- Tytuł:
- Structure and Some Physical Properties of Chemically Deposited Nickel Sulfide Thin Films
- Autorzy:
-
Hammad, A.
ElMandouh, Z.
Elmeleegi, H. - Powiązania:
- https://bibliotekanauki.pl/articles/1400567.pdf
- Data publikacji:
- 2015-04
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
61.05.cp
68.37.Hk
68.55.jd
68.55.J-
78.20.Ci
78.68.+m
73.50.Lw
73.90.+f - Opis:
- $Ni_2S_{2-x}$ thin films with x=0, 0.5, and 1 were prepared by chemical bath deposition technique. Amorphous structure was discovered by XRD for x=1, while α-Ni₇S₆ and NiS phases were discovered for x=0, and x=0.5 respectively. SEM graphs of the studied films have confirmed the XRD results. Optical band gap values increase from 0.845 to 0.912 eV, with increase of the composition x from 0 to 1. Activation energy values increase in the range from x=0 to x=0.5 and does not change for x=1.
- Źródło:
-
Acta Physica Polonica A; 2015, 127, 4; 901-903
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł