- Tytuł:
- Technology of MISFET with SiO2/BaTiO3 System as a Gate Insulator
- Autorzy:
-
Firek, P.
Szmidt, J. - Powiązania:
- https://bibliotekanauki.pl/articles/308257.pdf
- Data publikacji:
- 2009
- Wydawca:
- Instytut Łączności - Państwowy Instytut Badawczy
- Tematy:
-
barium titanate
I-V characteristics
MISFET structures
radio frequency plasma sputtering - Opis:
- The properties of barium titanate (BaTiO3, BT), such as high dielectric constant and resistivity, allow it to find numerous applications in the field of microelectronics. In this work silicon metal-insulator-semiconductor field effect transistor (MISFET) structures with BaTiO3 thin films (containing La2O3 admixture) acting as gate insulator were investigated. The films were produced by means of radio frequency plasma sputtering (RF PS) of sintered BaTiO3 + La2O3 (2% wt.) target. In the paper transfer and output I-V, transconductance and output conductance characteristics of the obtained transistors are presented and discussed. Basic parameters of these devices, such as threshold voltage (VTH) are determined and discussed.
- Źródło:
-
Journal of Telecommunications and Information Technology; 2009, 4; 61-64
1509-4553
1899-8852 - Pojawia się w:
- Journal of Telecommunications and Information Technology
- Dostawca treści:
- Biblioteka Nauki
Artykuł