and optical properties of the films are characterized by X-ray diffraction and optical absorption spectroscopy. The X-ray diffraction results suggest that the films are polycrystalline with a mixture of dominant cubic MnTe₂ phase and few traces of orthorhombic MnTeO₃ and MnTe₂O₅ phases. The optical band gap of the films increases approximately from 1.66 eV to 2.62 eV with increasing pH. Moreover, optical parameters of the films such as refractive index, extinction coefficient, real and imaginary dielectric constants are investigated using absorption and transmittance spectra taken from the UV-vis spectrophotometer. At 600 nm wavelength, refractive index and extinction coefficient values vary in the range of 1.39-1.55 and 0.17-0.23, respectively. An increase in optical band gap could be attributed to the quantum confinement effect.
Źródło:
Acta Physica Polonica A; 2017, 132, 3; 531-534
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Effect of Complexing Agent on the Structural, Optical and Electrical Properties of Polycrystalline Indium Sulfide Thin Films Deposited by Chemical Bath Deposition
Autorzy:
Göde, F.
Kariper, İ.
Güneri, E.
Ünlü, S.
Powiązania:
https://bibliotekanauki.pl/articles/1031534.pdf
Data publikacji:
2017-09
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
scanning electron microscopy
thin film
optical constant
growth from solutions
Opis:
Indium sulfide (β-In₂S₃) thin films are synthesized by chemical bath deposition method using three different complexing agent volumes, triethanolamine (TEA) (0.30, 0.45, and 0.60 ml). The effect of complexing agent on the structural, morphological, optical and electrical properties of chemically deposited indium sulfide (β-In₂S₃) thin films have been investigated in this work. The characterization of the present films is carried out using X-ray diffraction, scanning electron microscopy, UV-vis spectroscopy and electrical measurements. The structure of the films is polycrystalline with a cubic phase of β-In₂S₃. Firstly, the band gap of the film decreases from 3.74 eV to 3.15 eV by adding 0.30 ml TEA. Then, it increases to 3.79 eV with increasing TEA. Nevertheless, previously, the refractive index of the films increases from 2.13 to 2.67 for the 0.30 mL TEA and then it decreases to the value of 2.11 with increasing TEA. Extinction coefficient, real and dielectric constant of the films are calculated using the absorption and transmittance spectra. Firstly, the electrical resistivity of the films decreases from 3.46×10⁸ Ω cm to 1.33×10⁷ Ω cm by adding 0.30 ml TEA. Then, it increases to the value of 2.16×10⁹ Ω cm with increasing TEA. Eventually, the more conductive film with worm-like morphology detected from the scanning electron microscopy is synthesized using 0.30 ml TEA. These results show that complexing agent has an important effect on the structural, morphological, optical and electrical properties of the deposited films.
Źródło:
Acta Physica Polonica A; 2017, 132, 3; 527-530
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Improvement Optical and Electrical Characteristics of Thin Film Solar Cells Using Nanotechnology Techniques
Autorzy:
Thabet, Ahmed
Abdelhady, Safaa
Ebnalwaled, A.A.
Ibrahim, A. A.
Powiązania:
https://bibliotekanauki.pl/articles/226062.pdf
Data publikacji:
2019
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
thin film
nanoparticles
nanocomposites
energy conversion
optical
plasmonic
solar cells
Opis:
This work presents a theoretical study for the distribution of nanocomposite structure of plasmonic thin-film solar cells through the absorber layers. It can be reduced the material consumption and the cost of solar cell. Adding nanometallic fillers in the absorber layer has been improved optical, electrical characteristics and efficiency of traditional thin film solar cells (ITO /CdS/PbS/Al and SnO2/CdS/CdTe/Cu) models that using sub micro absorber layer. Also, this paper explains analysis of J-V, P-V and external quantum efficiency characteristics for nanocomposites thin film solar cell performance. Also, this paper presents the effect of increasing the concentration of nanofillers on the absorption, energy band gap and electron-hole generation rate of absorber layers and the effect of volume fraction on the energy conversion efficiency, fill factor, space charge region of the nanocomposites solar cells.
Źródło:
International Journal of Electronics and Telecommunications; 2019, 65, 4; 625-634
2300-1933
Pojawia się w:
International Journal of Electronics and Telecommunications
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Characterization of SnO2/TiO2 with the Addition of Polyethylene Glycol via Sol-Gel Method for Self-Cleaning Application
Autorzy:
Halin, Dewi Suriyani Che
Azliza, Azani
Razak, Kamrosni Abdul
Abdullah, Mohd Mustafa Al Bakri
Salleh, Mohd Arif Anuar Mohd
Wahab, Juyana A
Chobpattana, Varistha
Kaczmarek, Łukasz
Nabiałek, Marcin
Jeż, Bartłomiej
Powiązania:
https://bibliotekanauki.pl/articles/2203743.pdf
Data publikacji:
2023
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
TiO2
SnO2
thin film
polyethylene glycol
self-cleaning
Opis:
TiO2 is one of the most widely used metal oxide semiconductors in the field of photocatalysis for the self-cleaning purpose to withdraw pollutants. Polyethylene glycol (PEG) is recommended as a stabilizer and booster during preparation of water-soluble TiO2. Preparation of SnO2/TiO2 thin film deposition on the surface of ceramic tile was carried out by the sol-gel spin coating method by adding different amount of PEG (0g, 0.2g, 0.4g, 0.6g, 0.8g) during the preparation of the sol precursor. The effects of PEG content and the annealing temperature on the phase composition, crystallite size and the hydrophilic properties of SnO2/TiO2 films were studied. The X-ray diffraction (XRD) spectra revealed different phases existed when the films were annealed at different annealing temperatures of 350°C, 550°C and 750°C with 0.4 g of PEG addition. The crystallite sizes of the films were measured using Scherrer equation. It shows crystallite size was dependent on crystal structure existed in the films. The films with mixed phases of brookite and rutile shows the smallest crystallite size. In order to measure the hydrophilicity properties of films, the water contact angles for each film with different content of PEG were measured. It can be observed that the water contact angle decreased with the increasing of the content of PEG. It shows the superhydrophilicity properties for the films with the 0.8 g of PEG annealed at 750°C. This demonstrates that the annealed temperature and the addition of PEG affect the phase composition and the hydrophilicity properties of the films.
Źródło:
Archives of Metallurgy and Materials; 2023, 68, 1; 243--248
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Microstructural Studies of Ag/TiO2 Thin Film; Effect of Annealing Temperature
Autorzy:
Kamrosni, Abdul Razak
Dewi Suryani, Che Halin
Azliza, Azani
Mohd Mustafa Al Bakri, Abdullah
Mohd Arif Anuar, Mohd Salleh
Norsuria, Mahmed
Chobpattana, Varistha
Kaczmarek, L.
Jeż, Bartłomiej
Nabiałek, Marcin
Powiązania:
https://bibliotekanauki.pl/articles/2048839.pdf
Data publikacji:
2022
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
Ag/TiO2
annealing temperature
microstructure
optical properties
thin film
Opis:
Microstructures are an important link between materials processing and performance, and microstructure control is essential for any materials processing route where the microstructure plays a major role in determining the properties. In this work, silverdoped titanium dioxide (Ag/TiO2) thin film was prepared by the sol-gel method through the hydrolysis of titanium tetra-isopropoxide and silver nitrate solution. The sol was spin coated on ITO glass substrate to get uniform film followed by annealing process for 2 hours. The obtained films were annealed at different annealing temperatures in the range of 300°C-600°C in order to observe the effect on crystalline state, microstructures and optical properties of Ag/TiO2 thin film. The thin films were characterized by X-Ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectrophotometry. It is clearly seen, when the annealing temperature increases to 500°C, a peak at 2θ = 25.30° can be seen which refers to the structure of TiO2 tetragonal anatase. The structure of Ag/TiO2 thin film become denser, linked together, porous and uniformly distributed on the surface and displays the highest cut-off wavelength value which is 396 nm with the lowest band gap value, which is 3.10 eV.
Źródło:
Archives of Metallurgy and Materials; 2022, 67, 1; 241-245
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Characteristics of GZO/IZO Dual-Layer as an Electron Transport Layer in Dye-Sensitized Solar Cell
Autorzy:
Manzari Tavakoli, M. H.
Ahmadi, M.
Sabet, M.
Powiązania:
https://bibliotekanauki.pl/articles/353232.pdf
Data publikacji:
2018
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
dual-layer
sol-gel
spin coating
thin film
GIZO
solar cell
Opis:
GZO/IZO semiconductor thin films were prepared on the ITO substrate via sol-gel spin coating method for using in the dye-sensitized solar cells (DSSCs). For this purpose, GZO and IZO thin films were optimized by the percentage of doping gallium and indium in zinc oxide and were studied their electrical, optical and structural properties. After that, the layers with the best performance were selected for use in the DSSCs. The concentration of all solutions for spin coating processes was 0.1 M and zinc oxide has been doped with gallium and indium, with different doping percentages (0, 0.5, 1, 2 and 4 volume percentage). So, by studying the properties of the fabricated thin films, it was found the films with 0.5%GZO and 0.5%IZO have the best performance and hence, the optimized dual-layer (0.5% GZO/0.5% IZO (GIZO)) were prepared and studied their electrical and optical properties. The synthesized optimized dual-layer film was successfully used as the working electrode for dye-sensitized solar cells. The sample with 0.5%IZO shows the 9.1 mA/cm2 short-circuit current density, 0.52 V open circuit voltage, 63% fill factor and 2.98% efficiency.
Źródło:
Archives of Metallurgy and Materials; 2018, 63, 4; 1609-1614
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Wyświetlanie 1-15 z 24

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