- Tytuł:
- Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films
- Autorzy:
-
Çörekçí, S.
Kızılkaya, K.
Asar, T.
Öztürk, M.
Çakmak, M.
Özçelík, S. - Powiązania:
- https://bibliotekanauki.pl/articles/1491428.pdf
- Data publikacji:
- 2012-01
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
68.55.J-
61.05.cp
68.37.Ps - Opis:
- Titanium dioxide $(TiO_2)$ thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000C in steps of 200°C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. $TiO_2$ films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.
- Źródło:
-
Acta Physica Polonica A; 2012, 121, 1; 247-248
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł