Autor: Cetinkaya, T. - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: Investigation of Tin Oxide Based Nanocomposites for Li-Ion Batteries
Autorzy:: Cevher, O.
Cetinkaya, T.
Tocoglu, U.
Guler, M.
Akbulut, H.
Powiązania:: https://bibliotekanauki.pl/articles/1399889.pdf
Data publikacji:: 2013-02
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 88.30.rh
81.05.Dz
81.15.Cd
82.47.Aa
Opis:: In this work, tin oxide ($SnO_2$) films were deposited on multiwall carbon nanotube buckypaper using a rf magnetron sputter process in a mixed oxygen/argon (1/9) gas environment. Conditions for the growth of $SnO_2$ thin films on multiwall carbon nanotube buckypaper by rf sputtering are: target composition $SnO_2$ (99.999 wt%); total system pressure 1 Pa; sputtering power (rf) 75, 100 and 125 W, respectively; $O_2//Ar$ (1/9) gas mixture. The surface morphology of the $SnO_2$ multiwall carbon nanotube composite films was investigated by scanning electron microscopy. The crystallographic structure of the sample was determined by X-ray diffraction. The electrochemical properties of $SnO_2$ multiwall carbon nanotube composite anodes were investigated by galvanostatic charge-discharge experiments.
Źródło:: Acta Physica Polonica A; 2013, 123, 2; 358-360
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: Preparation and Electrochemical Performance of ZnO Films as Anode Materials for Li-Ion Batteries
Autorzy:: Cevher, O.
Cetinkaya, T.
Tocoglu, U.
Guler, M.
Akbulut, H.
Powiązania:: https://bibliotekanauki.pl/articles/1399886.pdf
Data publikacji:: 2013-02
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 81.05.Dz
81.15.Cd
82.47.Aa
Opis:: In this work, the effect of rf power on the structural, electrical and electrochemical properties of ZnO thin films was investigated. ZnO thin films were deposited on glass and Cr coated stainless steel substrates by rf magnetron sputtering in pure Ar gas environment. ZnO thin films for different rf powers (75, 100, and 125 W) were deposited keeping all other deposition parameters fixed. ZnO thin films were used as negative electrode materials for lithium-ion batteries, whose charge-discharge properties, cyclic voltammetry and cycle performance were examined. A high initial discharge capacity about 908 mAh g^{-1} was observed at a 0.5 C rate between 0.05 and 2.5 V. The crystallographic structure of the sample was determined by X-ray diffraction. The electrical resistivity of the deposited films was measured by the four-point-probe method. The thickness of the ZnO thin films was measured using a profilometer.
Źródło:: Acta Physica Polonica A; 2013, 123, 2; 355-357
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 3.

Tytuł:: Nanostructured Silicon Thin Film Electrodes for Li-Ion Batteries
Autorzy:: Tocoglu, U.
Cetinkaya, T.
Cevher, O.
Oguz Guler, M.
Akbulut, H.
Powiązania:: https://bibliotekanauki.pl/articles/1399941.pdf
Data publikacji:: 2013-02
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 61.72.uf
81.15.Cd
82.47.Aa
Opis:: In this study we produced nanostructured silicon thin films as lithium ion battery electrodes. Films were sputtered onto stainless steel substrates from high purity silicon target via dc magnetron sputtering technique with using different powers. Morphology and crystal structure of films were characterized with the use of scanning electron microscopy, X-ray diffraction and energy dispersive spectroscopy analysis, respectively. The thickness of films was measured by using surface profiler. Coin type test cells were assembled in argon filled glove box. Electrochemical performance of cells was tested on an electrochemical analyzer using constant current densities over a voltage range of 0.2-2 V.
Źródło:: Acta Physica Polonica A; 2013, 123, 2; 380-382
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 4.

Tytuł:: Effects of RF Power on Electrical and Structural Properties of Sputtered $SnO_2$:Sb Thin Films
Autorzy:: Cevher, O.
Guler, M.
Tocoglu, U.
Cetinkaya, T.
Akbulut, H.
Okumus, S.
Powiązania:: https://bibliotekanauki.pl/articles/1218075.pdf
Data publikacji:: 2014-02
Wydawca:: Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:: 68.55.-a
68.55.ag
81.15.Cd
Opis:: In this work, antimony doped tin oxide ($SnO_2$:Sb) thin films were fabricated using a radio frequency magnetron sputtering system on Si wafer and glass substrates. The base pressure in the sputtering chamber was 1.0 Pa. The $SnO_2$:Sb thin films were deposited for 1.0 h in a mixture of Ar and $O_2$ environment with $O_2$/Ar ratio of 10/90 at 75, 100, and 125 W RF sputtering powers. The microstructure of $SnO_2$:Sb thin films was assessed using a field emission scanning electron microscopy. The crystallographic structure of the sample was determined by X-ray diffraction. The average surface roughness $(R_{a})$ was measured with atomic force microscopy. The electrical resistivity of the deposited films was measured by the four-point-probe method. The thicknesses of the films were measured by surface profiler.
Źródło:: Acta Physica Polonica A; 2014, 125, 2; 293-295
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Dostawca treści:: Biblioteka Nauki

Artykuł

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