- Tytuł:
- Electrical Resistance Anomalies in Holmium Thin Films below 20 K in Magnetic Field
- Autorzy:
-
Dudáš, J.
Gabáni, S.
Kavečanský, V.
Gościańska, I.
Bagi, J. - Powiązania:
- https://bibliotekanauki.pl/articles/1534128.pdf
- Data publikacji:
- 2010-11
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
73.61.At
75.70.Ak
68.55.Nq - Opis:
- Electrical resistance (R) of Ho thin films evaporated in vacuum ≈ $10^{-7}$ Pa was studied in a temperature range from 2 K up to 300 K and in magnetic field up to 9 T. Measurements showed resistance anomalies below 20 K - minima of R value in 36 nm and 215 nm thin films and resistivity maximum at 3.58 K in 215 nm Ho film. Increasing value of the magnetic field, applied perpendicular to film surface up to 5 T, caused increasing suppression of the R minima in these films with subsequent disappearance of them in fields above 5 T. Maximum of R value in 215 nm thin film at 3.58 K decreased with increasing flux density up to 5 T and it was suppressed at fields above 5 T. X-ray diffraction of these films revealed two phases composition consisting of the hexagonal Ho and of cubic $HoH_2$. The preferential crystal orientation of both phases was detected.
- Źródło:
-
Acta Physica Polonica A; 2010, 118, 5; 843-845
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł