Temat: SOI - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Grain boundary effect on the anisotropy piezoresistance of laser-recrystallized polysilicon layers in SOI-structures
Autorzy:: Pankov, Y.
Druzhinin, A.
Powiązania:: https://bibliotekanauki.pl/articles/307640.pdf
Data publikacji:: 2001
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: SOI
polysilicon layers
MLR
Opis:: A physical model of grain boundary influence on the piezoresistive effect of p-type conductivity of polysilicon layers in SOI-structures is developed. Software calculating piezoresistive properties of boron-doped p-type polysilicon layers has been developed. These properties may be calculated over wide concentration and temperature ranges with anisotropy taken into account and with the average grain size as a parameter. The potential barrier regions around the grain boundaries influence the deformation changes of anisotropy resistance in the fine-grained non-recrystallized SOI-structures doped with boron up to 3ź10(19)cm(-3) only.
Źródło:: Journal of Telecommunications and Information Technology; 2001, 1; 46-48
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 2.

Tytuł:: Recent developments in vertical MOSFETs and SiGe HBTs
Autorzy:: Hall, S.
Buiu, O.
Ashburn, P.
de Groot, K.
Powiązania:: https://bibliotekanauki.pl/articles/308031.pdf
Data publikacji:: 2004
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: vertical MOSFET
HBT
SOI
Opis:: There is a well recognised need to introduce new materials and device architectures to Si technology to achieve the objectives set by the international roadmap. This paper summarises our work in two areas: vertical MOSFETs, which can allow increased current drive per unit area of Si chip and SiGe HBT's in silicon-on-insulator technology, which bring together and promise to extend the very high frequency performance of SiGe HBT's with SOI-CMOS.
Źródło:: Journal of Telecommunications and Information Technology; 2004, 1; 26-35
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 3.

Tytuł:: Silicon microelectronics: where we have come from and where we are heading
Autorzy:: Łukasiak, L.
Jakubowski, A.
Pióro, Z.
Powiązania:: https://bibliotekanauki.pl/articles/308029.pdf
Data publikacji:: 2004
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: MOSFET
scaling
SiGe
SOI
Opis:: The paper briefly presents the history of microelectronics and the limitations of its further progress, as well as possible solutions. The discussion includes the consequences of the reduction of gate-stack capacitance and difficulties associated with supply-voltage scaling, minimization of parasitic resistance, increased channel doping and small size. Novel device architectures (e.g. SON, double-gate transistor) and the advantages of silicon-germanium are considered, too.
Źródło:: Journal of Telecommunications and Information Technology; 2004, 1; 7-14
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 4.

Tytuł:: Wymagania dla środków ochrony indywidualnej (SOI) w górnictwie podziemnym
Autorzy:: Lipowczan, A.
Powiązania:: https://bibliotekanauki.pl/articles/370737.pdf
Data publikacji:: 2009
Wydawca:: Wyższa Szkoła Zarządzania Ochroną Pracy w Katowicach
Tematy:: sprzęt ochrony indywidualnej
SOI
klasyfikacja SOI
wybuchowe środowisko pracy
parametry antropometryczne SOI
uniwersalność SOI
personal individualprotector
PIP
classification of PIP
explosives conditions in work environment
anthropometric factors
PIP universality
Opis:: W referacie przedstawiono czynniki determinujące znaczenie stosowania środków ochrony indywidualnej w górnictwie ze szczególnym uwzględnieniem górnictwa podziemnego. Przytoczono klasyfikację SOI. Na tej podstawie omówiono uwarunkowania certy-fikacyjne wynikające z wymagań Unii Europejskiej oraz przedstawiono trzy istotne czynniki charakterystyczne dla górnictwa, które powinny być uwzględniane w procesie wyboru SOI.
The paper presents the importance of personal individual protector (PIP) factors in mining industry with the special stress on coal underground mining. The classification of PIP was quoted in the paper. On these bases the certification conditions which arise from EU directives are also presented. In author opinion there are three main factors which are representative for mining industry and must be taken into account during the selection processes i.e.: explosives conditions in work environment, anthropometric factors of protected population and PIP universality.
Źródło:: Zeszyty Naukowe Wyższej Szkoły Zarządzania Ochroną Pracy w Katowicach; 2009, 1(5); 5-13
1895-3794
2300-0376
Pojawia się w:: Zeszyty Naukowe Wyższej Szkoły Zarządzania Ochroną Pracy w Katowicach
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 5.

Tytuł:: Silicon-on-Insulator technology for imaging and application to a switching photodetector
Autorzy:: Abdo, N.
Sallin, D.
Koukab, A.
Estribeau, M.
Magnan, P.
Kayal, M.
Powiązania:: https://bibliotekanauki.pl/articles/397865.pdf
Data publikacji:: 2015
Wydawca:: Politechnika Łódzka. Wydział Mikroelektroniki i Informatyki
Tematy:: photodetectors
silicon-on-insulator
fotodetektory
SOI
Opis:: This paper analyzes some advantages of Silicon-on-Insulator (SOI) based photodetectors for low light imaging. It shows that SOI based sensors not only solve the bulk carriers problem, it can also act as a very selective spectral filter by acting as a resonant cavity, which is useful in application with a very narrow spectrum of interest, such as bioluminescence imaging. The SOI implementation of a switching photodetector based with an hybrid MOS-PN structure is presented and its advantages in terms of dark current minimization and SNR improvement highlighted.
Źródło:: International Journal of Microelectronics and Computer Science; 2015, 6, 4; 136-141
2080-8755
2353-9607
Pojawia się w:: International Journal of Microelectronics and Computer Science
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 6.

Tytuł:: On possibility to extend the operation temperature range of SOI sensors with polysilicon piezoresistors
Autorzy:: Druzhinin, A.
Lavitska, E.
Maryamova, I.
Kogut, I.
Khoverko, Y.
Powiązania:: https://bibliotekanauki.pl/articles/307642.pdf
Data publikacji:: 2001
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: SOI
mechanical sensors
poly-Si piezoresistor
ZMR
Opis:: The aim of this work was to study the possibilities of developing mechanical sensors with poly-Si piezoresistors on insulating substrate for operation in different temperature ranges (low, elevated and high temperatures). Laser recrystallization is used as a technological tool to adjust the electrical and piezoresistive parameters of the polysilicon layer. For this purpose a set of studies including numerical simulation and experimental work has been carried out. The main three directions of the studies are considered: problems of thermal stabilization of the pressure sensor performance at elevated and high temperatures; problem of sensor operation at cryogenic temperatures; development of a multifunctional pressure-temperature sensor.
Źródło:: Journal of Telecommunications and Information Technology; 2001, 1; 40-45
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 7.

Tytuł:: High-temperature instability processes in SOI structures and MOSFETs
Autorzy:: Nazarov, A.N.
Kilchytska, V.I.
Vovk, Ja.N.
Colinge, J.P.
Powiązania:: https://bibliotekanauki.pl/articles/307654.pdf
Data publikacji:: 2001
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: SOI
MOSFET
high-temperature
instability
ZMR
SIMOX
Opis:: The paper reviews the problems related to BOX high-temperature instability in SOI structures and MOSFETs. The methods of bias-temperature research applied to SOI structures and SOI MOSFETs are analysed and the results of combined electrical studies of ZMR, and SIMOX SOI structures are presented. The studies are focused mainly on electrical discharging processes in the BOX at high temperature and its link with new instability phenomena such as high-temperature kink effects in SOI MOSFETs.
Źródło:: Journal of Telecommunications and Information Technology; 2001, 1; 18-26
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 8.

Tytuł:: CMOS Readout Circuit Integrated with Ionizing Radiation Detectors
Autorzy:: Szymański, A.
Obrębski, D.
Marczewski, J.
Tomaszewski, D.
Grodner, M.
Pieczyński, J.
Powiązania:: https://bibliotekanauki.pl/articles/226502.pdf
Data publikacji:: 2014
Wydawca:: Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:: readout electronics
ASIC
SOI
ionizing radiation detectors
Opis:: This paper describes the work performed in ITE on integration in one CMOS chip the ionizing radiation detectors with dedicated readout electronics. At the beginning, some realizations of silicon detectors of ionizing radiation are presented together with most important issues related to these devices. Next, two developed test structures for readout electronics are discussed in detail together with main features of non-typical silicon proces deployed.
Źródło:: International Journal of Electronics and Telecommunications; 2014, 60, 1; 117-124
2300-1933
Pojawia się w:: International Journal of Electronics and Telecommunications
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 9.

Tytuł:: Low frequency noise in advanced Si bulk and SOI MOSFETs
Autorzy:: Jomaah, J.
Balestra, F.
Ghibaudo, G.
Powiązania:: https://bibliotekanauki.pl/articles/308980.pdf
Data publikacji:: 2005
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: CMOS
SOI
low frequency noise
kink-related excess noise
DTMOS
Opis:: A review of recent results concerning the low frequency noise in modern CMOS devices is given. The approaches such as the carrier number and the Hooge mobility fluctuations used for the analysis of the noise sources are presented and illustrated through experimental data obtained on advanced CMOS SOI and Si bulk generations. Furthermore, the impact on the electrical noise of the shrinking of CMOS devices in the deep submicron range is also shown. The main physical characteristics of random telegraph signals (RTS) observed in small area MOS transistors are reviewed. Experimental results obtained on 0.35-0.12 žm CMOS technologies are used to predict the trends for the noise in future CMOS technologies, e.g., 0.1 žm and beyond. For SOI MOSFETS, the main types of layout will be considered, that is floating body, DTMOS, and body-contact. Particular attention will be paid to the floating body effect that induces a kink-related excess noise, which superimposes a Lorentzian spectrum on the flicker noise.
Źródło:: Journal of Telecommunications and Information Technology; 2005, 1; 24-33
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 10.

Tytuł:: SOI nanodevices and materials for CMOS ULSI
Autorzy:: Palestra, F.
Powiązania:: https://bibliotekanauki.pl/articles/308998.pdf
Data publikacji:: 2007
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: ballistic transport
gate misalignment
GIFBE
mobility enhancement
SOI
strain engineering
tunneling current
Opis:: A review of recently explored new effects in SOI nanodevices and materials is given. Recent advances in the understanding of the sensitivity of electron and hole transport to the tensile or compressive uniaxial and biaxial strains in thin film SOI are presented. The performance and physical mechanisms are also addressed in multi-gate Si, SiGe and Ge MOSFETs. The impact of gate misalignment or underlap, as well as the use of the back gate for charge storage in double-gate nanodevices and of capacitorless DRAMare also outlined.
Źródło:: Journal of Telecommunications and Information Technology; 2007, 2; 3-13
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 11.

Tytuł:: Charge-pumping characterization of SOI devices fabricated by means of wafer bonding over pre-patterned cavities
Autorzy:: Głuszko, G.
Łukasiak, L.
Kilchytska, V.
Chung, T. M.
Olbrechts, B.
Flandrie, D.
Raskin, J. P.
Powiązania:: https://bibliotekanauki.pl/articles/308669.pdf
Data publikacji:: 2007
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: charge-pumping
electrical characterization
interface traps
SOI
water bonding
Si layer transfer
Opis:: The quality of the silicon-buried oxide bonded interface of SOI devices created by thin Si film transfer and bonding over pre-patterned cavities, aiming at fabrication of DG and SON MOSFETs, is studied by means of chargepumping (CP) measurements. It is demonstrated that thanks to the chemical activation step, the quality of the bonded interface is remarkably good. Good agreement between values of front-interface threshold voltage determined from CP and I-V measurements is obtained.
Źródło:: Journal of Telecommunications and Information Technology; 2007, 3; 61-66
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 12.

Tytuł:: Special size effects in advanced single-gate and multiple-gate SOI transistors
Autorzy:: Ohata, A.
Ritzenthaler, R.
Faynot, O.
Cristoloveanu, S.
Powiązania:: https://bibliotekanauki.pl/articles/308994.pdf
Data publikacji:: 2007
Wydawca:: Instytut Łączności - Państwowy Instytut Badawczy
Tematy:: MOSFET
SOI
ultra-thin silicon
multiple-gate
mobility
coupling effect
thin gate oxide
gate-induced floating body effect
drain-induced virtual substrate biasing
Opis:: State-of-the-art SOI transistors require a very small body. This paper examines the effects of body thinning and thin-gate oxide in SOI MOSFETs on their electrical characteristics. In particular, the influence of film thickness on the interface coupling and carrier mobility is discussed. Due to coupling, the separation between the front and back channels is difficult in ultra-thin SOI MOSFETs. The implementation of the front-gate split C-V method and its limitations for determining the front- and back-channel mobility are described. The mobility in the front channel is smaller than that in the back channel due to additional Coulomb scattering. We also discuss the 3D coupling effects that occur in FinFETs with triple-gate and omega-gate configurations. In low-doped or tall fins the corner effect is suppressed. Narrow devices are virtually immune to substrate effects due to a strong lateral coupling between the two lateral sides of the gate. Short-channel effects are drastically reduced when the lateral coupling screens the drain influence.
Źródło:: Journal of Telecommunications and Information Technology; 2007, 2; 14-24
1509-4553
1899-8852
Pojawia się w:: Journal of Telecommunications and Information Technology
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 13.

Tytuł:: The CFD analysis of influence the start of fuel injection (SOI) on combustion parameters and exhaust gas composition of the marine 4-stroke engine
Autorzy:: Kowalski, Jerzy
Powiązania:: https://bibliotekanauki.pl/articles/133899.pdf
Data publikacji:: 2019
Wydawca:: Polskie Towarzystwo Naukowe Silników Spalinowych
Tematy:: marine four-stroke engine
NOx emission
CFD model
combustion
SOI
start of injection angle
czterosuwowy silnik okrętowy
emisja NOx
model CFD
spalanie
kąt początku wtrysku
Opis:: The paper presents a theoretical analysis of the impact of injection timing on the parameters of the combustion process and the composition of exhaust gas from a 4-stroke engine designed to shipbuilding. The analysis was carried out based on a three-dimensional multi-zone model of the combustion process. This model has been prepared on the basis of properties of the research facility. The input data to the model were obtained through laboratory tests. Results of calculations showed that the change of the start of injection angle (SOI) from the value of 14 degrees before TDC to 22 degrees before TDC results in changes in the combustion rate and thus an increase in the temperature of the combustion process as well as the increase of nitric oxides fraction in the exhaust gas. Simultaneously the maximum combustion pressure increases also.
Źródło:: Combustion Engines; 2019, 58, 2; 40-45
2300-9896
2658-1442
Pojawia się w:: Combustion Engines
Dostawca treści:: Biblioteka Nauki

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