- Tytuł:
- Effect of Reactor Pressure on Electrical and Structural Properties of Diamond Films Grown by Hot-Filament CVD
- Autorzy:
-
Ullah, M.
Ahmed, E.
Rana, A. - Powiązania:
- https://bibliotekanauki.pl/articles/1030224.pdf
- Data publikacji:
- 2017-06
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
HFCVD
electrical properties
diamond films
growth
reactor pressure - Opis:
- Polycrystalline diamond films with preferred (111) and (222) facets were fabricated inside hot filament chemical vapour deposition reactor on silicon wafers using a mixture of 1% methane in hydrogen at various reactor pressures ranging from 10 to 50 mbar. Regarding characterization of diamond films, internal texture, surface morphology, quality of diamond and electrical conductivity were investigated using X-ray diffraction, scanning electron microscopy, the Raman spectroscopy and four-point-probe van der Pauw techniques, respectively. Results of these studies demonstrate that polycrystalline diamond structure is grown in random orientation with (111) facet being dominant showing sharp grain boundaries. Moreover, growth rate was found to increase with pressure up to 20 mbar and then decreased for further rise in pressure. That is why grain density is high with relatively smaller grains at higher pressures caused by higher nucleation rates. In contrast, electrical resistivity decreased ≈3 orders of magnitude showing a minimum at 2.9×10⁶ Ω cm as pressure was increased in the reactor. Reactor pressure during film growth resulted in poor surface morphology, absence of sp³ bonds and low resistivity. Hence, decrease of resistivity makes diamond films desirable for many electrical applications in semiconducting/electronic devices.
- Źródło:
-
Acta Physica Polonica A; 2017, 131, 6; 1419-1425
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł