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    Tytuł:
    Optical and electrical properties of (Ti-V)Ox thin film as n-type Transparent Oxide Semiconductor
    Autorzy:
    Mazur, M.
    Domaradzki, J.
    Wojcieszak, D.
    Powiązania:
    https://bibliotekanauki.pl/articles/201406.pdf
    Data publikacji:
    2014
    Wydawca:
    Polska Akademia Nauk. Czytelnia Czasopism PAN
    Tematy:
    Transparent Oxide Semiconductor
    Transparent Electronics
    (Ti-V)Ox thin film
    magnetron sputtering
    optical and electrical properties
    Opis:
    In this paper, the influence of vanadium doping on optical and electrical properties of titanium dioxide thin films has been discussed. The (Ti-V)Ox thin films was deposited on silicon and Corning glass substrates using high energy reactive magnetron sputtering process. Measurements performed with the aid of x-ray diffraction revealed, that deposited thin film was composed of nanocrystalline mixture of TiO2-anatase, V2O3 and β-V2O5 phases. The amount of vanadium in the thin film, estimated on the basis of energy dispersive spectroscopy measurement, was equal to 3 at. %. Optical properties were evaluated based on transmission and reflection measurements. (Ti-V)Ox thin film was well transparent and the absorption edge was shifted by only 11 nm towards longer wavelengths in comparison to undoped TiO2. Electrical measurements revealed, that investigated thin film was transparent oxide semiconductors with n-type electrical conduction and resistivity of about 2.7 · 105 Ωcm at room temperature. Additionally, measured I-V characteristics of TOS-Si heterostructure were nonlinear and asymmetrical.
    Źródło:
    Bulletin of the Polish Academy of Sciences. Technical Sciences; 2014, 62, 3; 583-594
    0239-7528
    Pojawia się w:
    Bulletin of the Polish Academy of Sciences. Technical Sciences
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Photocatalytic properties of Ti–V oxides thin films
    Autorzy:
    Domaradzki, J
    Mazur, M
    Sieradzka, K
    Wojcieszak, D
    Adamiak, B
    Powiązania:
    https://bibliotekanauki.pl/articles/174210.pdf
    Data publikacji:
    2013
    Wydawca:
    Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
    Tematy:
    titanium dioxide (TiO2)
    thin films
    magnetron sputtering
    vanadium
    photocatalysis
    Opis:
    In this work, the photocatalytic properties of Ti–V oxides thin films with 19 and 23 at.% of vanadium addition have been outlined. The films were deposited by the high energy reactive magnetron sputtering method. X-ray photoelectron spectroscopy measurements were done in order to determine the chemical composition and binding energy of the elements on the samples surface. Additionally, based on wettability measurements, the water contact angles were evaluated and were equal to ca. 94° and 55° for thin films with 19 and 23 at.% of V, respectively. This testifies about hydrophilic and hydrophobic properties, respectively. Photoactivity of thin films was determined by percent decomposition of phenol for 5 hours during UV–vis radiation exposure. The highest photocatalytic activity of 6.2%/cm2 was obtained for thin films with 19 at.% of V. It has been found that an increase in V amount in Ti–V oxides thin films to 23 at.% results in lowered to 3%/cm2 photocatalytic activity.
    Źródło:
    Optica Applicata; 2013, 43, 1; 153-162
    0078-5466
    1899-7015
    Pojawia się w:
    Optica Applicata
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
    Tytuł:
    Influence of the structural and surface properties on photocatalytic activity of TiO2:Nd thin films
    Autorzy:
    Wojcieszak, D.
    Mazur, M.
    Kaczmarek, D.
    Morgiel, J.
    Poniedziałek, A.
    Domaradzki, J.
    Czeczot, A.
    Powiązania:
    https://bibliotekanauki.pl/articles/779688.pdf
    Data publikacji:
    2015
    Wydawca:
    Zachodniopomorski Uniwersytet Technologiczny w Szczecinie. Wydawnictwo Uczelniane ZUT w Szczecinie
    Tematy:
    TiO2
    neodymium
    thin films
    magnetron sputtering
    photocatalysis
    phenol decomposition
    Opis:
    Titanium dioxide thin films doped with the same amount of neodymium were prepared using two different magnetron sputtering methods. Thin films of anatase structure were deposited with the aid of Low Pressure Hot Target Magnetron Sputtering, while rutile coatings were manufactured using High Energy Reactive Magnetron Sputtering process. The thin films composition was determined by energy dispersive spectroscopy and the amount of the dopant was equal to 1 at. %. Structural properties were evaluated using transmission electron microscopy and revealed that anatase films had fibrous structure, while rutile had densely packed columnar structure. Atomic force microscopy investigations showed that the surface of both films was homogenous and consisted of nanocrystalline grains. Photocatalytic activity was assessed based on the phenol decomposition. Results showed that both thin films were photocatalytically active, however coating with anatase phase decomposed higher amount of phenol. The transparency of both thin films was high and equal to ca. 80% in the visible wavelength range. The photoluminescence intensity was much higher in case of the coating with rutile structure.
    Źródło:
    Polish Journal of Chemical Technology; 2015, 17, 2; 103-111
    1509-8117
    1899-4741
    Pojawia się w:
    Polish Journal of Chemical Technology
    Dostawca treści:
    Biblioteka Nauki
    Artykuł
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