- Tytuł:
- Molecular Beam Epitaxy Growth for Quantum Cascade Lasers
- Autorzy:
-
Kosiel, K.
Szerling, A.
Kubacka-Traczyk, J.
Karbownik, P.
Pruszyńska-Karbownik, E.
Bugajski, M. - Powiązania:
- https://bibliotekanauki.pl/articles/1791281.pdf
- Data publikacji:
- 2009-11
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
42.55.Px
81.15.Hi
85.60.-q
85.35.Be
73.63.-b
63.22.-m
72.80.Ey
73.61.Ey
78.66.Fd - Opis:
- The fabrication of quantum cascade lasers emitting at 9 μm is reported. The devices operated in pulsed mode at up to 260 K. The peak powers recorded at 77 K were over 1 W and the slope efficiency η ≈ 0.5-0.6 W/A per uncoated facet. This has been achieved by the use of GaAs/$Al_{0.45}Ga_{0.55}As$ heterostructure, with the "anticrossed-diagonal" design. Double plasmon planar confinement with Al-free waveguide has been used to minimize absorption losses. The double trench lasers were fabricated using standard processing technology, i.e., wet etching and $Si_{3}N_{4}$ for electrical insulation. The quantum cascade laser structures have been grown by molecular beam epitaxy, with Riber Compact 21 T reactor. The stringent requirements - placed particularly on the epitaxial technology - and the influence of technological conditions on the device structure properties were presented and discussed in depth.
- Źródło:
-
Acta Physica Polonica A; 2009, 116, 5; 806-813
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł