- Tytuł:
- High Quality Gate Insulator/GaN Interface for Enhancement-Mode Field Effect Transistor
- Autorzy:
-
Taube, A.
Kruszka, R.
Borysiewicz, M.
Gierałtowska, S.
Kamińska, E.
Piotrowska, A. - Powiązania:
- https://bibliotekanauki.pl/articles/1492515.pdf
- Data publikacji:
- 2011-12
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
77.55.dj
77.22.Ch
73.40.Qv
81.15.Gh
81.15.Cd - Opis:
- The capacitance-voltage measurements were applied for characterization of the semiconductor/dielectric interface of GaN MOS capacitors with $SiO_2$ and $HfO_2//SiO_2$ gate stacks. From the Terman method low density of interface traps $(D_{it} \approx 10^{11} eV^{-1} cm^{-2})$ at $SiO_2//GaN$ interface was calculated for as-deposited samples. Samples with $HfO_2//SiO_2$ gate stacks have higher density of interface traps as well as higher density of mobile charge and effective charge in the dielectric layers. High quality of $SiO_2//GaN$ interface shows applicability of $SiO_2$ as a gate dielectric in GaN MOSFET transistors.
- Źródło:
-
Acta Physica Polonica A; 2011, 120, 6A; A-022-A-024
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł